METHOD OF FABRICATING A LIQUID CRYSTAL POLYMER FILM
    3.
    发明申请
    METHOD OF FABRICATING A LIQUID CRYSTAL POLYMER FILM 审中-公开
    制备液晶聚合物膜的方法

    公开(公告)号:US20140252666A1

    公开(公告)日:2014-09-11

    申请号:US14203630

    申请日:2014-03-11

    IPC分类号: B29D11/00 C07C245/10

    摘要: A method of fabricating a liquid crystal polymer film includes providing a support substrate having a surface having a shape arranged to define a form of a liquid crystal polymer film to be fabricated; applying a layer of a photoaligning material over the surface of the support substrate, the photoaligning material having an absorption band; exposing the layer of photoaligning material to a light having a linear polarization and the light comprising a wavelength within the absorption band to convert the layer of photoaligning material into a layer of photoaligned material; applying a layer of a polymerizable liquid crystal over the layer of photoaligned material; performing photopolymerization of the layer of polymerizable liquid crystal to form a liquid crystal polymer film; applying a solvent to the layer of photoaligned material, the solvent formulated to dissolve the photoaligned material to thereby release the liquid crystal polymer film from the support substrate; and removing the liquid crystal polymer film from the support substrate.

    摘要翻译: 一种制造液晶聚合物膜的方法包括提供一种支撑基板,该支撑基板具有形状被布置以限定要制造的液晶聚合物膜的形式的表面; 在支撑基板的表面上施加一层光致化学材料,该光致化学材料具有吸收带; 将所述光致化学材料层暴露于具有线性偏振的光,并且所述光包括所述吸收带内的波长,以将所述光致化学材料层转化为光致偏光材料层; 在可光化的材料层上涂覆可聚合液晶层; 进行可聚合液晶层的光聚合以形成液晶聚合物膜; 将溶剂施加到光致化学材料层上,配制溶剂以溶解光致偏光材料,从而从支撑衬底释放液晶聚合物膜; 并从支撑基板上除去液晶聚合物膜。

    Acid labile photoactive composition
    9.
    发明授权
    Acid labile photoactive composition 失效
    酸不稳定光敏组合物

    公开(公告)号:US5917024A

    公开(公告)日:1999-06-29

    申请号:US27168

    申请日:1998-02-20

    CPC分类号: G03F7/022

    摘要: A photoresist composition comprising an alkali soluble resin and the reaction product of an ortho-naphthoquinone diazide sulfonic acid ester and a vinyl ether. In use, the photoresist is characterized by having at least a portion of the hydroxyl groups on the alkali soluble resin reacted with the photoactive compound and then deblocked by acid generation.

    摘要翻译: 包含碱溶性树脂和邻萘醌二叠氮磺酸酯与乙烯基醚的反应产物的光致抗蚀剂组合物。 在使用中,光致抗蚀剂的特征在于使碱溶性树脂上的至少一部分羟基与光活性化合物反应,然后通过酸生成而解封。