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    Lithography mask
    1.
    发明授权
    Lithography mask 有权

    公开(公告)号：US11899357B2

    公开(公告)日：2024-02-13

    申请号：US17321852

    申请日：2021-05-17

    申请人： Taiwan Semiconductor Manufacturing Company, Ltd.

    发明人： Chien-Cheng Chen ,  Huan-Ling Lee ,  Ta-Cheng Lien ,  Chia-Jen Chen ,  Hsin-Chang Lee

    IPC分类号： G03F1/32

    CPC分类号： G03F1/32

    摘要： A mask for use in a semiconductor lithography process includes a substrate, a mask pattern disposed on the substrate, and a light absorbing border surrounding the mask pattern. The light absorbing border is inset from at least two edges of the substrate to define a peripheral region outside of the light absorbing border. In some designs, a first peripheral region extends from an outer perimeter of the light absorbing border to a first edge of the substrate, and a second peripheral region that extends from the outer perimeter of the light absorbing border to a second edge of the substrate, where the first edge of the substrate and the second edge of the substrate are on opposite sides of the mask pattern.

    Enhancing lithography operation for manufacturing semiconductor devices
    3.
    发明授权
    Enhancing lithography operation for manufacturing semiconductor devices 有权

    公开(公告)号：US11550229B1

    公开(公告)日：2023-01-10

    申请号：US17351948

    申请日：2021-06-18

    申请人： TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

    发明人： Yi-Chen Su ,  Tzu-Yi Wang ,  Ta-Cheng Lien

    IPC分类号： G03F7/20

    摘要： A method of treating a surface of a reticle includes retrieving a reticle from a reticle library and transferring the reticle to a treatment device. The surface of the reticle is treated in the treatment device by irradiating the surface of the reticle with UV radiation while ozone fluid is over the surface of the reticle for a predetermined irradiation time. After the treatment, the reticle is transferred to an exposure device for lithography operation to generate a photo resist pattern on a wafer. A surface of the wafer is imaged to generate an image of the photo resist pattern on the wafer. The generated image of the photo resist pattern is analyzed to determine critical dimension uniformity (CDU) of the photo resist pattern. The predetermined irradiation time is increased if the CDU does not satisfy a threshold CDU.

    METHODS FOR REMOVING CATALYST PARTICLES FROM NANOTUBE FILMS
    4.
    发明申请
    METHODS FOR REMOVING CATALYST PARTICLES FROM NANOTUBE FILMS 有权

    公开(公告)号：US20220413378A1

    公开(公告)日：2022-12-29

    申请号：US17722457

    申请日：2022-04-18

    申请人： Taiwan Semiconductor Manufacturing Company

    发明人： Ping-Hsun Lin ,  Pei-Cheng Hsu ,  Huan-Ling Lee ,  Ta-Cheng Lien ,  Hsin-Chang Lee ,  Chin-Hsiang Lin

    IPC分类号： G03F1/64

    摘要： Methods for removing a catalyst particle from a nanotube film used in a photolithographic patterning process are disclosed. The catalyst particle is identified based on its size in the nanotube film. This identification can be done using an inspection device such as a confocal microscope, which permits comparison of images taken in two or more separate focal planes to determine the size of particles. The catalyst particle is then exposed to a first absorption wavelength using a laser, which is selectively absorbed by the catalyst particle and which heats the catalyst particle to remove the catalyst particle from the nanotube film. Optionally, the catalyst particle-free nanotube film can be further exposed to a second absorption wavelength which is selectively absorbed by the film and promotes repair of the film. The resulting nanotube film can be used in a pellicle membrane.

    Pellicle assembly and fabrication methods thereof
    5.
    发明授权
    Pellicle assembly and fabrication methods thereof 有权

    公开(公告)号：US10036951B2

    公开(公告)日：2018-07-31

    申请号：US14726317

    申请日：2015-05-29

    申请人： Taiwan Semiconductor Manufacturing Company, Ltd.

    发明人： Pei-Cheng Hsu ,  Chih-Cheng Lin ,  Hsin-Chang Lee ,  Ta-Cheng Lien ,  Anthony Yen

    IPC分类号： G03B27/62 ,  G03F1/64 ,  G03F7/20

    CPC分类号： G03F1/64 ,  G03F7/70741

    摘要： A method for fabricating a pellicle assembly for a lithography process includes fabricating a pellicle frame including a sidewall having a porous material. In some embodiments, the pellicle frame is subjected to an anodization process to form the porous material. The porous material includes a plurality of pore channels extending, in a direction perpendicular to an exterior surface of the sidewall, from the exterior surface to an interior surface of the sidewall. In various embodiments, a pellicle membrane is formed, and the pellicle membrane is attached to the pellicle frame such that the pellicle membrane is suspended by the pellicle frame. Some embodiments disclosed herein further provide a system including a membrane and a pellicle frame that secures the membrane across the pellicle frame. In some examples, a portion of the pellicle frame includes a porous material, where the porous material includes the plurality of pore channels.

    PELLICLE ASSEMBLY AND METHOD OF MAKING SAME
    7.
    发明公开
    PELLICLE ASSEMBLY AND METHOD OF MAKING SAME 审中-公开

    公开(公告)号：US20240345472A1

    公开(公告)日：2024-10-17

    申请号：US18751858

    申请日：2024-06-24

    申请人： Taiwan Semiconductor Manufacturing Company, Ltd.

    发明人： Hsin-Chang Lee ,  Pei-Cheng Hsu ,  Ta-Cheng Lien ,  Li-Jui Chen ,  Tsai-Sheng Gau ,  Chin-Hsiang Lin

    IPC分类号： G03F1/64 ,  H01L21/033

    CPC分类号： G03F1/64 ,  H01L21/0337

    摘要： A method for preparing a pellicle assembly includes reducing the thickness of one or more initial membrane(s) to obtain a pellicle membrane. The pellicle membrane is then affixed to a mounting frame to obtain the pellicle assembly. Compressive pressure can be applied to reduce the thickness of the initial membrane(s). Alternatively, the thickness can be reduced by stretching the initial membrane(s) to obtain an extended membrane. A mounting frame is then affixed to a portion of the extended membrane. The mounting frame and the portion of the extended membrane are then separated from the remainder of the extended membrane to obtain the pellicle assembly. The resulting pellicle assemblies include a pellicle membrane that is attached to a mounting frame. The pellicle membrane can be formed from nanotubes and has a combination of high transmittance, low deflection, and small pore size.