公开(公告)号：US12005264B2

公开(公告)日：2024-06-11

申请号：US18230168

申请日：2023-08-04

申请人： GCS Co., Ltd.

发明人： Chang Sik Kim ,  Tae Yong Kim ,  Myeong Woo Kim ,  Hyuk Namgoong ,  Ha Yun Lee

IPC分类号： A61N1/04 ,  A61N1/08 ,  A61N1/44 ,  B01D53/04 ,  H05H1/24

CPC分类号： A61N1/44 ,  A61N1/0476 ,  A61N1/08 ,  B01D53/0446 ,  H05H1/24 ,  B01D2253/102 ,  B01D2257/106 ,  B01D2259/455 ,  H05H2245/10 ,  H05H2245/34

摘要： Disclosed is a skin care device using plasma. The skin care device may include a first plasma generating device; and a main body configured to supply power to the first plasma generating device and to control the first plasma generating device based on an input from a user.

公开(公告)号：US20230352309A1

公开(公告)日：2023-11-02

申请号：US17732662

申请日：2022-04-29

申请人： Taiwan Semiconductor Manufacturing Company

发明人： Ping-Hsun Lin ,  Hung-Yi Tsai ,  Hao-Ping Cheng ,  Ta-Cheng Lien ,  Hsin-Chang Lee

IPC分类号： H01L21/3065 ,  H01J37/32 ,  H05H1/24 ,  H01J37/22 ,  H01L21/308

CPC分类号： H01L21/3065 ,  H01J37/3244 ,  H01J37/32568 ,  H01J37/32477 ,  H05H1/24 ,  H01J37/22 ,  H01L21/308 ,  H01J2237/334 ,  H01J37/32082 ,  H05H2245/40

摘要： Methods for plasma stability in a plasma treatment tool are disclosed. A laser is positioned within a plasma treatment chamber within a skin depth of the electromagnetic field generated therein. The laser can be synchronized with the electrical triggering signals that generate the electromagnetic field. This scheme provides a stable and efficient method of plasma ignition.

公开(公告)号：US20230346104A1

公开(公告)日：2023-11-02

申请号：US17733200

申请日：2022-04-29

申请人： L'Oreal

发明人： Gregoire CHARRAUD ,  Casey BARBARINO ,  Rafael FELICIANO

IPC分类号： A61N5/06 ,  H05H1/24 ,  A45D34/04 ,  A61N1/44

CPC分类号： A45D34/041 ,  A61N1/44 ,  A61N5/0616 ,  H05H1/24 ,  A61N2005/0652 ,  A61N2005/0658 ,  H05H2245/34

摘要： A skin care system including a dispensing device configured to administer a light therapy and a plasma treatment, and an applicator configured to apply a formula, comprising a reservoir configured to hold the formula, a roller ball configured to apply the formula, an attachment configured to attach the cartridge to the dispensing device, and a microcontroller configured to direct the dispensing devices to apply the plasma treatment.

公开(公告)号：US20190215944A1

公开(公告)日：2019-07-11

申请号：US16351871

申请日：2019-03-13

申请人： LG cHEM, Ltd.

发明人： Sang Kyun Lee ,  Sang Ho Bae ,  Duck Hoe Kim ,  Cha Hun Ku

IPC分类号： H05H1/48 ,  H01M2/16 ,  B32B37/06 ,  H01M10/04 ,  B32B37/12 ,  B32B7/14 ,  B32B38/00

CPC分类号： H05H1/48 ,  B32B7/14 ,  B32B37/06 ,  B32B37/12 ,  B32B38/00 ,  B32B38/0004 ,  H01M2/16 ,  H01M2/168 ,  H01M10/04 ,  H05H1/24 ,  H05H2001/485

摘要： The present invention relates to a plasma generating apparatus for a secondary battery. The plasma generating apparatus for the secondary battery comprises a roller part comprising a transfer roller that transfers a separator and a metal member built in the transfer roller, and a plasma generating part comprising a main body spaced apart from the transfer roller and a plurality of electrode members disposed on positions that are spaced apart from each other in a direction of both ends of the main body and partially generating a plasma between the metal member and the main body to form a patterned bonding layer on a surface of the separator, wherein the plurality of electrode members are detachably coupled to the main body to adjust a number of the electrode members coupled to the main body based on a size of the separator.

公开(公告)号：US20190006148A1

公开(公告)日：2019-01-03

申请号：US16000898

申请日：2018-06-06

申请人： Sodick Co., Ltd.

发明人： Motohiro INOUE

IPC分类号： H01J37/30 ,  H05H1/24

CPC分类号： H01J37/30 ,  H05H1/24 ,  H05H1/48

摘要： It is difficult to perform surface modification by irradiating a side surface of a hole formed on an irradiated object with a low-energy-density electron beam. An irradiated object having an irradiation hole formed thereon is disposed in a vacuum chamber. A cathode electrode is arranged to face a side surface of the irradiation hole. The cathode electrode has a large number of metal projections over an entire surface of a base body, the base body facing at least the side surface of the irradiation hole. A conductive mesh is arranged between the cathode electrode and the side surface of the irradiation hole. The conductive mesh partially contacts the irradiated object and is set to have the same potential as the irradiated object.

