公开(公告)号：US12130561B2

公开(公告)日：2024-10-29

申请号：US17892211

申请日：2022-08-22

申请人： Applied Materials, Inc.

发明人： Kartik Ramaswamy ,  Michael D. Willwerth ,  Yang Yang

IPC分类号： G03F7/42 ,  G03F7/00 ,  H01J37/32

CPC分类号： G03F7/70808 ,  G03F7/42 ,  G03F7/427 ,  G03F7/70925 ,  H01J37/32633 ,  H01J2237/3342

摘要： Apparatus for processing substrates can include a gas distribution plate that includes an upper plate and a lower plate and a solid disk between the upper plate and the lower plate. Each of the upper plate and the lower plate has a central region and an outer region surrounding the central region, the central region being solid and the outer region having a plurality of through holes. The upper plate and the lower plate are coaxially aligned along a central axis extending through a center of the central region of the upper plate and a center of the central region of the lower plate. The solid disk is coaxially aligned with the upper plate and the lower plate. The solid disk is configured to block transmission of ultraviolet radiation through the solid disk.

公开(公告)号：US12111341B2

公开(公告)日：2024-10-08

申请号：US17960666

申请日：2022-10-05

申请人： Applied Materials, Inc.

发明人： Yue Guo ,  Yang Yang ,  Kartik Ramaswamy ,  Fernando Silveira ,  A N M Wasekul Azad

IPC分类号： G01R29/08

CPC分类号： G01R29/0885

摘要： Embodiments of the disclosure include an electric field measurement system that includes a first light source, a first light sensor configured to receive electromagnetic energy transmitted from the first light source, an electro-optic sensor, and a controller. The electro-optic sensor may include a package comprising a first electro-optic crystal disposed within a body; and at least one optical fiber. The optical fiber is configured to transmit electromagnetic energy transmitted from the first light source to a surface of the first electro-optic crystal, and transmit at least a portion of the electromagnetic energy transmitted to the surface of the first electro-optic crystal and subsequently passed through at least a portion of the first electro-optic crystal to the first light sensor that is configured to generate a signal based on an attribute of the electromagnetic energy received by the first light sensor from the at least one optical fiber. The controller is configured to generate a command signal based on a signal received from the first light sensor.

公开(公告)号：US11810760B2

公开(公告)日：2023-11-07

申请号：US17349763

申请日：2021-06-16

申请人： Applied Materials, Inc.

发明人： Yang Yang ,  Yue Guo ,  Kartik Ramaswamy

IPC分类号： H01J37/32

CPC分类号： H01J37/32128

摘要： Embodiments provided herein generally include apparatus, plasma processing systems and methods for generation of a waveform for plasma processing of a substrate in a processing chamber. Embodiments of the disclosure include an apparatus and method for generating a pulsed-voltage waveform that includes coupling a main voltage source to an electrode during a first phase of a process of generating a pulsed-voltage waveform, wherein the electrode is disposed within a processing chamber, coupling a ground node to the electrode during a second phase of the process of generating the pulsed-voltage waveform, coupling a first compensation voltage source to the electrode during a third phase of the process of generating the pulsed-voltage waveform, and coupling a second compensation voltage source to the electrode during a fourth phase of the process of generating the pulsed-voltage waveform.

公开(公告)号：US11784042B2

公开(公告)日：2023-10-10

申请号：US17961224

申请日：2022-10-06

申请人： Applied Materials, Inc.

发明人： Eswaranand Venkatasubramanian ,  Yang Yang ,  Pramit Manna ,  Kartik Ramaswamy ,  Takehito Koshizawa ,  Abhijit Basu Mallick

IPC分类号： H01L21/02 ,  H01L21/033 ,  C23C16/26

CPC分类号： H01L21/02274 ,  C23C16/26 ,  H01L21/02115 ,  H01L21/0332

摘要： Embodiments herein provide methods of depositing an amorphous carbon layer using a plasma enhanced chemical vapor deposition (PECVD) process and hard masks formed therefrom. In one embodiment, a method of processing a substrate includes positioning a substrate on a substrate support, the substrate support disposed in a processing volume of a processing chamber, flowing a processing gas comprising a hydrocarbon gas and a diluent gas into the processing volume, maintaining the processing volume at a processing pressure less than about 100 mTorr, igniting and maintaining a deposition plasma of the processing gas by applying a first power to one of one or more power electrodes of the processing chamber, maintaining the substrate support at a processing temperature less than about 350° C., exposing a surface of the substrate to the deposition plasma, and depositing an amorphous carbon layer on the surface of the substrate.

公开(公告)号：US10957518B2

公开(公告)日：2021-03-23

申请号：US16828694

申请日：2020-03-24

申请人： Applied Materials, Inc.

发明人： Kartik Ramaswamy ,  Lawrence Wong ,  Steven Lane ,  Yang Yang ,  Srinivas D. Nemani ,  Praburam Gopalraja

IPC分类号： H01J37/32 ,  H01H1/46

摘要： A plasma reactor includes a processing chamber having a lower processing portion having an axis of symmetry and an array of cavities extending upwardly from the lower processing portion. A gas distributor couples plural gas sources to a plurality of gas inlets of the cavities, and the gas distributor includes a plurality of valves with each valve selectively connecting a respective gas inlet to one of the plural gas sources. Power is applied by an array of conductors that includes a respective conductor for each respective cavity with each conductor adjacent and surrounding a cavity. A power distributor couples a power source and the array of conductors, and the power distributor includes a plurality of switches with a switch for each respective conductor.

