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    DEVICE OF PURIFYING HYDROGEN FLUORIDE IN SEMICONDUCTOR PROCESS WASTE GAS
    4.
    发明申请
    DEVICE OF PURIFYING HYDROGEN FLUORIDE IN SEMICONDUCTOR PROCESS WASTE GAS 审中-公开

    公开(公告)号：US20180161724A1

    公开(公告)日：2018-06-14

    申请号：US15891287

    申请日：2018-02-07

    申请人： ORIENT SERVICE CO., LTD.

    发明人： WU-YU FONG

    IPC分类号： B01D53/68 ,  B01D53/76

    CPC分类号： B01D53/68 ,  B01D53/76 ,  B01D2257/2027 ,  B01D2257/204 ,  B01D2258/0216 ,  Y02C20/30

    摘要： A device of purifying a fluoride in a semiconductor process waste gas includes a reaction chamber formed in a waste gas treating tank, and a heat pipe disposed in the waste gas treating tank and inserted into the reaction chamber. A water injection pipe is disposed at the outside end of the heat pipe formed at an outside of the waste gas treating tank, a heating rod is disposed in and passes through the heat pipe, a passage is formed between the heating rod and the heat pipe, water is guided and enters into the passage by the water injection pipe, the water in the passage contacts with the heating rod to produce a mist gaseous water at a high temperature, the mist gaseous water is guided and enters into the reaction chamber via the plurality of spit-outs to dissolve the fluoride to be reacted into a hydrogen fluoride, and a dissolving temperature of the mist gaseous water contacting with the fluoride is 370˜1300° C.

    CVD system having particle separator
    5.
    发明授权
    CVD system having particle separator 有权

    公开(公告)号：US09970106B2

    公开(公告)日：2018-05-15

    申请号：US14762396

    申请日：2014-01-16

    申请人： AIXTRON SE

    发明人： Wilfried Goeres ,  Peer Lehnen ,  Heinrich Mallmann

    IPC分类号： C23C16/44 ,  B01D46/00 ,  F01N3/022 ,  F01N3/023

    CPC分类号： C23C16/4412 ,  B01D46/0075 ,  F01N3/022 ,  F01N3/0233 ,  F01N3/0237 ,  F01N2450/30 ,  Y02C20/30

    摘要： The invention relates to a device for coating substrates in a process chamber (8) of a reactor housing (1), having a gas inlet member (11) for introducing process gases into the process chamber (8), having a gas outlet member (10) for discharging an exhaust gas stream from the process chamber (8) into a particle filter (4), which is disposed in a particle separator housing (3) and has a porous filter medium (16) for out-filtering particles from the exhaust gas stream, which form during a reaction of the process gases. In order to improve the filtering performance of a particle filter at a CVD or PVD device and to specify a suitable particle filter for this intended purpose, the invention suggests that the pore size and the surface quality of the filter medium (16) are selected in such a manner that the particles located in the exhaust gas stream adhere to the surface of the filter medium (16), however do not penetrate the filter medium (16), and the particles grow to conglomerates outside of the filter medium (16), and a mass acceleration device is provided for cleaning the particle filter (4) by mechanically removing the conglomerates.

    Exhaust system
    9.
    发明授权
    Exhaust system 有权

    公开(公告)号：US09702285B2

    公开(公告)日：2017-07-11

    申请号：US14682274

    申请日：2015-04-09

    申请人： TOKYO ELECTRON LIMITED

    发明人： Kiyoto Hayashi

    IPC分类号： B01D45/00 ,  F01N3/08 ,  H01J37/32 ,  B01D45/08 ,  H01L21/67 ,  C23C16/44

    CPC分类号： F01N3/08 ,  B01D45/08 ,  C23C16/4412 ,  H01J37/32834 ,  H01J37/32844 ,  H01L21/67109 ,  Y02C20/30 ,  Y02P70/605

    摘要： An exhaust system connected to an exhaust port of a substrate processing apparatus includes: a first exhaust trap having an exhaust input at an upper portion thereof and an exhaust output at a lower portion thereof and cooling a product produced in the substrate processing apparatus; a second exhaust trap installed at a downstream side of an exhaust flow with respect to the first exhaust trap, having an exhaust input at a lower portion thereof and an exhaust output at an upper portion thereof, and cooling the product; a storage unit installed between the first and second exhaust traps and storing the product cooled by the first and second exhaust traps; a first pipe connecting the exhaust port of the substrate processing apparatus and the first exhaust trap; and a second pipe connecting the first exhaust trap, the second exhaust trap and the storage unit.