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16 条记录 (耗时 0.019 秒)

    Gas bearing system
    1.
    发明授权
    Gas bearing system 失效
    气体轴承系统

    公开(公告)号：US07284907B2

    公开(公告)日：2007-10-23

    申请号：US10539368

    申请日：2003-11-18

    申请人： Theo Anjes Maria Ruijl

    发明人： Theo Anjes Maria Ruijl

    IPC分类号： F16C32/06

    CPC分类号： F16C29/025 ,  F16C32/0622

    摘要： A gas bearing system comprising two opposing substantially parallel bearing surfaces (2, 3) and at least one gas duct (6) for supplying gas through an orifice (7) to the bearing gap (5) between the bearing surfaces (2, 3). At least one of the bearing surfaces (2, 3) is provided with at least one cavity (8, 9) extending over 0.3 mm2 to 3 mm2 of the at least one bearing surface (2, 3). The content of the cavity (8, 9) may be between 0.3 mm3 and 4 mm3. The gas duct (6) may supply gas to the cavity (8) through an orifice (7) in the wall of the cavity (8).

    摘要翻译： 一种气体轴承系统，包括两个相对的基本平行的支承表面（2,3）和至少一个气体管道（6），用于将气体通过孔口（7）供应到支承表面（2,3）之间的轴承间隙（5） 。 至少一个轴承表面（2,3）设置有至少一个延伸超过0.3mm 2至3mm 2以下的空腔（8,9） 至少一个轴承表面（2,3）。 空腔（8,9）的含量可以在0.3mm 3和4mm 3之间。 气体管道（6）可以通过空腔（8）的壁中的孔口（7）将气体供应到空腔（8）。

    System for detecting motion of a body
    2.
    发明授权
    System for detecting motion of a body 失效
    用于检测身体运动的系统

    公开(公告)号：US07902494B2

    公开(公告)日：2011-03-08

    申请号：US12067358

    申请日：2006-09-13

    申请人： Ronatus Gerardus Klaver ,  Theo Anjes Maria Ruijl ,  Michael Josepha Mathijs Renkens ,  Jan Van Eijk

    发明人： Ronatus Gerardus Klaver ,  Theo Anjes Maria Ruijl ,  Michael Josepha Mathijs Renkens ,  Jan Van Eijk

    IPC分类号： G01D5/38 ,  G03F9/00

    CPC分类号： G01D5/38 ,  G03F7/70775 ,  G03F7/7085

    摘要： The invention relates to a system (1) for detecting motion of a body (2) comprising a first elongated grating strip (4) coupled to said body and a separate and substantially stationary second elongated grating strip (5) crossing said first elongated grating strip. The system further comprises optical detection means (6) arranged to receive one or more light beams diffracted at said first and second elongated grating strips to detect motion of said body. The invention further relates to a method for detecting motion of a body (2) and to a body processing or inspection system.

    摘要翻译： 本发明涉及一种用于检测主体（2）的运动的系统（1），其包括耦合到所述主体的第一细长光栅条（4）和与所述第一细长光栅条交叉的单独且基本上固定的第二细长光栅条（5） 。 该系统还包括光学检测装置（6），其布置成接收在所述第一和第二细长光栅条带处衍射的一个或多个光束以检测所述主体的运动。 本发明还涉及一种用于检测身体（2）和身体加工或检查系统的运动的方法。

    LOCAL CONTROL OF HEAT FLOW TO MORE ACCURATELY REGULATE MACHINE TEMPERATURES
    3.
    发明申请
    LOCAL CONTROL OF HEAT FLOW TO MORE ACCURATELY REGULATE MACHINE TEMPERATURES 审中-公开
    热流的本地控制更准确地调节机器温度

    公开(公告)号：US20100163221A1

    公开(公告)日：2010-07-01

    申请号：US12095635

    申请日：2006-11-14

    申请人： Theo Anjes Maria Ruijl ,  Hendrik Jan Eggink ,  Jacobus Cornelis Gerardus Van Der Sanden ,  Ralph Theodorus Hubertus Maessen ,  Jeroen Dekkers

    发明人： Theo Anjes Maria Ruijl ,  Hendrik Jan Eggink ,  Jacobus Cornelis Gerardus Van Der Sanden ,  Ralph Theodorus Hubertus Maessen ,  Jeroen Dekkers

    IPC分类号： G05D23/19 ,  F25D17/00

    CPC分类号： G03F7/70858 ,  F25D17/02 ,  G05D23/1934

    摘要： A temperature regulation method and system (100) includes a reservoir (112) having a fluid with a temperature of a value such that, within a control range of a local temperature controller, a local set point temperature is achievable. A piping system (101) delivers the fluid from the reservoir to one or more elements needing temperature control. A heat generator/removal device (110) in one of the fluid paths is disposed at or near an element needing temperature control. For each heat generator/removal device, a local temperature controller (116) and a feedback sensor (114) are configured to control the heat generator/removal device such that an amount of heat exchanged with the fluid, at or near the element needing temperature control, results in a local temperature, monitored by the control feedback sensor to be locally and accurately maintained at the local set point temperature.

