公开(公告)号：US10153139B2

公开(公告)日：2018-12-11

申请号：US14742142

申请日：2015-06-17

申请人： Applied Materials, Inc.

发明人： Yang Yang ,  Kartik Ramaswamy ,  Steven Lane ,  Lawrence Wong ,  Shahid Rauf ,  Andrew Nguyen ,  Kenneth S. Collins ,  Roger Alan Lindley

IPC分类号： H01J37/32

摘要： Implementations described herein provide a substrate support assembly which enables tuning of a plasma within a plasma chamber. In one embodiment, a method for tuning a plasma in a chamber is provided. The method includes providing a first radio frequency power and a direct current power to a first electrode in a substrate support assembly, providing a second radio frequency power to a second electrode in the substrate support assembly at a different location than the first electrode, monitoring parameters of the first and second radio frequency power, and adjusting one or both of the first and second radio frequency power based on the monitored parameters.

公开(公告)号：US09412563B2

公开(公告)日：2016-08-09

申请号：US14026227

申请日：2013-09-13

申请人： APPLIED MATERIALS, INC.

发明人： Kartik Ramaswamy ,  Kenneth S. Collins ,  Shahid Rauf ,  Steven Lane ,  Yang Yang ,  Lawrence Wong

IPC分类号： H01L21/306 ,  C23C16/00 ,  H01J37/32 ,  H05H1/46

CPC分类号： H01J37/32183 ,  H01J37/321 ,  H01J37/32458 ,  H05H1/46 ,  H05H2001/4652

摘要： An RF plasma source has a resonator with its shorted end joined to the processing chamber ceiling and inductively coupled to two arrays of radial toroidal channels in the ceiling, the resonator having two radial zones and the two arrays of toroidal channels lying in respective ones of the radial zones.

摘要翻译： RF等离子体源具有谐振器，其短路端连接到处理室顶部并感应耦合到天花板中的两个径向环形通道阵列，谐振器具有两个径向区域，并且环形通道的两个阵列位于 径向区。

公开(公告)号：US20160225466A1

公开(公告)日：2016-08-04

申请号：US14832280

申请日：2015-08-21

申请人： APPLIED MATERIALS, INC.

发明人： Kartik Ramaswamy ,  Kenneth S. Collins ,  Steven Lane ,  Yang Yang ,  Lawrence Wong

IPC分类号： G21B1/05

CPC分类号： H01J37/32357 ,  H01J37/32422 ,  H01J37/3266

摘要： An external magnetic filter to trap electrons surrounds a reactor chamber and has multiple magnets arranged in a circle, the magnetic orientation of each individual magnet being rotated relative to the orientation of the adjacent individual magnet by a difference angle that is a function of the arc subtended by the individual magnet.

摘要翻译： 用于捕获电子的外部磁性过滤器围绕反应室并且具有以圆形排列的多个磁体，每个单独磁体的磁性定向相对于相邻单独磁体的取向旋转相对于被对准的电弧的函数的差角 由个别磁铁。

公开(公告)号：US10141166B2

公开(公告)日：2018-11-27

申请号：US14460640

申请日：2014-08-15

申请人： APPLIED MATERIALS, INC.

发明人： Lawrence Wong ,  Kartik Ramaswamy ,  Yang Yang ,  Steven Lane ,  Richard Fovell

IPC分类号： G06F19/00 ,  H01J37/32 ,  H01L21/67 ,  C23F1/00

摘要： Plural sensors on an interior surface of a reactor chamber are linked by respective RF communication channels to a hub inside the reactor chamber, which in turn is linked to a process controller outside of the chamber.

公开(公告)号：US10017857B2

公开(公告)日：2018-07-10

申请号：US15144736

申请日：2016-05-02

申请人： APPLIED MATERIALS, INC.

发明人： Andrew Nguyen ,  Yang Yang ,  Kartik Ramaswamy ,  Steven Lane ,  Lawrence Wong

IPC分类号： C23C16/00 ,  H01L21/306 ,  C23C16/505 ,  H01J37/32 ,  H01L21/687 ,  H01L21/3065 ,  H01L21/311 ,  H01L21/3213

CPC分类号： C23C16/505 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32165 ,  H01J37/32715 ,  H01L21/68742 ,  H01L21/68785

摘要： Methods and apparatus for processing a substrate are provided herein. In some embodiments, an apparatus for processing a substrate includes a process chamber having an internal processing volume disposed beneath a dielectric lid of the process chamber; a substrate support disposed in the process chamber and having a support surface to support a substrate; an inductive coil disposed above the dielectric lid to inductively couple RF energy into the internal processing volume to form a plasma above the substrate support; and a first inductive applicator ring coupled to a lift mechanism to position the first inductive applicator ring within the internal processing volume.

