Plasma Purification Device For Purifying Catering Oil Fume And Method For Purifying Catering Oil Fume

    公开(公告)号:US20240261723A1

    公开(公告)日:2024-08-08

    申请号:US18565368

    申请日:2023-07-19

    发明人: Xing ZHANG Yubin CHI

    IPC分类号: B01D53/32 B01D53/86

    摘要: The present disclosure discloses a plasma purification device for purifying catering oil fume and a method for purifying catering oil fume, relating to the technical field of atmospheric pollution control. The plasma purification device successively includes in a flow direction of airflow an inlet, a rotary discharge module configured to negatively charge oil fume particulate matter with a particle size between 2 μm and 50 μm in the catering oil fume; an electrostatic adsorption module configured to capture negatively charged oil fume particulate matter; a back corona catalytic module configured to treat VOCs in the catering oil fume; and an outlet. The rotary discharge module includes a central rod arranged parallel to the flow direction of airflow and a plurality of barbed corona electrodes arranged around the central rod.

    SIDESTREAM SMOKE REMOVING DEVICE INCLUDING PLASMA ION FILTER

    公开(公告)号:US20240225090A1

    公开(公告)日:2024-07-11

    申请号:US18001003

    申请日:2022-10-28

    申请人: KT&G CORPORATION

    摘要: A sidestream smoke removing device includes a housing having a smoking space defined therein, an article inserting part positioned on one end of the housing and having an open area through which a smoking article is inserted into the smoking space, and a sidestream smoke processing part positioned at a distance from an upstream end of the smoking article inserted into the smoking space and configured to process sidestream smoke produced from the smoking article. The sidestream smoke processing part includes a plasma ion filter configured to generate plasma ions using a high voltage electrode and a ventilation fan configured to allow the sidestream smoke to be discharged through the plasma ion filter. The sidestream smoke removing device obtains superior effects in terms of a sidestream smoke removal rate and deodorizing performance without significantly reducing the flow rate after the application of the filter.

    Exhaust pipe device
    5.
    发明授权

    公开(公告)号:US11872524B2

    公开(公告)日:2024-01-16

    申请号:US17358202

    申请日:2021-06-25

    IPC分类号: B01D53/32 F01N3/08

    摘要: An exhaust pipe device according to an embodiment includes a dielectric pipe; a radio-frequency electrode; a ground electrode; and a plasma generation circuit. The radio-frequency electrode is disposed on an outer periphery side of the dielectric pipe and a radio-frequency voltage is applied to the radio-frequency electrode. The ground electrode is disposed on an end portion side of the dielectric pipe such that a distance from the radio-frequency electrode is smaller on an inner side than on an outer side of the dielectric pipe, and a ground potential is applied to the ground electrode. The plasma generation circuit generates plasma inside the dielectric pipe. The exhaust pipe device functions as a part of an exhaust pipe disposed between a film forming chamber and a vacuum pump that exhausts gas inside the film forming chamber.

    Low temperature plasma reactor having adaptive rotating electrode

    公开(公告)号:US11786863B1

    公开(公告)日:2023-10-17

    申请号:US18167906

    申请日:2023-02-13

    IPC分类号: B01J19/08 B01D53/32 H05H1/24

    摘要: A low-temperature plasma reactor having an adaptive rotating electrode includes a frame. A reaction tube is arranged inside the frame. A fixing cover is arranged on each of two sides of the frame. The fixing cover defines a through hole communicating with an inside of the reaction tube. The through hole in one of the two sides serves as an air inlet hole, and the through hole in the other one of the two sides serves as an air outlet hole. A rotatable inner electrode is arranged inside the reaction tube, a plurality of groups of discharging needles are arranged on a surface of the inner electrode. A rotating fan is arranged on the inner electrode and is disposed on a side of the air inlet hole. The gas flow drives the inner electrode and the discharging needles to rotate, and a motor drive is not required.

    DEVICE AND METHOD FOR TREATING WASTE GAS THROUGH VARIABLE-DIAMETER ACCELERATION-BASED FREE RADICAL SHOWER IN COMBINATION WITH CATALYSIS

    公开(公告)号:US20230311059A1

    公开(公告)日:2023-10-05

    申请号:US18012986

    申请日:2022-01-27

    IPC分类号: B01D53/32 B01D53/86

    摘要: The invention provides a method for monitoring health state of blade root fastener, comprising the following steps: obtaining a sequence of acceleration signals representing the lateral vibration of the nacelle and a sequence of rotational speed signals representing the rotational speed of the rotor; analyzing the sequence of acceleration signals and the sequence of rotational speed signals to determine the amplitude of the nacelle at 2-time-frequncy of the rotational speed of the rotor; and determining the health state of the blade root fastener based on the amplitude. The invention also provides a system for monitoring the health state of the blade root fastener. Through the present invention, the health state of the blade root fastener can be determined with low cost and high precision, thereby improving the operation efficiency and operation safety of the wind turbine.

    DEVICE FOR TREATING SEMICONDUCTOR PROCESS EXHAUST GAS

    公开(公告)号:US20230271133A1

    公开(公告)日:2023-08-31

    申请号:US18195360

    申请日:2023-05-09

    发明人: Jong Pil YOON

    IPC分类号: B01D53/32 B01D53/68 H01L21/67

    摘要: Provided is an exhaust gas treatment apparatus that treats exhaust gas generated from semiconductor process and directed to a vacuum pump. Exhaust gas treatment apparatus includes a plasma generating unit for generating plasma, a reaction chamber in which perfluoride is decomposed by the plasma to generate a decomposition gas, and gas supplying unit for supplying the decomposition gas from the reaction chamber to a processing chamber in which the exhaust gas from the semiconductor process is introduced and treated exhaust gas is discharged to the vacuum pump. Decomposition gas reacts with the exhaust gas in the processing chamber to suppress generation of salt in solid state by a component of the exhaust gas.