公开(公告)号：US20230321895A1

公开(公告)日：2023-10-12

申请号：US18194942

申请日：2023-04-03

申请人： CANON KABUSHIKI KAISHA

发明人： Takehiko UENO

IPC分类号： B29C59/00 ,  B29C59/02

CPC分类号： B29C59/002 ,  B29C59/022 ,  B29C59/026

摘要： An imprint apparatus including a mold deformation mechanism configured to deform a mold by applying a pressure to the mold, a substrate deformation mechanism configured to deform the substrate by applying a pressure to the substrate, a measurement unit configured to measure a deformation amount of the mold and a deformation amount of the substrate during separating the mold from the cured imprint material on the substrate, and a control unit configured to control, during the separating, a pressure to be applied to the mold by the mold deformation mechanism and a pressure to be applied to the substrate by the substrate deformation mechanism based on the deformation amounts measured by the measurement unit such that a difference between the deformation amount of the mold and the deformation amount of the substrate falls within an allowable range.