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公开(公告)号：US20170128604A1
公开(公告)日：2017-05-11
申请号：US15415187
申请日：2017-01-25
申请人： NGK INSULATORS, LTD.
CPC分类号： A61L2/18 , A23L3/00 , A23V2002/00 , A61L2/26 , B01F3/04 , B01F3/04503 , B01F5/04 , B01F5/0413 , B01F15/02 , B01J19/08 , B01J19/088 , B01J2219/0833 , B01J2219/0884 , B01J2219/0896 , C02F1/4608 , C02F1/50 , C02F2201/46175 , C02F2301/046 , C02F2303/04 , C02F2305/023 , H05H1/24
摘要： A treatment apparatus and a sterilization apparatus each include a liquid reservoir portion configured to store a treatment subject liquid, a plasma generation portion configured to generate a plasma on or above a liquid surface of the treatment subject liquid, and a bubble supply portion configured to generate a bubble containing the generated plasma on or above the liquid surface and configured to supply the bubble into the treatment subject liquid. Thus, the plasma is generated on or above the liquid surface of the treatment subject liquid, and the bubble containing the generated plasma is generated and supplied into the treatment subject liquid.
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公开(公告)号：US20180002199A1
公开(公告)日：2018-01-04
申请号：US15707062
申请日：2017-09-18
申请人： NGK Insulators, Ltd.
发明人： Takashi YOKOYAMA , Shoji TANGE , Hideki SHIMIZU , Kazunari YAMADA
CPC分类号： C02F1/4608 , C02F1/50 , C02F1/78 , C02F2001/46133 , C02F2201/46135 , C02F2201/46175 , C02F2201/4619 , C02F2209/235 , C02F2303/04 , H05H1/24 , H05H1/2406 , H05H2001/2418 , H05H2001/2437 , H05H2245/121
摘要： A pulsed voltage is repeatedly applied between a first electrode and a second electrode to which a gas is supplied, a plasma is generated between the first electrode and the second electrode, and an active species is produced in the plasma. The energy necessary for plasma generation is set to a value greater than or equal to 1.8 W/cm3 and less than or equal to 8.5 W/cm3.
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