    摘要翻译： 温度调节方法和系统（100）包括具有流体的储存器（112），该流体的温度值使得在局部温度控制器的控制范围内可以实现局部设定点温度。 管道系统（101）将流体从储存器输送到需要温度控制的一个或多个元件。 一个流体路径中的发热/排出装置（110）设置在需要温度控制的元件处或附近。 对于每个热发生器/去除装置，局部温度控制器（116）和反馈传感器（114）被配置为控制热发生器/去除装置，使得与流体交换的热量在需要温度的元件处或附近 控制，导致局部温度，由控制反馈传感器监控，以便局部且精确地保持在局部设定点温度。

    System for Detecting Motion of a Body
    4.
    发明申请
    System for Detecting Motion of a Body 失效
    用于检测身体运动的系统

    公开(公告)号：US20090001260A1

    公开(公告)日：2009-01-01

    申请号：US12067358

    申请日：2006-09-13

    申请人： Ronatus Gerardus Klaver ,  Theo Anjes Maria Ruijl ,  Michael Josepha Renkens ,  Jan Van Eijk

    发明人： Ronatus Gerardus Klaver ,  Theo Anjes Maria Ruijl ,  Michael Josepha Renkens ,  Jan Van Eijk

    IPC分类号： G01D5/38

    CPC分类号： G01D5/38 ,  G03F7/70775 ,  G03F7/7085

    摘要： The invention relates to a system (1) for detecting motion of a body (2) comprising a first elongated grating strip (4) coupled to said body and a separate and substantially stationary second elongated grating strip (5) crossing said first elongated grating strip. The system further comprises optical detection means (6) arranged to receive one or more light beams diffracted at said first and second elongated grating strips to detect motion of said body. The invention further relates to a method for detecting motion of a body (2) and to a body processing or inspection system.

    摘要翻译： 本发明涉及一种用于检测主体（2）的运动的系统（1），其包括耦合到所述主体的第一细长光栅条（4）和与所述第一细长光栅条交叉的单独且基本上固定的第二细长光栅条（5） 。 该系统还包括光学检测装置（6），其布置成接收在所述第一和第二细长光栅条带处衍射的一个或多个光束以检测所述主体的运动。 本发明还涉及一种用于检测身体（2）和身体加工或检查系统的运动的方法。

    Method and device for rotating a wafer
    5.
    发明授权
    Method and device for rotating a wafer 有权
    用于旋转晶片的方法和装置

    公开(公告)号：US07351293B2

    公开(公告)日：2008-04-01

    申请号：US10969256

    申请日：2004-10-19

    申请人： Vladimir Ivanovich Kuznetsov ,  Sijbrand Radelaar ,  Jacobus Cornells Gerardus Van Der Sanden ,  Theo Anjes Maria Ruijl

    发明人： Vladimir Ivanovich Kuznetsov ,  Sijbrand Radelaar ,  Jacobus Cornells Gerardus Van Der Sanden ,  Theo Anjes Maria Ruijl

    IPC分类号： H01L21/00 ,  C23C16/00 ,  C23C14/00

    CPC分类号： H01L21/67784

    摘要： Method and device for rotating a wafer which is arranged floating in a reactor. The wafer is treated in a reactor of this nature, and it is important for this treatment to be carried out as uniformly as possible. For this purpose, it is proposed to rotate the wafer by allowing the gas flow to emerge perpendicular to the surface of the wafer and then to impart to this gas a component which is tangential with respect to the wafer, thus generating rotation. This tangential component may be generated by the provision of grooves, which may be of spiral or circular design.

    摘要翻译： 用于旋转布置在反应器中的晶片的方法和装置。 将晶片在这种性质的反应器中处理，并且对于该处理应尽可能均匀地进行是重要的。 为此目的，提出通过使气流垂直于晶片的表面出现，然后赋予该气体相对于晶片切向的部件，从而产生旋转来旋转晶片。 这种切向部件可以通过提供可以是螺旋形或圆形设计的凹槽产生。

    Method and device for rotating a wafer
    7.
    发明授权
    Method and device for rotating a wafer 有权
    用于旋转晶片的方法和装置

    公开(公告)号：US06824619B1

    公开(公告)日：2004-11-30

    申请号：US09936257

    申请日：2002-01-11

    申请人： Vladimir Ivanovich Kuznetsov ,  Sijbrand Radelaar ,  Jacobus Cornells Gerardus Van Der Sanden ,  Theo Anjes Maria Ruijl

    发明人： Vladimir Ivanovich Kuznetsov ,  Sijbrand Radelaar ,  Jacobus Cornells Gerardus Van Der Sanden ,  Theo Anjes Maria Ruijl

    IPC分类号： H01L2100

    CPC分类号： H01L21/67784

    摘要： Method and device for rotating a wafer which is arranged floating in a reactor. The wafer is treated in a reactor of this nature, and it is important for this treatment to be carried out as uniformly as possible. For this purpose, it is proposed to rotate the wafer by allowing the gas flow to emerge perpendicular to the surface of the wafer and then to impart to this gas a component which is tangential with respect to the wafer, thus generating rotation. This tangential component may be generated by the provision of grooves, which may be of spiral or circular design.

