公开(公告)号：US09711420B1

公开(公告)日：2017-07-18

申请号：US15069608

申请日：2016-03-14

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Yuan-Yen Lo ,  Chia-Chu Liu ,  Ming-Jhih Kuo

IPC: G03F1/00 ,  G03F7/20 ,  G03C5/00 ,  H01L21/66

CPC classification number: H01L22/20 ,  G03F7/70625 ,  G03F7/70641 ,  H01L22/12 ,  H01L22/30 ,  H01L22/34

Abstract: A method includes processing a first silicon wafer using a first focus condition, the first silicon wafer comprising: a first test pattern and a second test pattern, the first test pattern and the second test pattern being different. The method further includes determining a first critical dimension for the first test pattern, determining a second critical dimension for the second test pattern, determining a delta focus value based on the first critical dimension and the second critical dimension, and processing a second silicon wafer with a second focus condition, the second focus condition based on the delta focus value.

公开(公告)号：US09522921B2

公开(公告)日：2016-12-20

申请号：US15152710

申请日：2016-05-12

Applicant: Sabic Global Technologies, B.V.

Inventor： Girish Koripelly ,  Mohamed Ashraf Moideen ,  Pradeep Jeevaji Nadkarni ,  Meghna Markanday

IPC: G02B5/23 ,  C07D498/10 ,  G02B1/04 ,  G03C1/00 ,  G03C5/00

CPC classification number: C07D498/10 ,  B29D11/00653 ,  G02B1/04 ,  C08L2666/70

Abstract: A photochromic dye comprising at least one compound characterized by Formula I:

公开(公告)号：US09235132B2

公开(公告)日：2016-01-12

申请号：US13641125

申请日：2011-04-13

Applicant: Serdar Manakli

Inventor： Serdar Manakli

IPC: G03B27/32 ,  G03B27/54 ,  G03C5/00 ,  G21G5/00 ,  H01J3/14 ,  G03F7/20 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/317

CPC classification number: G03F7/70091 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/31764 ,  H01J2237/31776 ,  Y10S430/143

Abstract: A lithography method based on the projection of cells, notably direct-write electron-beam lithography. One of the main limitations of the methods of this type in the prior art is the writing time. To overcome this limitation, according to the method of the invention, the size of the cells is increased to the maximum aperture of the lithography device. Advantageously, this size increase is obtained by modifying the size of the apertures of the projection stencil level closest to the substrate to be etched. Advantageously, a strip is added to the outside of the block to be etched onto which is radiated a dose calculated to optimize the process energy latitude. Advantageously, this strip is spaced apart from the edge of the block to be etched. Advantageously, the projected cells are not adjoining.

Abstract translation: 基于电池投影的光刻方法，特别是直写式电子束光刻技术。 在现有技术中这种类型的方法的主要限制之一是写入时间。 为了克服这个限制，根据本发明的方法，电池的尺寸增加到光刻装置的最大孔径。 有利地，通过改变最接近待蚀刻的基底的突起模板水平面的尺寸来获得这种尺寸增加。 有利的是，将带材加到要蚀刻的块的外部，辐射剂量被计算以优化过程能量纬度。 有利地，该条带与被蚀刻块的边缘间隔开。 有利地，投影单元不相邻。

公开(公告)号：US08976355B2

公开(公告)日：2015-03-10

申请号：US13597806

申请日：2012-08-29

Applicant: Stefan Cornelis Theodorus Van Der Sanden ,  Richard Johannes Franciscus Van Haren ,  Hubertus Johannes Gertrudus Simons ,  Remi Daniel Marie Edart ,  Xiuhong Wei ,  Michael Kubis ,  Irina Lyulina

Inventor： Stefan Cornelis Theodorus Van Der Sanden ,  Richard Johannes Franciscus Van Haren ,  Hubertus Johannes Gertrudus Simons ,  Remi Daniel Marie Edart ,  Xiuhong Wei ,  Michael Kubis ,  Irina Lyulina

IPC: G01B11/00 ,  G03F9/00 ,  G03C5/00 ,  G03F7/20

CPC classification number: G03F7/70616 ,  G03F7/70141 ,  G03F7/70633 ,  G03F9/7003 ,  G03F9/7088

Abstract: A substrate is loaded onto a substrate support of a lithographic apparatus, after which the apparatus measures locations of substrate alignment marks. These measurements define first correction information allowing the apparatus to apply a pattern at one or more desired locations on the substrate. Additional second correction information is used to enhance accuracy of pattern positioning, in particular to correct higher order distortions of a nominal alignment grid. The second correction information may be based on measurements of locations of alignment marks made when applying a previous pattern to the same substrate. The second correction information may alternatively or in addition be based on measurements made on similar substrates that have been patterned prior to the current substrate.

