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公开(公告)号：US20240342977A1
公开(公告)日：2024-10-17
申请号：US18634385
申请日：2024-04-12
发明人： Carlos Mendez , Joel Ruiz
CPC分类号： B29C59/046 , B29C59/002 , B65B35/48 , B65B35/50 , B29K2875/00 , B29L2031/732
摘要： A production line system and apparatus that applies heat and pressure to plastic composite floorings to fold into stair noses. The production line is made of independent modules that are interconnected, namely automatic plank loader; motorized heating station; rotary positive and negative embossing; motorized cooling station; an unloading station for workpiece nesting and an unloading station for pallet stacking.
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公开(公告)号：US20240326317A1
公开(公告)日：2024-10-03
申请号：US18699624
申请日：2022-10-07
发明人： Juergen GRETSCHER
CPC分类号： B29C59/022 , B29C59/002
摘要： A device for dynamic length compensation when embossing a film strip includes: an embossing point; a roller for slip-free transport of the film strip; and a guide channel arranged between the embossing point and the roller. The guide channel has a guide surface movable between a first position and a second position. A path length of the film strip between the roller and the embossing point in the first position of the guide surface is greater than a path length of the film strip between the roller and the embossing point in the second position. The film strip, in the first position of the guide surface in the guide channel, is conveyed from the roller to the embossing point. The guide surface is moved from the first position to the second position during the embossing of the film strip.
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公开(公告)号：US20240308129A1
公开(公告)日：2024-09-19
申请号：US18601848
申请日：2024-03-11
发明人： YUSHI YAMAKAWA
IPC分类号： B29C59/00 , B29C59/02 , B32B43/00 , H01L21/027
CPC分类号： B29C59/002 , B32B43/006 , B29C59/026 , H01L21/027
摘要： A processing apparatus configured to separate a multilayer material in which a curable composition is sandwiched between a first member and a second member facing each other, includes a first holding unit configured to suction and hold a first surface of the multilayer material, a second holding unit configured to suction and hold a second surface facing the first surface of the multilayer material, and a deformation mechanism, wherein at least one of the first holding unit and the second holding unit is configured to suction and hold the multilayer material via a flexible member, and wherein the deformation mechanism is configured to deform at least a portion of the flexible member so as to form a start point of separation in the multilayer material.
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公开(公告)号：US12030236B2
公开(公告)日：2024-07-09
申请号：US17255448
申请日：2019-07-01
发明人： Jan Jäderberg
CPC分类号： B29C59/002 , B29C59/02 , B29D11/00663
摘要： The present disclosure relates to a method for embossing a plastic sheet and a corresponding tool (1). The plastic sheet is pressed between first and second tool halves (3, 5) while being heated such that a pattern is imprinted on first and second faces (19, 21) of the plastic sheet. Reference marks (31, 33) are imprinted on both faces of the plastic sheet and the embossed plastic sheet is evaluated optically to determine error data based on the relative position of the first and second reference marks. This allows to adjust the embossing tool based on the error data for subsequent embossing operations.
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公开(公告)号：US20240066786A1
公开(公告)日：2024-02-29
申请号：US17823411
申请日：2022-08-30
发明人： Se-Hyuk Im , Anshuman Cherala
CPC分类号： B29C59/002 , B29C59/026 , B82Y40/00 , B29C2037/903
摘要： A nanofabrication method comprises receiving information regarding in-plane distortion of a substrate, modeling target out-of-plane displacement as a summation of a plurality of geometric modes represented by a linear combination of basis functions, generating a first drop pattern of formable material based on the modeled out-of-plane displacement, generating a second drop pattern by merging the first drop pattern with a drop pattern based on a topography of the template and the substrate; dispensing drops of formable material onto the substrate according to the second drop pattern, and contacting the dispensed drops with the template to form a film. The plurality of geometric modes are modified using a plurality of unique predetermined correction coefficients. Each unique predetermined correction coefficient represents a relationship between an analytically determined amount of in-plane distortion and an empirically determined amount of in-plane distortion.
