发明授权
- 专利标题： Lithography method and apparatus
- 专利标题（中）： 平版印刷方法和仪器
-
申请号： US13810384申请日： 2011-07-18
-
公开(公告)号： US09310700B2公开(公告)日： 2016-04-12
- 发明人: Adrianus Hendrik Koevoets , Michael Jozef Mathijs Renkens , Sander Frederik Wuister
- 申请人： Adrianus Hendrik Koevoets , Michael Jozef Mathijs Renkens , Sander Frederik Wuister
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 国际申请： PCT/EP2011/062255 WO 20110718
- 国际公布： WO2012/019874 WO 20120216
- 主分类号： G03B27/52
- IPC分类号： G03B27/52 ; G03B27/32 ; G03B27/02 ; G03F7/20 ; B82Y10/00 ; B82Y40/00 ; G03F7/00
摘要：
In an embodiment, a lithography method is disclosed that includes providing a providing a first heat load to a first area of an object, and providing a second heat load to a second area of the object, wherein the second heat load is configured to ensure a deformation of the first area of the object caused by providing both the first heat load and the second heat load is smaller than a deformation of the first area of the object caused by providing only the first heat load.
公开/授权文献
- US20130128246A1 Lithography Method and Apparatus 公开/授权日：2013-05-23
信息查询