    摘要翻译： 用于旋转布置在反应器中的晶片的方法和装置。 将晶片在这种性质的反应器中处理，并且对于该处理应尽可能均匀地进行是重要的。 为此目的，提出通过使气流垂直于晶片的表面出现，然后赋予该气体相对于晶片切向的部件，从而产生旋转来旋转晶片。 这种切向部件可以通过提供可以是螺旋形或圆形设计的凹槽产生。

    Precision measuring apparatus provided with a metrology frame with a thermal shield consisting of at least two layers
    8.
    发明授权
    Precision measuring apparatus provided with a metrology frame with a thermal shield consisting of at least two layers 失效

    公开(公告)号：US06662462B2

    公开(公告)日：2003-12-16

    申请号：US10140507

    申请日：2002-05-07

    申请人： Theo Anjes Maria Ruijl

    发明人： Theo Anjes Maria Ruijl

    IPC分类号： G01B5008

    CPC分类号： G01B5/00 ,  G01B5/0014 ,  G01B21/045

    摘要： Precision measuring apparatus like Co-ordinate Measuring Machines (CMMs) are very susceptible to deformations due to temperature variations and gradients. In a known CCM such variations are counteracted by providing parts of the apparatus with an insulating PUR layer. According to the invention the metrology frame 2 of the measuring apparatus is provided with a heat shield 12, 15 which includes an inner layer 12, having a comparatively high heat resistance, and an outer layer (14) which has a comparatively low heat resistance. Temperature gradients causing deformations of the metrology frame 2 are thus effectively reduced, whereas homogeneous temperature variations can be easily compensated for by means of software correction. Moreover, the shield acts as a low-pass filter which reduces the temperature disturbances due to short-term heat inputs.

    Suction unit and autonomous vacuum cleaner
    9.
    发明授权
    Suction unit and autonomous vacuum cleaner 有权
    抽油机和自主吸尘器

    公开(公告)号：US09192271B2

    公开(公告)日：2015-11-24

    申请号：US12673196

    申请日：2008-08-18

    申请人： Jeroen Dekkers ,  Theo Anjes Maria Ruijl ,  Silvester Matheus Reijnders ,  Jan Van Eijk ,  Hubert Gerard Jean Joseph Amaury Vroomen ,  Thomas Petrus Hendricus Warmerdam ,  Robertus Mathijs Gerardus Rijs

    发明人： Jeroen Dekkers ,  Theo Anjes Maria Ruijl ,  Silvester Matheus Reijnders ,  Jan Van Eijk ,  Hubert Gerard Jean Joseph Amaury Vroomen ,  Thomas Petrus Hendricus Warmerdam ,  Robertus Mathijs Gerardus Rijs

    IPC分类号： A47L9/02 ,  A47L9/00 ,  A47L9/28 ,  A47L5/04

    CPC分类号： A47L9/02 ,  A47L5/04 ,  A47L9/0072 ,  A47L9/009 ,  A47L9/2821 ,  A47L2201/00

    摘要： The invention relates to a suction unit and relates to a vacuum cleaner. The suction unit comprises a drive system for driving the suction unit over a surface to be treated; a chassis supporting the drive system; a nozzle for removing particles from a surface to be treated which nozzle is configured to move with relation to the chassis in a direction away from the surface to be treated, the nozzle having an interior space defining an opening that faces the surface to be treated; and an outlet communicating with the interior space, the outlet being arranged for communication with a fan unit in operating conditions. The suction unit further comprises coupling means for coupling the nozzle to the chassis, wherein the coupling means is arranged to exert a force that is directed away from the surface to be treated when the under pressure in the interior space increases. In this manner the problem of the suction unit getting stuck on the floor can be overcome or at least be reduced. Furthermore the traction of the drive system can be improved. An autonomous vacuum cleaner according to the invention comprises such a suction unit and further comprises a dust chamber, and a fan unit that communicates with the dust chamber, the fan unit communicating with the outlet for creating under pressure in the interior space of the nozzle in operating conditions.

    摘要翻译： 本发明涉及抽吸单元，涉及一种真空吸尘器。 抽吸单元包括用于在被处理表面上驱动抽吸单元的驱动系统; 支撑驱动系统的底盘; 用于从被处理表面去除颗粒的喷嘴，该喷嘴构造成在远离待处理表面的方向上相对于底架移动，喷嘴具有限定面向待处理表面的开口的内部空间; 以及与所述内部空间连通的出口，所述出口布置成用于在操作条件下与风扇单元通信。 抽吸单元还包括用于将喷嘴联接到底盘的联接装置，其中联接装置被布置成当内部空间中的欠压增加时施加远离被处理表面的力。 以这种方式，可以克服或至少减少吸入单元卡在地板上的问题。 此外，可以提高驱动系统的牵引力。 根据本发明的自主真空吸尘器包括这样的抽吸单元，并且还包括灰尘室和与灰尘室连通的风扇单元，风扇单元与出口连通，用于在喷嘴的内部空间中产生压力 运行条件。