公开(公告)号：US20250069845A1

公开(公告)日：2025-02-27

申请号：US18456246

申请日：2023-08-25

Applicant: c/o FEI Company

Inventor： Neel Leslie ,  James Vickers

IPC: H01J37/244 ,  H01J37/04 ,  H01J37/22 ,  H01J37/26 ,  H01J37/28

Abstract: Systems, components, methods, and algorithms for generating difference data are described. A computer-implemented method includes directing a first pulse of charged particles toward a sample. The method can include generating first detector data based at least in part on interactions between the charged particles of the first pulse and the sample. The method can include directing a second pulse of charged particles toward the sample. The method can include generating second detector data based at least in part on interactions between the charged particles of the second pulse and the sample. The method can also include generating difference data using the first detector data and the second detector data, wherein the difference data describe a change between an “on” state of the sample and an “off” state of the sample.

公开(公告)号：US20250029806A1

公开(公告)日：2025-01-23

申请号：US18395805

申请日：2023-12-26

Applicant: New York Structural Biology Center

Inventor： Eugene Yue Dao Chua ,  Lambertus Michael Alink

IPC: H01J37/04 ,  G01N23/04

Abstract: An optical system of a Transmission Electron Microscope (TEM) is configured to use a square-shaped electron beam. Preferably, the square-shaped electron beam is produced by using an aperture with a square hole positioned in an aperture plane of TEM's beam shaping aperture (typically, the C2 lens). The square beam enables exhaustive tiling and data collection, enabling the complete imaging of large biological objects. In single particle analysis, a square beam also speeds up data collection rates. These improvements come with no significant loss in imaging quality compared to the standard round beam method of imaging.

公开(公告)号：US20240258062A1

公开(公告)日：2024-08-01

申请号：US18560707

申请日：2021-05-27

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Shota AIDA ,  Hisayuki TAKASU ,  Kento HORINOUCHI

IPC: H01J37/08 ,  H01J37/04 ,  H01J37/305

CPC classification number: H01J37/08 ,  H01J37/045 ,  H01J37/3053 ,  H01J2237/04735 ,  H01J2237/24585

Abstract: In a state in which an ion beam from an ion source 101 is shielded by a shutter 102, an ion milling apparatus applies a discharge voltage Vd between an anode 203 and cathodes 201 and 202 and an acceleration voltage Va between the anode and an acceleration electrode 205 with respect to the ion source, and retracts the shutter by a shutter drive source 103 to a position where the ion beam is not shielded after any one of a discharge current flowing between the anode and the cathodes due to discharge and an ion beam current flowing caused by irradiation on the shutter the ion beam falls below a predetermined reference value.

公开(公告)号：US12009174B2

公开(公告)日：2024-06-11

申请号：US17651278

申请日：2022-02-16

Applicant: NUFLARE TECHNOLOGY, INC.

Inventor： Kazuhiro Kishi ,  Munehiro Ogasawara

IPC: H01J37/04 ,  H01J37/26 ,  H01J37/317

CPC classification number: H01J37/045 ,  H01J37/3174 ,  H01J37/26 ,  H01J2237/0435

Abstract: A blanking deflector according to an embodiment includes: a first electrode comprising a first insulator, a first material film coating all surfaces of the first insulator and having lower resistance than the first insulator, and a first low-resistance film coating part or all of surfaces of the first material film and having lower resistance than the first material film; and a second electrode comprising a second insulator, a second material film coating all surfaces of the second insulator and having lower resistance than the second insulator, and a second low-resistance film coating part or all of surfaces of the second material film and having lower resistance than the second material film, wherein the blanking deflector controls whether to irradiate a specimen with a charged particle beam by causing the charged particle beam to pass between the first electrode and the second electrode.

公开(公告)号：US11993011B1

公开(公告)日：2024-05-28

申请号：US17152942

申请日：2021-01-20

Applicant: National Technology & Engineering Solutions of Sandia, LLC

Inventor： Eric Langlois ,  Judith Maria Lavin

IPC: B29C64/209 ,  B33Y30/00 ,  B33Y80/00 ,  B81C1/00 ,  H01J37/04

CPC classification number: B29C64/209 ,  B81C1/00373 ,  H01J37/04 ,  B33Y30/00 ,  B33Y80/00 ,  B81C2201/0188 ,  H01J2237/31732

Abstract: Plasma micro nozzle adapters having various configurations and operating principles are disclosed. The plasma micro nozzle adapter is employed with a commercial plasma jet printer to produce smaller printed features than those possible with the original plasma jet printer. In a first class of embodiments, the plasma micro nozzle adapter narrows a plasma jet using electrostatic or magnetostatic lensing, permitting the printing of ceramic, metallic, dielectric, or plastic features with line widths of 10 μm or less. In a second class of embodiments, the plasma micro nozzle adapter narrows the plasma jet using a gas sheath. By adjusting the flow rate or pressure of the gas used to form the gas sheath, the cross-sectional shape of the plasma jet may form, for example, an ellipse, thereby controlling the width of the printed feature. A third class of embodiments employs both electrostatic (or magnetostatic) lensing along with the gas sheath.

公开(公告)号：US20240123472A1

公开(公告)日：2024-04-18

申请号：US17827123

申请日：2022-05-27

Applicant: Global Plasma Solutions, Inc.