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公开(公告)号：US20230390993A1
公开(公告)日：2023-12-07
申请号：US18300538
申请日：2023-04-14
发明人： HIROYUKI MATSUDA
IPC分类号： B29C59/02 , B29C59/00 , G06V10/22 , G06V10/145
CPC分类号： B29C59/022 , B29C59/002 , G06V10/22 , G06V10/145 , G06V2201/07
摘要： The present invention is to provide an imprint device that can form a circuit pattern with high accuracy even if a deviation occurs in a positional relationship between the circuit pattern and an alignment mark. The imprint device performs an imprinting process in which a mold on which a pattern is formed is brought in contact with an imprint material on a substrate and the pattern is transferred to the substrate at a target position on the substrate, and includes an alignment unit that performs alignment of the mold with the substrate such that the mold and the substrate are at an alignment position corrected based on an amount of relative positional deviation between a pattern mark formed near the pattern of the mold and an alignment mark of the mold obtained by measuring the pattern mark and the alignment mark, and a curing unit that cures the imprint material at the position at which alignment is performed by the alignment unit.
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公开(公告)号：US11801629B2
公开(公告)日：2023-10-31
申请号：US16170782
申请日：2018-10-25
发明人： Mitsunori Kokubo , Takato Baba , Toshiaki Goto
CPC分类号： B29C59/046 , B29C33/72 , B29C59/002 , B08B7/0035 , B29C33/424 , B29C2033/725
摘要： According to one embodiment, a transfer apparatus includes a coating part for coating an uncured resin on a substrate, a substrate installation part for positioning and installing the substrate integrally, a mold installation part for installing a sheet-like mold, a transfer roller for transferring a fine transfer pattern formed on the mold to the resin coated on the substrate, and a plasma unit for cleaning the mold by irradiating plasma to the mold peeled off from the resin after transferring. After cleaning by the plasma using the plasma unit, the cleaned mold is used again for transferring of the transfer pattern.
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公开(公告)号：US20230321895A1
公开(公告)日：2023-10-12
申请号：US18194942
申请日：2023-04-03
发明人： Takehiko UENO
CPC分类号： B29C59/002 , B29C59/022 , B29C59/026
摘要： An imprint apparatus including a mold deformation mechanism configured to deform a mold by applying a pressure to the mold, a substrate deformation mechanism configured to deform the substrate by applying a pressure to the substrate, a measurement unit configured to measure a deformation amount of the mold and a deformation amount of the substrate during separating the mold from the cured imprint material on the substrate, and a control unit configured to control, during the separating, a pressure to be applied to the mold by the mold deformation mechanism and a pressure to be applied to the substrate by the substrate deformation mechanism based on the deformation amounts measured by the measurement unit such that a difference between the deformation amount of the mold and the deformation amount of the substrate falls within an allowable range.
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公开(公告)号：US20230311404A1
公开(公告)日：2023-10-05
申请号：US17989758
申请日：2022-11-18
发明人： Kangwon LEE , Soo Beom JO , Dong Kyun KO , Kyungjoo MIN , Eun Chan LIM , Myung Soo HUH
CPC分类号： B29C59/002 , B29C59/046
摘要： An imprint device according to an embodiment includes: a stage, which supports a substrate; a press roller, which presses a film with respect to the substrate; a first load cell and a second load cell, which are disposed corresponding to opposite ends of the press roller, respectively; and a controller, which monitors a release state of the film based on an output of the first load cell and an output of the second load cell.
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10.发明公开公开(公告)号：US20230294351A1
公开(公告)日：2023-09-21
申请号：US18180610
申请日：2023-03-08
发明人： KENJI YAEGASHI
CPC分类号： B29C59/022 , G03F7/0002 , B29C59/026 , B29C59/002
摘要： An alignment method of aligning a first object and a second object includes detecting a moire fringe formed by a mark of the first object and a mark of the second object by using a detection unit, detecting an evaluation mark for correcting a detection result of the moire fringe, by the detection unit, and acquiring a detection result of the evaluation mark, determining a relative position of the mark of the first object and the mark of the second object by correcting a detection result of the moire fringe by use of the detection result of the evaluation mark, and aligning the first object and the second object based on the relative position. The evaluation mark is provided in at least one of the first object and the second object.
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