Abstract translation: 衬底被加载到光刻设备的衬底支撑件上，之后设备测量衬底对准标记的位置。 这些测量定义了第一校正信息，允许设备在衬底上的一个或多个所需位置上施加图案。 附加的第二校正信息用于增强图案定位的精度，特别是校正标称对准格栅的较高阶失真。 第二校正信息可以基于当对同一衬底施加先前图案时制作的对准标记的位置的测量。 第二校正信息可以替代地或另外基于在当前衬底之前已被图案化的类似衬底上进行的测量。

公开(公告)号：US08906802B2

公开(公告)日：2014-12-09

申请号：US13839284

申请日：2013-03-15

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Jeremy A. Wahl ,  Gerard M. Schmid ,  Richard A. Farrell ,  Chanro Park

IPC: H01L21/00 ,  G03C5/00 ,  H01L21/308

CPC classification number: H01L21/31144 ,  H01L21/0337 ,  H01L21/76816

Abstract: One illustrative method disclosed herein includes the steps of performing a directed self-assembly process to form a DSA masking layer, performing at least one process operation to remove at least one of the features of the DSA masking layer so as to thereby define a patterned DSA masking layer with a DSA masking pattern, performing at least one process operation to form a patterned transfer masking layer having a transfer masking pattern comprised of a plurality of features that define a plurality of openings in the transfer masking layer, wherein the transfer masking pattern is the inverse of the DSA masking pattern, and performing at least one etching process through the patterned transfer masking layer on a layer of material to form a plurality of trench/via features in the layer of material.

Abstract translation: 本文公开的一种说明性方法包括以下步骤：执行定向自组装过程以形成DSA掩模层，执行至少一个处理操作以去除DSA掩模层的至少一个特征，从而限定图案化DSA 具有DSA掩模图案的掩模层，执行至少一个处理操作以形成图案化的传输掩蔽层，其具有由在传送掩蔽层中限定多个开口的多个特征组成的传输掩蔽图案，其中传输掩蔽图案是 DSA掩模图案的反向，并且通过在材料层上的图案化转印掩模层进行至少一个蚀刻工艺以在材料层中形成多个沟槽/通孔特征。

公开(公告)号：US08895228B2

公开(公告)日：2014-11-25

申请号：US13666148

申请日：2012-11-01

Applicant: E I du Pont de Nemours and Company

Inventor： Carl Bernard Arnold ,  Masayuki Kato

IPC: G03F7/00 ,  G03F7/26 ,  G03C5/00 ,  G03F7/40 ,  G03F7/36

CPC classification number: G03F7/36 ,  G03F7/40

Abstract: The present invention pertains to a method for preparing a printing form from a photosensitive element by thermal treatment, wherein a gas jet emitting from a nozzle assembly impinges the exterior surface of the element to smooth or polish and mitigate marks and deformations that can be generated during development. Impingement with a heated gas jet provides surface polishing from rapid and specific convective heat flux to the exterior surface of the printing plate.

Abstract translation: 本发明涉及一种通过热处理从感光元件制备印刷形式的方法，其中从喷嘴组件发射的气体射流冲击该元件的外表面以使光滑或抛光并减轻可在此期间产生的痕迹和变形 发展。 用加热的气体射流冲击提供从快速和特定的对流热通量到印版的外表面的表面抛光。

公开(公告)号：US08883392B2

公开(公告)日：2014-11-11

申请号：US13917111

申请日：2013-06-13

Applicant: Stratasys Ltd.

Inventor： Eduardo Napadensky ,  David Brusilovsky

IPC: G03C5/00 ,  G03F7/00 ,  C08K3/18 ,  B41M3/00 ,  B29C67/00 ,  C08F22/10

CPC classification number: C08L71/00 ,  B29C64/112 ,  B29C64/40 ,  B29C67/0059 ,  B29C67/0092 ,  B33Y70/00 ,  B41M3/006 ,  C08F22/10 ,  C08L33/08 ,  C08L35/02 ,  G03F7/0037 ,  Y10T428/31554

Abstract: A radiation curing composition suitable for building a three-dimensional object by a solid freeform method is disclosed. The composition includes one or more mono-functional monomers where a respective polymer has a Glass Transition Temperature higher than about 60° C., one or more di-functional oligomers where a respective polymer has a Glass Transition Temperature lower than about 40° C. and a phase separation inducing component. The phase separation may be induced during curing, resulting in a non-clear cured material having an improved impact strength and higher elongation, when compared to similar compositions without a phase separation inducing component.

