公开(公告)号：US20180329292A1

公开(公告)日：2018-11-15

申请号：US15775602

申请日：2016-09-30

Applicant: ASML Netherlands B.V.

Inventor： Junichi KANEHARA ,  Hans BUTLER ,  Paul Cornè Henri DE WIT ,  Engelbertus Antonius Fransiscus VAN DER PASCH

IPC: G03F7/00 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F7/0002 ,  G03F7/70341 ,  G03F7/70733 ,  G03F7/70925 ,  G03F9/7042

Abstract: A method of operating a lithographic apparatus that comprises: a projection system configured to provide exposure radiation for patterning a substrate underneath the projection system; a first stage configured to support a first substrate; a second stage configured to support a second substrate; and a third stage accommodating a component that includes at least one of a sensor and a cleaning device; wherein the method comprises starting a pre-exposure scrum sweep operation after starting a substrate exchange operation; wherein during the pre-exposure scrum sweep operation, the third stage moves away from underneath the projection system while the second stage moves to underneath the projection system; wherein during the substrate exchange operation, the first substrate is unloaded from the first stage.