公开(公告)号：US20180328186A1

公开(公告)日：2018-11-15

申请号：US16043931

申请日：2018-07-24

申请人： IHI Corporation

发明人： Norio Asaumi ,  Nozomi Tanaka ,  Junya Kouwa ,  Kaoru Inoue

IPC分类号： F01D5/14

CPC分类号： F01D5/147 ,  F01D5/14 ,  F01D25/00 ,  F02C7/00 ,  F04D29/38 ,  F05D2220/32 ,  F05D2230/235 ,  F05D2230/313 ,  H05H1/24

摘要： Disclosed is a method of manufacturing an airfoil structure. The airfoil structure includes a plurality of airfoils, a support for supporting the airfoils, and a case for covering the airfoils. Each airfoil includes an airfoil body, and an airflow generator for producing induced airflow by generating plasma. The method includes a process of forming the airflow generator that includes a first electrode forming step of forming a first electrode on the airfoil body, a dielectric layer forming step of forming a dielectric layer on the airfoil body by forming ceramic powder into a film to cover the first electrode through room temperature impact consolidation, and a second electrode forming step of forming a second electrode on a surface of the dielectric layer, such that the second electrode is electrically connected to the first electrode, and an alternating-current voltage is applied to the second electrode.

公开(公告)号：US10004133B2

公开(公告)日：2018-06-19

申请号：US15644062

申请日：2017-07-07

申请人： Varian Semiconductor Equipment Associates, Inc.

发明人： Shurong Liang ,  Costel Biloiu ,  Glen F. R. Gilchrist ,  Vikram Singh ,  Christopher Campbell ,  Richard Hertel ,  Alexander Kontos ,  Piero Sferlazzo ,  Tsung-Liang Chen

IPC分类号： H01L21/3065 ,  H05H1/24 ,  H01L21/308 ,  H01L21/66 ,  H01J37/32

CPC分类号： H05H1/24 ,  H01J37/32009 ,  H01J37/32357 ,  H01J37/3244 ,  H01J37/32834 ,  H01J2237/327 ,  H01L21/3065 ,  H01L21/308 ,  H01L22/12 ,  H01L22/20

摘要： An apparatus to treat a substrate. The apparatus may include a reactive gas source having a reactive gas outlet disposed in a process chamber, the reactive gas outlet to direct a first reactive gas to the substrate; a plasma chamber coupled to the process chamber and including an extraction plate having an extraction aperture extending along a first direction, disposed within the process chamber and movable along a second direction perpendicular to the first direction between a first position facing the reactive gas source and a second position facing the extraction aperture; and a gas flow restrictor disposed between the reactive gas outlet and the extraction aperture, the gas flow restrictor defining a differential pumping channel between at least the plasma chamber and substrate stage.

公开(公告)号：US20180092195A1

公开(公告)日：2018-03-29

申请号：US15562642

申请日：2016-04-14

申请人： MITSUBISHI HEAVY INDUSTRIES, LTD.

发明人： Shingo NISHIKATA ,  Yoshikatsu KURODA ,  Hiroshi IKEBUCHI ,  Koichi HAMAMOTO ,  Tomoya MORIOKA ,  Atsushi OCHIAI

IPC分类号： H05H1/24 ,  F41H13/00

CPC分类号： H05H1/24 ,  F41H11/00 ,  F41H13/005 ,  F41H13/0093 ,  H05H2277/00

摘要： An electromagnetic pulse protecting method includes: searching a threat 2 that generates an electromagnetic pulse 2a; and generating plasma 6 in a light-condensed point 4 by condensing a laser beam 5 on a light-condensed point 4 in response to detection of the threat 2. Thus, various protection objects which contain a protection object having an electric opening indispensably can be protected from an attack by the electromagnetic pulse.

公开(公告)号：US20180002199A1

公开(公告)日：2018-01-04

申请号：US15707062

申请日：2017-09-18

申请人： NGK Insulators, Ltd.

发明人： Takashi YOKOYAMA ,  Shoji TANGE ,  Hideki SHIMIZU ,  Kazunari YAMADA

IPC分类号： C02F1/46 ,  C02F1/50 ,  H05H1/24

CPC分类号： C02F1/4608 ,  C02F1/50 ,  C02F1/78 ,  C02F2001/46133 ,  C02F2201/46135 ,  C02F2201/46175 ,  C02F2201/4619 ,  C02F2209/235 ,  C02F2303/04 ,  H05H1/24 ,  H05H1/2406 ,  H05H2001/2418 ,  H05H2001/2437 ,  H05H2245/121

摘要： A pulsed voltage is repeatedly applied between a first electrode and a second electrode to which a gas is supplied, a plasma is generated between the first electrode and the second electrode, and an active species is produced in the plasma. The energy necessary for plasma generation is set to a value greater than or equal to 1.8 W/cm3 and less than or equal to 8.5 W/cm3.

公开(公告)号：US09820369B2

公开(公告)日：2017-11-14

申请号：US14770347

申请日：2014-02-25

申请人： University of Florida Research Foundation, Incorporated

发明人： Subrata Roy

IPC分类号： H05H1/24 ,  B64C23/00 ,  F15D1/00

CPC分类号： H05H1/24 ,  B64C23/005 ,  B64C2230/12 ,  F15D1/0075 ,  H05H1/2406 ,  H05H2001/2412 ,  Y02T50/166

摘要： Embodiments of the invention relate to a method and apparatus for providing high thrust density plasma, and/or high control authority plasma. In specific embodiments, such high thrust density, and/or high control authority, plasma can be at or near atmospheric pressure. Embodiments pertain to a method and apparatus that use electron confinement via one or more magnetic fields, and/or one or more electric fields, in a manner to improve the ionization due to surface plasma actuators. Specific embodiments can improve ionization by several orders of magnitude. This improved ionization can result in a high electric field inside the sheath for the same applied voltage and can result in very high thrust.