- 专利标题： METHODS AND SYSTEMS FOR IMPROVING PLASMA IGNITION STABILITY
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申请号： US17732662申请日： 2022-04-29
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公开(公告)号： US20230352309A1公开(公告)日： 2023-11-02
- 发明人: Ping-Hsun Lin , Hung-Yi Tsai , Hao-Ping Cheng , Ta-Cheng Lien , Hsin-Chang Lee
- 申请人： Taiwan Semiconductor Manufacturing Company
- 申请人地址： TW Hsinchu
- 专利权人： Taiwan Semiconductor Manufacturing Company
- 当前专利权人： Taiwan Semiconductor Manufacturing Company
- 当前专利权人地址： TW Hsinchu
- 主分类号： H01L21/3065
- IPC分类号： H01L21/3065 ; H01J37/32 ; H05H1/24 ; H01J37/22 ; H01L21/308
摘要：
Methods for plasma stability in a plasma treatment tool are disclosed. A laser is positioned within a plasma treatment chamber within a skin depth of the electromagnetic field generated therein. The laser can be synchronized with the electrical triggering signals that generate the electromagnetic field. This scheme provides a stable and efficient method of plasma ignition.
公开/授权文献
- US3171702A Surface wiring system 公开/授权日：1965-03-02
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