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    Substrate comprising a mark
    1.
    发明授权
    Substrate comprising a mark 有权
    基材包括标记

    公开(公告)号：US08722179B2

    公开(公告)日：2014-05-13

    申请号：US11637215

    申请日：2006-12-12

    申请人： Richard Johannes Franciscus Van Haren ,  Bartolomeus Petrus Rijpers ,  Harminder Singh ,  Gerald Arthur Finken

    发明人： Richard Johannes Franciscus Van Haren ,  Bartolomeus Petrus Rijpers ,  Harminder Singh ,  Gerald Arthur Finken

    IPC分类号： B32B7/02 ,  H01L23/544

    CPC分类号： G03F9/7084 ,  G03F9/7076 ,  G03F9/708 ,  Y10T428/24942 ,  Y10T428/2495 ,  Y10T428/31504

    摘要： A substrate comprises a first mark and a second mark. The first mark comprises a first pattern with at least one mark feature formed by a first material and at least one further region formed by a second material. The first and second materials have different material characteristics with respect to a chemical-mechanical polishing process such that a step height in a direction substantially perpendicular to the surface of the substrate may be created by applying the chemical-mechanical polishing process. The second mark can be provided with a second step height by applying the chemical-mechanical polishing process. The second step height is substantially different from the first step height.

    摘要翻译： 衬底包括第一标记和第二标记。 第一标记包括具有由第一材料形成的至少一个标记特征的第一图案和由第二材料形成的至少一个另外的区域。 第一和第二材料相对于化学机械抛光工艺具有不同的材料特性，使得通过施加化学机械抛光工艺可以产生基本上垂直于衬底表面的方向上的台阶高度。 通过施加化学机械抛光工艺，第二标记可以提供第二级高度。 第二步高度与第一台阶高度大不相同。

    Sub-segmented alignment mark arrangement
    3.
    发明授权
    Sub-segmented alignment mark arrangement 有权
    分段对准标记布置

    公开(公告)号：US08203692B2

    公开(公告)日：2012-06-19

    申请号：US12482770

    申请日：2009-06-11

    申请人： Sami Musa ,  Richard Johannes Franciscus Van Haren ,  Sanjaysingh Lalbahadoersing

    发明人： Sami Musa ,  Richard Johannes Franciscus Van Haren ,  Sanjaysingh Lalbahadoersing

    IPC分类号： G03B27/68 ,  G03B27/42

    CPC分类号： G03B27/54 ,  G03F9/7076 ,  H01L23/544 ,  H01L2223/54466 ,  H01L2924/0002 ,  H01L2924/00

    摘要： An alignment mark on a substrate includes a periodic structure of a plurality of first elements and a plurality of second elements. The elements are arranged in an alternating repetitive sequence in a first direction. An overall pitch of the periodic structure is equal to a sum of a width of the first element and a width of the second element in the first direction. Each first element has a first periodic sub-structure with a first sub-pitch and each second element has a second periodic sub-structure with second sub-pitch. An optical property of the first element for interaction with a beam of radiation having a wavelength λ is different from the optical property of the second element. The overall pitch is larger than the wavelength λ, and each of the first and the second sub-pitch is smaller than the wavelength.

    摘要翻译： 衬底上的对准标记包括多个第一元件和多个第二元件的周期性结构。 元件沿第一方向以交替的重复序列排列。 周期性结构的整体间距等于第一元件的宽度和第二元件在第一方向上的宽度之和。 每个第一元件具有具有第一子间距的第一周期性子结构，并且每个第二元件具有具有第二子间距的第二周期性子结构。 用于与具有波长λ的辐射束相互作用的第一元件的光学性质不同于第二元件的光学性质。 总间距大于波长λ，第一和第二子间距都小于波长。

    Binary sinusoidal sub-wavelength gratings as alignment marks
    5.
    发明授权
    Binary sinusoidal sub-wavelength gratings as alignment marks 有权
    二进正弦亚波长光栅作为对准标记

    公开(公告)号：US07863763B2

    公开(公告)日：2011-01-04

    申请号：US11284407

    申请日：2005-11-22

    申请人： Richard Johannes Franciscus Van Haren ,  Sami Musa

    发明人： Richard Johannes Franciscus Van Haren ,  Sami Musa

    IPC分类号： H01L23/544

    CPC分类号： G03F9/7049 ,  G03F9/7076 ,  G03F9/7088

    摘要： The present invention relates to alignment marks for use on substrates, the alignment marks consisting of periodic 2-dimensional arrays of structures, the spacing of the structures being smaller than an alignment beam but larger than an exposure beam and the width of the structures varying sinusoidally from one end of an array to the other.