公开(公告)号：US20170092470A1

公开(公告)日：2017-03-30

申请号：US14867240

申请日：2015-09-28

申请人： APPLIED MATERIALS, INC.

发明人： Kartik Ramaswamy ,  Lawrence Wong ,  Steven Lane ,  Yang Yang ,  Srinivas D. Nemani ,  Praburam Gopalraja

IPC分类号： H01J37/32

CPC分类号： H01J37/32449 ,  H01J37/32091 ,  H01J37/3211 ,  H01J37/32422 ,  H01J37/3244 ,  H01J2237/3323 ,  H01J2237/334

摘要： A plasma source consisting of an array of plasma point sources that controls generation of charged particles and radicals spatially and temporally over a user defined region.

公开(公告)号：US20160048111A1

公开(公告)日：2016-02-18

申请号：US14460640

申请日：2014-08-15

申请人： APPLIED MATERIALS, INC.

发明人： Lawrence Wong ,  Kartik Ramaswamy ,  Yang Yang ,  Steven Lane ,  Richard Fovell

IPC分类号： G05B13/02

CPC分类号： H01J37/32935 ,  C23F1/00 ,  H01J37/32082 ,  H01L21/67253

摘要： Plural sensors on an interior surface of a reactor chamber are linked by respective RF communication channels to a hub inside the reactor chamber, which in turn is linked to a process controller outside of the chamber.

摘要翻译： 在反应室的内表面上的多个传感器通过相应的RF连通通道连接到反应器室内的轮毂，反应器室又连接到室外的过程控制器。

公开(公告)号：US20150075717A1

公开(公告)日：2015-03-19

申请号：US14026205

申请日：2013-09-13

申请人： APPLIED MATERIALS, INC.

发明人： Kartik Ramaswamy ,  Kenneth S. Collins ,  Shahid Rauf ,  Steven Lane ,  Yang Yang ,  Lawrence Wong

IPC分类号： H01J37/32

CPC分类号： H01J37/32183 ,  H01J37/321 ,  H01J2237/3348

摘要： An RF plasma source has a resonator with its shorted end joined to the processing chamber ceiling and inductively coupled to an array of radial toroidal channels in the ceiling.

摘要翻译： RF等离子体源具有谐振器，其短路端连接到处理室顶部并感应耦合到天花板中的径向环形通道阵列。

公开(公告)号：US20140034239A1

公开(公告)日：2014-02-06

申请号：US13958890

申请日：2013-08-05

申请人： APPLIED MATERIALS, INC.

发明人： Yang Yang ,  Kartik Ramaswamy ,  Kenneth S. Collins ,  Steven Lane ,  Douglas A. Buchberger, JR. ,  Lawrence Wong ,  Nipun Misra

IPC分类号： H01L21/67

CPC分类号： H01L21/67069 ,  H01J37/32082 ,  H01J37/32174 ,  H01J37/32568 ,  H01J37/32623 ,  H01J37/32642 ,  H01J37/32935 ,  H01J2237/2001 ,  H01L21/67109 ,  H01L21/6833

摘要： A plasma reactor includes an RF-driven wafer support electrode underlying a process zone and two (or more) counter electrodes overlying the process zone and facing different portions of the process zones, two (or more) variable reactances connected between respective ones of the counter electrodes and ground, and a controller governing the variable reactances to control distribution of a plasma parameter such as plasma ion density or ion energy.

摘要翻译： 等离子体反应器包括位于处理区下面的RF驱动的晶片支撑电极和覆盖处理区并面对处理区的不同部分的两个（或更多个）对电极，两个（或更多个）可变电抗连接在相应的计数器之间 电极和接地，以及控制可变电抗以控制诸如等离子体离子密度或离子能量之类的等离子体参数分布的控制器。

公开(公告)号：US10957518B2

公开(公告)日：2021-03-23

申请号：US16828694

申请日：2020-03-24

申请人： Applied Materials, Inc.

发明人： Kartik Ramaswamy ,  Lawrence Wong ,  Steven Lane ,  Yang Yang ,  Srinivas D. Nemani ,  Praburam Gopalraja

IPC分类号： H01J37/32 ,  H01H1/46

摘要： A plasma reactor includes a processing chamber having a lower processing portion having an axis of symmetry and an array of cavities extending upwardly from the lower processing portion. A gas distributor couples plural gas sources to a plurality of gas inlets of the cavities, and the gas distributor includes a plurality of valves with each valve selectively connecting a respective gas inlet to one of the plural gas sources. Power is applied by an array of conductors that includes a respective conductor for each respective cavity with each conductor adjacent and surrounding a cavity. A power distributor couples a power source and the array of conductors, and the power distributor includes a plurality of switches with a switch for each respective conductor.