Abstract translation: 公开了一种适用于通过固体自由形成方法构建三维物体的辐射固化组合物。 组合物包括一种或多种单官能单体，其中各自的聚合物具有高于约60℃的玻璃化转变温度，一种或多种二官能低聚物，其中各自的聚合物具有低于约40℃的玻璃化转变温度。 和相分离诱导组分。 在固化过程中可能引起相分离，与没有相分离诱导组分的类似组合物相比，产生具有改善的冲击强度和较高伸长率的非透明固化材料。

公开(公告)号：US08854703B2

公开(公告)日：2014-10-07

申请号：US14022710

申请日：2013-09-10

Applicant: Panasonic Corporation

Inventor： Tatsuya Mukawa ,  Kazuki Saitou

IPC: H04N1/04 ,  H04N1/46 ,  G03F3/08 ,  G03C5/00 ,  G06K7/10 ,  H04N1/00 ,  H04N1/19 ,  H04N1/028 ,  H04N1/10 ,  H04N1/48 ,  H04N1/32 ,  H04N1/195 ,  H04N1/193

CPC classification number: H04N1/19 ,  H04N1/00342 ,  H04N1/00795 ,  H04N1/00827 ,  H04N1/02865 ,  H04N1/10 ,  H04N1/1013 ,  H04N1/193 ,  H04N1/195 ,  H04N1/19594 ,  H04N1/32138 ,  H04N1/48 ,  H04N2201/0081 ,  H04N2201/0434

Abstract: A document reading device for reading a page of a passport includes a mounting surface, a camera, an illumination light source for radiating illumination light that is, and an ultraviolet light source for radiating ultraviolet light to activate a fluorescent material on the page. The illumination light source is at a first edge perpendicular to a binding edge on the page and radiates illumination light in the direction intersecting with the first edge. The ultraviolet light source is at a second edge parallel to the binding edge and radiates ultraviolet light in the direction intersecting with the second edge. The illumination light source includes an infrared light source and a white light source. The document reading device has both an illumination light source and an ultraviolet light source, and can avoid image capturing in the specular reflection condition when the document is deformed.

Abstract translation: 用于读取护照页面的文件读取装置包括安装表面，照相机，用于照射照明光的照明光源和用于照射紫外光的紫外光源，以激活页面上的荧光材料。 照明光源处于与页面上的装订边缘垂直的第一边缘，并且在与第一边缘相交的方向上照射照明光。 紫外光源处于与装订边缘平行的第二边缘，并且在与第二边缘相交的方向上辐射紫外光。 照明光源包括红外光源和白光源。 文件读取装置具有照明光源和紫外线光源，并且可以避免当文稿变形时在镜面反射条件下的图像捕获。

公开(公告)号：US08731701B2

公开(公告)日：2014-05-20

申请号：US12733614

申请日：2008-08-21

Applicant: Wataru Tsukinoki ,  Yuichi Yamamoto

Inventor： Wataru Tsukinoki ,  Yuichi Yamamoto

IPC: B65B69/00 ,  B65G61/00 ,  B65H1/00 ,  C23C16/00 ,  G03C5/00 ,  G06F7/00 ,  G06F19/00 ,  H01L21/677

CPC classification number: H01L21/67745 ,  H01L21/67276

Abstract: After a cassette is mounted on a cassette mounting part, a control unit instructs a substrate treatment apparatus to start treatment on substrates in the cassette. Thereafter, the control unit indicates, to the substrate treatment apparatus, a cassette on the cassette mounting part to which a substrate is transferred at completion of the treatment. If the transfer destination cassette for the substrate at the completion of treatment has not been indicated when a number of remaining treatment steps for the substrate reaches a predetermined set number, an alarm is given from the substrate treatment apparatus. This alarm is sent from the substrate treatment apparatus to the control unit, and the control unit indicates a transfer destination cassette for the substrate.

Abstract translation: 在盒式磁带安装在盒安装部件上之后，控制单元指示基板处理设备开始对盒中的基板进行处理。 此后，控制单元在处理完成时向基板处理设备指示在盒安装部分上传送基板的盒。 如果当基板的剩余处理步骤数达到预定的设定数量时，在处理完成时用于基板的转印目的地盒未被指示，则从基板处理装置发出报警。 该报警从基板处理装置发送到控制单元，控制单元指示用于基板的转印目的地盒。

公开(公告)号：US08663895B2

公开(公告)日：2014-03-04

申请号：US12883935

申请日：2010-09-16

Applicant: Yoshihito Kobayashi

Inventor： Yoshihito Kobayashi

IPC: G03C5/00 ,  G03F7/00 ,  C03C25/68

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

Abstract: According to one embodiment, a method for manufacturing a template for imprinting includes preparing a first template having a device pattern and a plurality of identification patterns, and forming a second template by transferring the device pattern and at lest desired one of the identification patterns to a template substrate.

Abstract translation: 根据一个实施例，用于制造用于印记的模板的方法包括制备具有装置图案和多个识别图案的第一模板，以及通过将装置图案和至少所需的识别图案转移到第 模板底物。