    摘要翻译： 本发明涉及在基板上使用的对准标记，对准标记由周期性二维结构阵列组成，其结构的间距小于对准光束但大于曝光光束，并且结构的宽度正弦变化 从阵列的一端到另一端。

    Alignment Measurement Arrangement, Alignment Measurement Method, Device Manufacturing Method and Lithographic Apparatus
    6.
    发明申请
    Alignment Measurement Arrangement, Alignment Measurement Method, Device Manufacturing Method and Lithographic Apparatus 审中-公开
    对准测量布置，对准测量方法，器件制造方法和平版印刷设备

    公开(公告)号：US20100245792A1

    公开(公告)日：2010-09-30

    申请号：US12730764

    申请日：2010-03-24

    申请人： Franciscus Godefridus Casper BIJNEN ,  Richard Johannes Franciscus VAN HAREN ,  Xiuhong WEI

    发明人： Franciscus Godefridus Casper BIJNEN ,  Richard Johannes Franciscus VAN HAREN ,  Xiuhong WEI

    IPC分类号： G03B27/42 ,  H04N7/18

    CPC分类号： G03B27/42 ,  G03F9/7046 ,  G03F9/7088 ,  G03F9/7092

    摘要： An alignment measurement arrangement includes a source, an optical system and a detector. The source generates a radiation beam with a plurality of wavelength ranges. The optical system receives the radiation beam, produces an alignment beam, directs the alignment beam to a mark located on an object, receives alignment radiation back from the mark, and transmits the received radiation. The detector receives the alignment radiation and detects an image of the alignment mark and outputs a plurality of alignment signals, r, each associated with one of the wavelength ranges. A processor, in communication with the detector, receives the alignment signals, determines signal qualities of the alignment signals; determines aligned positions of the alignment signals, and calculates a position of the alignment mark based on the signal qualities, aligned positions, and a model relating the aligned position to the range of wavelengths and mark characteristics, including mark depth and mark asymmetry.

    摘要翻译： 对准测量装置包括源，光学系统和检测器。 源产生具有多个波长范围的辐射束。 光学系统接收辐射束，产生对准光束，将对准光束引导到位于物体上的标记，从标记接收对准辐射，并发送接收到的辐射。 检测器接收对准辐射并检测对准标记的图像，并输出多个与波长范围之一相关联的对准信号r。 与检测器通信的处理器接收对准信号，确定对准信号的信号质量; 确定对准信号的对准位置，并且基于信号质量，对准位置以及与对准位置相关联的波长范围和标记特征（包括标记深度和标记不对称性）来计算对准标记的位置。

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD WITH DOUBLE EXPOSURE OVERLAY CONTROL
    7.
    发明申请
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD WITH DOUBLE EXPOSURE OVERLAY CONTROL 有权
    具有双重曝光覆盖控制的平面设备和设备制造方法

    公开(公告)号：US20100141916A1

    公开(公告)日：2010-06-10

    申请号：US12705050

    申请日：2010-02-12

    申请人： Maurits VAN DER SCHAAR ,  Richard Johannes Franciscus VAN HAREN

    发明人： Maurits VAN DER SCHAAR ,  Richard Johannes Franciscus VAN HAREN

    IPC分类号： G03B27/42

    CPC分类号： G03F7/0035 ,  G03B27/42 ,  G03F7/70466 ,  G03F9/7084

    摘要： A device manufacturing method includes a transfer of a pattern from a patterning device onto a substrate. The device manufacturing method further includes transferring a pattern of a main mark to a base layer for forming an alignment mark; depositing a pattern receiving layer on the base layer; in a first lithographic process, aligning, by using the main mark, a first mask that includes a first pattern and a local mark pattern, and transferring the first pattern and the local mark pattern to the pattern receiving layer; aligning, by using the local mark pattern, a second mask including a second pattern relative to the pattern receiving layer; andin a second lithographic process, transferring the second pattern to the pattern receiving layer; the first and second patterns being configured to form an assembled pattern.

    摘要翻译： 一种器件制造方法包括将图案从图案形成装置转移到衬底上。 所述器件制造方法还包括将主标记的图案转印到用于形成对准标记的基底层; 在基层上沉积图案接收层; 在第一光刻工艺中，通过使用主标记对准包括第一图案和局部标记图案的第一掩模，并将第一图案和局部标记图案转印到图案接收层; 通过使用本地标记图案，相对于图案接收层对准包括第二图案的第二掩模; 并在第二光刻工艺中将第二图案转印到图案接收层; 第一和第二图案被配置成形成组装图案。