Inventor： Charles Houston WADDELL

IPC: B08B1/32 ,  B01D53/32 ,  B03C3/74 ,  H01J37/04 ,  H01T23/00

CPC classification number: B08B1/32 ,  B01D53/32 ,  B03C3/743 ,  H01J37/04 ,  H01T23/00

Abstract: A self-cleaning ion generator device includes a first portion with a base portion that extends to an outer edge and a first pair and a second pair of opposed sidewalls extending upwardly from the outer edge and intersect at corners, forming a cavity therein. A second portion includes a base portion that extends to an outer edge selectively secured to the first portion forming a housing. At least one ion emitting device extending from the housing, and at least one cleaning apparatus for cleaning the at least one ion emitting device.

公开(公告)号：US11903755B2

公开(公告)日：2024-02-20

申请号：US16910088

申请日：2020-06-24

Applicant: Weng-Dah Ken ,  Fang-Chi Kan

Inventor： Weng-Dah Ken ,  Fang-Chi Kan

IPC: A61B6/00 ,  G01N37/00 ,  G01B9/02 ,  H01J37/244 ,  G01N23/20 ,  H01J37/26 ,  G01B15/00 ,  G04F5/14 ,  H01J37/04

CPC classification number: A61B6/4258 ,  A61B6/4035 ,  G01B9/02 ,  G01B15/00 ,  G01N23/20 ,  G01N37/005 ,  G04F5/14 ,  H01J37/04 ,  H01J37/244 ,  H01J37/26 ,  G01B2290/55 ,  H01J2237/06383 ,  H01J2237/24557 ,  H01J2237/24571 ,  H01J2237/24578 ,  H01J2237/24585 ,  H01J2237/2614

Abstract: A non-contact angle measuring apparatus includes a matter-wave and energy (MWE) particle source and a detector. The MWE particle source is used for generating boson or fermion particles. The detector is used for detecting a plurality peaks or valleys of an interference pattern generated by 1) the boson or fermion particles corresponding to a slit, a bump, or a hole of a first plane and 2) matter waves' wavefront-split associated with the boson or fermion particles reflected by a second plane, wherein angular locations of the plurality peaks or valleys of the interference pattern, a first distance between a joint region of the first plane and the second plane, and a second distance between the detector and the slit are used for deciding an angle between the first plane and the second plane.

公开(公告)号：US11837429B2

公开(公告)日：2023-12-05

申请号：US17663442

申请日：2022-05-16

Applicant: Nuflare Technology, Inc.

Inventor： Shuji Yoshino

IPC: H01J37/04 ,  H01J37/317 ,  H01J37/147

CPC classification number: H01J37/045 ,  H01J37/1472 ,  H01J37/3177 ,  H01J2237/026 ,  H01J2237/0437 ,  H01J2237/1504

Abstract: A blanking aperture array unit according to the present embodiment includes a chip configured to control a charged particle beam by blanking control of switching whether to irradiate a target with the charged particle beam; a substrate having the chip mounted thereon; a wire configured to electrically connect pads on the chip to the substrate and transmit a control signal for the blanking control from the substrate to the chip through the pads; and a conductive covering member having a first end connected to the substrate and a second end located on the chip, the covering member being provided from the first end to the second end to cover the wire while maintaining electrical insulation from the wire, and at least two end sides of the second end of the covering member are nearer a central portion of the chip than locations of the pads on the chip.

公开(公告)号：US11804360B2

公开(公告)日：2023-10-31

申请号：US17778758

申请日：2020-11-04

Applicant: NuFlare Technology, Inc.

Inventor： Tsubasa Nanao ,  Hirofumi Morita ,  Takanao Touya

IPC: H01J37/304 ,  H01J37/12 ,  H01J37/14 ,  H01J37/317 ,  H01J37/04 ,  G03F7/00 ,  H01J37/09

CPC classification number: H01J37/304 ,  G03F7/7005 ,  G03F7/7055 ,  G03F7/70383 ,  H01J37/12 ,  H01J37/14 ,  H01J37/3177 ,  H01J37/045 ,  H01J37/09 ,  H01J2237/0435

Abstract: The present invention quickly calculates values of optimal excitation parameters which are set in lenses in multiple stages. A multi charged particle beam adjustment method includes forming a multi charged particle beam, calculating, for each of lenses in two or more stages disposed corresponding to object lenses in two or more stages, a first rate of change and a second rate of change in response to change in at least an excitation parameter, the first rate of change being a rate of change in a demagnification level of a beam image of the multi charged particle beam, the second rate of change being a rate of change in a rotation level of the beam image, and calculating a first amount of correction to the excitation parameter of each of the lenses based on an amount of correction to the demagnification level and the rotation level of the beam image, the first rate of change, and the second rate of change.

公开(公告)号：US11798778B2

公开(公告)日：2023-10-24

申请号：US17379815

申请日：2021-07-19

Applicant: ATTOLIGHT AG

Inventor： Christian Monachon ,  Matthew John Davies ,  Fabrice Grondin

IPC: H01J37/22 ,  H01J37/28 ,  H01J37/04

CPC classification number: H01J37/222 ,  H01J37/045 ,  H01J37/28 ,  H01J2237/2808

Abstract: Method for investigating samples by time-series emission of cathodoluminescence (CL) microscope having electron beam and light sensor. In discovery scan, changes caused by the electron beam are unknown, in an inspection scan changes have already been identified in similar sample. Discovery scan starts by setting parameters of the electron beam to irradiate at a first rate of dose; flushing the buffer of the light sensor; scanning the electron beam over an area of interest on the sample while collecting CL emission with the light sensor, while preventing any reading of the data from the buffer until the entire scanning has been completed; once the entire scanning has been completed, blanking the electron beam and interrogating the buffer to identify a first CL image; and then interrogating the buffer to fetch all remaining CL images and tagging all fetched CL images according to time sequence starting from the first CL image.