PROTECTIVE SEMICONDUCTOR ELEMENTS FOR BONDED STRUCTURES

    公开(公告)号:US20230036441A1

    公开(公告)日:2023-02-02

    申请号:US17816346

    申请日:2022-07-29

    Abstract: A bonded structure with protective semiconductor elements including a semiconductor element with active circuitry and a protective element including an obstructive layer and/or a protective circuitry layer. The obstructive layer is configured to inhibit external access to at least a portion of the active circuitry. The protective circuitry layer is configured to detect or disrupt external access to the protective element and/or the active circuitry of the semiconductor element. The semiconductor element and the protective element are directly bonded without an adhesive along a bonding interface.

    BOND ENHANCEMENT STRUCTURE IN MICROELECTRONICS FOR TRAPPING CONTAMINANTS DURING DIRECT-BONDING PROCESSES

    公开(公告)号:US20220246564A1

    公开(公告)日:2022-08-04

    申请号:US17681019

    申请日:2022-02-25

    Abstract: Structures and techniques provide bond enhancement in microelectronics by trapping contaminants and byproducts during bonding processes, and arresting cracks. Example bonding surfaces are provided with recesses, sinks, traps, or cavities to capture small particles and gaseous byproducts of bonding that would otherwise create detrimental voids between microscale surfaces being joined, and to arrest cracks. Such random voids would compromise bond integrity and electrical conductivity of interconnects being bonded. In example systems, a predesigned recess space or predesigned pattern of recesses placed in the bonding interface captures particles and gases, reducing the formation of random voids, thereby improving and protecting the bond as it forms. The recess space or pattern of recesses may be placed where particles collect on the bonding surface, through example methods of determining where mobilized particles move during bond wave propagation. A recess may be repeated in a stepped reticule pattern at the wafer level, for example, or placed by an aligner or alignment process.

    DIRECT-BONDED LAMINATION FOR IMPROVED IMAGE CLARITY IN OPTICAL DEVICES

    公开(公告)号:US20220155490A1

    公开(公告)日:2022-05-19

    申请号:US17587921

    申请日:2022-01-28

    Abstract: Direct-bonded lamination for improved image clarity in optical devices is provided. An example process planarizes and plasma-activates optical surfaces to be laminated together, then forms direct bonds between the two surfaces without an adhesive or adhesive layer. This process provides improved optics with higher image brightness, less light scattering, better resolution, and higher image fidelity. The direct bonds also provide a refractory interface tolerant of much higher temperatures than conventional optical adhesives. The example process can be used to produce many types of improved optical components, such as improved laminated lenses, mirrors, beam splitters, collimators, prism systems, optical conduits, and mirrored waveguides for smartglasses and head-up displays (HUDs), which provide better image quality and elimination of the dark visual lines that are apparent to a human viewer when conventional adhesives are used in conventional lamination.

    Bond enhancement structure in microelectronics for trapping contaminants during direct-bonding processes

    公开(公告)号:US11296044B2

    公开(公告)日:2022-04-05

    申请号:US16553535

    申请日:2019-08-28

    Abstract: Structures and techniques provide bond enhancement in microelectronics by trapping contaminants and byproducts during bonding processes, and arresting cracks. Example bonding surfaces are provided with recesses, sinks, traps, or cavities to capture small particles and gaseous byproducts of bonding that would otherwise create detrimental voids between microscale surfaces being joined, and to arrest cracks. Such random voids would compromise bond integrity and electrical conductivity of interconnects being bonded. In example systems, a predesigned recess space or predesigned pattern of recesses placed in the bonding interface captures particles and gases, reducing the formation of random voids, thereby improving and protecting the bond as it forms. The recess space or pattern of recesses may be placed where particles collect on the bonding surface, through example methods of determining where mobilized particles move during bond wave propagation. A recess may be repeated in a stepped reticule pattern at the wafer level, for example, or placed by an aligner or alignment process.

    LAYER STRUCTURES FOR MAKING DIRECT METAL-TO-METAL BONDS AT LOW TEMPERATURES IN MICROELECTRONICS

    公开(公告)号:US20220005784A1

    公开(公告)日:2022-01-06

    申请号:US17320767

    申请日:2021-05-14

    Abstract: Layer structures for making direct metal-to-metal bonds at low temperatures and shorter annealing durations in microelectronics are provided. Example bonding interface structures enable direct metal-to-metal bonding of interconnects at low annealing temperatures of 150° C. or below, and at a lower energy budget. The example structures provide a precise metal recess distance for conductive pads and vias being bonded that can be achieved in high volume manufacturing. The example structures provide a vertical stack of conductive layers under the bonding interface, with geometries and thermal expansion features designed to vertically expand the stack at lower temperatures over the precise recess distance to make the direct metal-to-metal bonds. Further enhancements, such as surface nanotexture and copper crystal plane selection, can further actuate the direct metal-to-metal bonding at lowered annealing temperatures and shorter annealing durations.

    Wafer-level bonding of obstructive elements

    公开(公告)号:US11205625B2

    公开(公告)日:2021-12-21

    申请号:US16846177

    申请日:2020-04-10

    Abstract: A bonded structure is disclosed. The bonded structure can include a semiconductor element comprising active circuitry. The bonded structure can include an obstructive element bonded to the semiconductor element along a bond interface, the obstructive element including an obstructive material disposed over the active circuitry, the obstructive material configured to obstruct external access to the active circuitry. The bonded element can include an artifact structure indicative of a wafer-level bond in which the semiconductor element and the obstructive element formed part of respective wafers directly bonded prior to singulation.

    OPTICALLY OCCLUSIVE PROTECTIVE ELEMENT FOR BONDED STRUCTURES

    公开(公告)号:US20230019869A1

    公开(公告)日:2023-01-19

    申请号:US17812675

    申请日:2022-07-14

    Abstract: An optically occlusive protective element for bonded structures, embodiments of which disclosed herein relate to directly bonded structures along a bond interface. Specifically, two elements, a semiconductor element and an occlusive element, may be directly bonded to one another without an intervening adhesive along a bonding interface. The semiconductor element includes active circuitry which, after bonding, is protected by the occlusive element. The occlusive element includes several optically occlusive layers which are arranged to inhibit an optical interrogation of the active circuitry. Such layers may further include occlusive strips which may or may not overlap with other occlusive strips from other occlusive layers when the occlusive layers are stacked vertically.

Patent Agency Ranking