公开(公告)号：US10784085B2

公开(公告)日：2020-09-22

申请号：US14832280

申请日：2015-08-21

申请人： APPLIED MATERIALS, INC.

发明人： Kartik Ramaswamy ,  Kenneth S. Collins ,  Steven Lane ,  Yang Yang ,  Lawrence Wong

IPC分类号： H05H1/12 ,  H01J37/32

摘要： An external magnetic filter to trap electrons surrounds a reactor chamber and has multiple magnets arranged in a circle, the magnetic orientation of each individual magnet being rotated relative to the orientation of the adjacent individual magnet by a difference angle that is a function of the arc subtended by the individual magnet.

公开(公告)号：US20160225590A1

公开(公告)日：2016-08-04

申请号：US14985688

申请日：2015-12-31

申请人： Applied Materials, Inc.

发明人： Joseph F. Aubuchon ,  Tza-Jing Gung ,  Travis Lee Koh ,  Nattaworn Nuntaworanuch ,  Sheng-Chin Kung ,  Steven Lane ,  Kartik Ramaswamy ,  Yang Yang

IPC分类号： H01J37/32

CPC分类号： H01J37/32669 ,  H01J37/3211

摘要： Embodiments described herein generally relate to plasma process apparatus. In one embodiment, the plasma process apparatus includes a plasma source assembly. The plasma source assembly may include a first coil, a second coil surrounding the first coil, and a magnetic device disposed outside the first and inside the second coil. The magnet enables additional tuning which improves uniformity control of the processes on the substrate.

摘要翻译： 本文描述的实施例一般涉及等离子体处理装置。 在一个实施例中，等离子体处理装置包括等离子体源组件。 等离子体源组件可以包括第一线圈，围绕第一线圈的第二线圈和设置在第二线圈的第一和内侧的磁性装置。 该磁体可实现额外的调谐，从而提高基板上工艺的均匀性控制。

公开(公告)号：US20140069584A1

公开(公告)日：2014-03-13

申请号：US13958875

申请日：2013-08-05

申请人： APPLIED MATERIALS, INC.

发明人： Yang Yang ,  Kartik Ramaswamy ,  Kenneth S. Collins ,  Steven Lane ,  Douglas A. Buchberger, JR. ,  Lawrence Wong ,  Nipun Misra

IPC分类号： H01L21/67

CPC分类号： H01L21/67069 ,  H01J37/32082 ,  H01J37/32174 ,  H01J37/32568 ,  H01J37/32623 ,  H01J37/32642 ,  H01J37/32935 ,  H01J2237/2001 ,  H01L21/6833

摘要： A plasma reactor includes an RF-driven ceiling electrode overlying a process zone and two (or more) counter electrodes underlying the process zone and facing different portions of the process zones, two (or more) variable reactances connected between respective ones of the counter electrodes and ground, and a controller governing the variable reactances to control distribution of a plasma parameter such as plasma ion density or ion energy.

摘要翻译： 等离子体反应器包括覆盖工艺区域的RF驱动的天花板电极和处理区域下面的两个（或更多个）对置电极，并且面对处理区域的不同部分，连接在相应电极之间的两个（或更多个）可变电抗器 并控制控制可变电抗以控制诸如等离子体离子密度或离子能量之类的等离子体参数分布的控制器。

公开(公告)号：US20130277333A1

公开(公告)日：2013-10-24

申请号：US13842287

申请日：2013-03-15

申请人： APPLIED MATERIALS, INC.

发明人： Nipun Misra ,  Kartik Ramaswamy ,  Yang Yang ,  Douglas A. Buchberger, JR. ,  James D. Carducci ,  Lawrence Wong ,  Shane C. Nevil ,  Shahid Rauf ,  Kenneth S. Collins

IPC分类号： C23F1/08 ,  C23C16/505

CPC分类号： C23F1/08 ,  C23C16/505 ,  H01J37/32082 ,  H01J37/32183

摘要： In a plasma reactor having a driven electrode and a counter electrode, an impedance controller connected between the counter electrode and ground includes both series sand parallel variable impedance elements that facilitate two-dimensional movement of a ground path input impedance in a complex impedance space to control spatial distribution of a plasma process parameter.

摘要翻译： 在具有驱动电极和对电极的等离子体反应器中，连接在对电极和地之间的阻抗控制器包括两个串联的砂平行的可变阻抗元件，它们促进复阻抗空间中的接地路径输入阻抗的二维运动以控制 等离子体工艺参数的空间分布。

公开(公告)号：US12046449B2

公开(公告)日：2024-07-23

申请号：US17726930

申请日：2022-04-22

申请人： Applied Materials, Inc.

发明人： Yue Guo ,  Katsumasa Kawasaki ,  Kartik Ramaswamy ,  Yang Yang ,  Nicolas John Bright

IPC分类号： H01J37/32 ,  H03H7/38

CPC分类号： H01J37/32146 ,  H01J37/32183 ,  H01J37/32935 ,  H03H7/38 ,  H01J2237/24564 ,  H01J2237/334

摘要： Methods and apparatus for processing a substrate are provided herein. For example, a matching network configured for use with a plasma processing chamber comprises an input configured to receive one or more radio frequency (RF) signals, an output configured to deliver the one or more RF signals to a processing chamber, a first sensor operably connected to the input and a second sensor operably connected to the output and configured to measure impedance during operation, at least one variable capacitor connected to the first sensor and the second sensor and a controller, based on a measured impedance, configured to tune the at least one variable capacitor of the matching network to a first target position based on weighted output impedance values measured at pulse states of a voltage waveform and to tune the at least one variable capacitor to a second target position based on weighted input impedance values measured at the pulse states of the voltage waveform.