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    THERMAL PLASMA TREATMENT METHOD FOR SULFUR HEXAFLUORIDE DEGRADATION
    1.
    发明公开
    THERMAL PLASMA TREATMENT METHOD FOR SULFUR HEXAFLUORIDE DEGRADATION 审中-公开

    公开(公告)号：US20240098870A1

    公开(公告)日：2024-03-21

    申请号：US17948618

    申请日：2022-09-20

    申请人： XI'AN JIAOTONG UNIVERSITY

    发明人： Hao SUN ,  Mingzhe RONG ,  Yi WU ,  Yunshun GUO ,  Hu LONG

    IPC分类号： H05H1/42 ,  H05H1/28 ,  H05H1/34

    CPC分类号： H05H1/42 ,  H05H1/28 ,  H05H1/34 ,  H05H2245/17

    摘要： The present disclosure discloses a thermal plasma treatment method for sulfur hexafluoride (SF6) degradation. In the thermal plasma treatment method for SF6 degradation, Ar is input into a thermal plasma generator as a carrier gas; annular electrodes are electrically connected to a direct current power supply to generate an arc plasma region in the presence of the carrier gas Ar; to-be-reacted SF6 and to-be-reacted H2 in a predetermined ratio are input into the arc plasma region to generate hydrogen radicals as well as fluorine radicals, and the hydrogen radicals and the fluorine radicals are bonded with each other to generate HF to inhibit the self-recovery reaction of SF6; and final products include HF and elemental S.

    Low temperature plasma reactor having adaptive rotating electrode
    2.
    发明授权
    Low temperature plasma reactor having adaptive rotating electrode 有权

    公开(公告)号：US11786863B1

    公开(公告)日：2023-10-17

    申请号：US18167906

    申请日：2023-02-13

    申请人： HANGZHOU CITY UNIVERSITY

    发明人： Qi Qiu ,  Pengfei Wang ,  Jiahong Fu ,  Xingliang Liu ,  Zhaozhe Deng

    IPC分类号： B01J19/08 ,  B01D53/32 ,  H05H1/24

    CPC分类号： B01D53/32 ,  B01J19/088 ,  H05H1/2431 ,  B01D2259/818 ,  H05H2245/17

    摘要： A low-temperature plasma reactor having an adaptive rotating electrode includes a frame. A reaction tube is arranged inside the frame. A fixing cover is arranged on each of two sides of the frame. The fixing cover defines a through hole communicating with an inside of the reaction tube. The through hole in one of the two sides serves as an air inlet hole, and the through hole in the other one of the two sides serves as an air outlet hole. A rotatable inner electrode is arranged inside the reaction tube, a plurality of groups of discharging needles are arranged on a surface of the inner electrode. A rotating fan is arranged on the inner electrode and is disposed on a side of the air inlet hole. The gas flow drives the inner electrode and the discharging needles to rotate, and a motor drive is not required.

    Thermal plasma treatment method for sulfur hexafluoride degradation
    3.
    发明授权
    Thermal plasma treatment method for sulfur hexafluoride degradation 有权

    公开(公告)号：US12101868B2

    公开(公告)日：2024-09-24

    申请号：US17948618

    申请日：2022-09-20

    申请人： XI'AN JIAOTONG UNIVERSITY

    发明人： Hao Sun ,  Mingzhe Rong ,  Yi Wu ,  Yunshun Guo ,  Hu Long

    IPC分类号： H05H1/42 ,  H05H1/28 ,  H05H1/34

    CPC分类号： H05H1/42 ,  H05H1/28 ,  H05H1/34 ,  H05H2245/17

    摘要： The present disclosure discloses a thermal plasma treatment method for sulfur hexafluoride (SF6) degradation. In the thermal plasma treatment method for SF6 degradation, Ar is input into a thermal plasma generator as a carrier gas; annular electrodes are electrically connected to a direct current power supply to generate an arc plasma region in the presence of the carrier gas Ar; to-be-reacted SF6 and to-be-reacted H2 in a predetermined ratio are input into the arc plasma region to generate hydrogen radicals as well as fluorine radicals, and the hydrogen radicals and the fluorine radicals are bonded with each other to generate HF to inhibit the self-recovery reaction of SF6; and final products include HF and elemental S.

    SEMICONDUCTOR PROCESS SYSTEM AND GAS TREATMENT METHOD
    4.
    发明公开
    SEMICONDUCTOR PROCESS SYSTEM AND GAS TREATMENT METHOD 审中-公开

    公开(公告)号：US20240096649A1

    公开(公告)日：2024-03-21

    申请号：US18368422

    申请日：2023-09-14

    申请人： SAMSUNG ELECTRONICS CO., LTD.

    发明人： Wonsu LEE ,  Hyunseok KIM ,  Jungdae PARK ,  Kimoon LEE ,  Jong-San CHANG

    IPC分类号： H01L21/67 ,  H05H1/24 ,  H05H1/26

    CPC分类号： H01L21/67017 ,  H05H1/2406 ,  H05H1/26 ,  H05H2245/17

    摘要： A gas treatment method, including: treating an exhaust gas discharged from a semiconductor process chamber using a gas treatment system; and discharging the treated exhaust gas, wherein the treating of the exhaust gas includes: operating a first thermal oxidizer to treat the exhaust gas discharged from the semiconductor process chamber, the first thermal oxidizer being connected to the semiconductor process chamber and allowing the treated exhaust gas to pass through a plasma processing apparatus connected to the first thermal oxidizer; stopping the operation of the first thermal oxidizer to perform maintenance on the first thermal oxidizer; and wherein the stopping the operation of the first thermal oxidizer comprises: performing maintenance on the first thermal oxidizer; and operating the plasma processing apparatus to treat the exhaust gas discharged from the semiconductor process chamber

    APPARATUS AND METHOD FOR ELECTRON IRRADIATION SCRUBBING
    6.
    发明公开
    APPARATUS AND METHOD FOR ELECTRON IRRADIATION SCRUBBING 审中-公开

    公开(公告)号：US20240316494A1

    公开(公告)日：2024-09-26

    申请号：US18578877

    申请日：2022-07-08

    申请人： DAPHNE TECHNOLOGY SA

    发明人： Juan Mario Michan ,  William Jamieson Ramsay ,  Dominik Neumayr

    IPC分类号： B01D53/32 ,  F01N3/08 ,  H05H1/24

    CPC分类号： B01D53/32 ,  F01N3/0892 ,  H05H1/2406 ,  B01D2257/504 ,  B01D2258/01 ,  B01D2258/02 ,  B01D2258/06 ,  B01D2259/818 ,  H05H2242/22 ,  H05H2245/17

    摘要： There is provided a dielectric barrier electrical discharge apparatus and corresponding system and method. The apparatus comprises: at least two electrodes arranged in use to provide at least one anode and at least one cathode, the at least two electrodes being separated to allow a fluid to be present between the electrodes in use, and at least one of the electrodes has a dielectric portion connected to at least part of said electrode; a sub-macroscopic structure connected to at least one of the at least two electrodes and/or to the dielectric portion; and a drive circuit connected to each of the at least two electrodes and arranged in use to establish an electric field between the electrodes, wherein in response to the presence of the electric field between the electrodes, the sub-macroscopic structure is arranged to field-emit electrons and electrical discharge is establishable between the dielectric portion and one of the at least two electrodes, and the drive circuit is further arranged to provide real power to the fluid in use.