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1.发明申请DIFFERENTIAL COUNTER ELECTRODE TUNING IN A PLASMA REACTOR WITH AN RF-DRIVEN WORKPIECE SUPPORT ELECTRODE 审中-公开具有RF驱动工件支持电极的等离子体反应器中的差分计数器电极调谐公开(公告)号：US20140034239A1
公开(公告)日：2014-02-06
申请号：US13958890
申请日：2013-08-05
Applicant: APPLIED MATERIALS, INC.
Inventor： Yang Yang , Kartik Ramaswamy , Kenneth S. Collins , Steven Lane , Douglas A. Buchberger, JR. , Lawrence Wong , Nipun Misra
IPC: H01L21/67
CPC classification number: H01L21/67069 , H01J37/32082 , H01J37/32174 , H01J37/32568 , H01J37/32623 , H01J37/32642 , H01J37/32935 , H01J2237/2001 , H01L21/67109 , H01L21/6833
Abstract: A plasma reactor includes an RF-driven wafer support electrode underlying a process zone and two (or more) counter electrodes overlying the process zone and facing different portions of the process zones, two (or more) variable reactances connected between respective ones of the counter electrodes and ground, and a controller governing the variable reactances to control distribution of a plasma parameter such as plasma ion density or ion energy.
Abstract translation: 等离子体反应器包括位于处理区下面的RF驱动的晶片支撑电极和覆盖处理区并面对处理区的不同部分的两个（或更多个）对电极，两个（或更多个）可变电抗连接在相应的计数器之间 电极和接地，以及控制可变电抗以控制诸如等离子体离子密度或离子能量之类的等离子体参数分布的控制器。
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公开(公告)号：US11587766B2
公开(公告)日：2023-02-21
申请号：US17353668
申请日：2021-06-21
Applicant: Applied Materials, Inc.
Inventor： Kartik Ramaswamy , Igor Markovsky , Zhigang Chen , James D. Carducci , Kenneth S. Collins , Shahid Rauf , Nipun Misra , Leonid Dorf , Zheng John Ye
Abstract: The disclosure pertains to a capacitively coupled plasma source in which VHF power is applied through an impedance-matching coaxial resonator having a symmetrical power distribution.
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3.发明申请DIFFERENTIAL COUNTER ELECTRODE TUNING IN A PLASMA REACTOR WITH AN RF-DRIVEN CEILING ELECTRODE 审中-公开具有RF驱动天花板电极的等离子体反应器中的差分计数器电极调谐公开(公告)号：US20140069584A1
公开(公告)日：2014-03-13
申请号：US13958875
申请日：2013-08-05
Applicant: APPLIED MATERIALS, INC.
Inventor： Yang Yang , Kartik Ramaswamy , Kenneth S. Collins , Steven Lane , Douglas A. Buchberger, JR. , Lawrence Wong , Nipun Misra
IPC: H01L21/67
CPC classification number: H01L21/67069 , H01J37/32082 , H01J37/32174 , H01J37/32568 , H01J37/32623 , H01J37/32642 , H01J37/32935 , H01J2237/2001 , H01L21/6833
Abstract: A plasma reactor includes an RF-driven ceiling electrode overlying a process zone and two (or more) counter electrodes underlying the process zone and facing different portions of the process zones, two (or more) variable reactances connected between respective ones of the counter electrodes and ground, and a controller governing the variable reactances to control distribution of a plasma parameter such as plasma ion density or ion energy.
Abstract translation: 等离子体反应器包括覆盖工艺区域的RF驱动的天花板电极和处理区域下面的两个（或更多个）对置电极，并且面对处理区域的不同部分，连接在相应电极之间的两个（或更多个）可变电抗器 并控制控制可变电抗以控制诸如等离子体离子密度或离子能量之类的等离子体参数分布的控制器。
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4.发明申请PLASMA PROCESSING USING RF RETURN PATH VARIABLE IMPEDANCE CONTROLLER WITH TWO-DIMENSIONAL TUNING SPACE 审中-公开使用RF返回路径的等离子体处理可变阻抗控制器与二维调谐空间公开(公告)号：US20130277333A1
公开(公告)日：2013-10-24
申请号：US13842287
申请日：2013-03-15
Applicant: APPLIED MATERIALS, INC.
Inventor： Nipun Misra , Kartik Ramaswamy , Yang Yang , Douglas A. Buchberger, JR. , James D. Carducci , Lawrence Wong , Shane C. Nevil , Shahid Rauf , Kenneth S. Collins
IPC: C23F1/08 , C23C16/505
CPC classification number: C23F1/08 , C23C16/505 , H01J37/32082 , H01J37/32183
Abstract: In a plasma reactor having a driven electrode and a counter electrode, an impedance controller connected between the counter electrode and ground includes both series sand parallel variable impedance elements that facilitate two-dimensional movement of a ground path input impedance in a complex impedance space to control spatial distribution of a plasma process parameter.
Abstract translation: 在具有驱动电极和对电极的等离子体反应器中，连接在对电极和地之间的阻抗控制器包括两个串联的砂平行的可变阻抗元件，它们促进复阻抗空间中的接地路径输入阻抗的二维运动以控制 等离子体工艺参数的空间分布。
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公开(公告)号：US20150075719A1
公开(公告)日：2015-03-19
申请号：US14548692
申请日：2014-11-20
Applicant: APPLIED MATERIALS, INC.
Inventor： Kartik Ramaswamy , Igor Markovsky , Zhigang Chen , James D. Carducci , Kenneth S. Collins , Shahid Rauf , Nipun Misra , Leonid Dorf , Zheng John Ye
IPC: H01J37/32
CPC classification number: H01J37/32091 , H01J37/32018 , H01J37/32082 , H01J37/32183 , H01J37/32541 , H01J37/32568 , H01J37/32577 , H01J37/32587 , H01J37/32596 , H01J37/3266 , H01J37/32715 , H01J37/32834
Abstract: The disclosure pertains to a capacitively coupled plasma source in which VHF power is applied through an impedance-matching coaxial resonator having a symmetrical power distribution.
Abstract translation: 本公开涉及通过具有对称功率分布的阻抗匹配同轴谐振器施加VHF功率的电容耦合等离子体源。
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Patent Agency Ranking
6.发明授权公开(公告)号：US08734664B2
公开(公告)日：2014-05-27
申请号：US13958898
申请日：2013-08-05
Applicant: Applied Materials, Inc.
Inventor： Yang Yang , Kartik Ramaswamy , Kenneth S. Collins , Steven Lane , Douglas A. Buchberger, Jr. , Lawrence Wong , Nipun Misra
CPC classification number: H01J37/32064 , H01J37/32082 , H01J37/32174 , H01J37/32623 , H01J37/32642 , H01J2237/2001 , H01L21/67109 , H01L21/6833
Abstract: A method of controlling distribution of a plasma parameter in a plasma reactor having an RF-driven electrode and two (or more) counter electrodes opposite the RF driven electrode and facing different portions of the process zones. The method includes providing two (or more) variable reactances connected between respective ones of the counter electrodes and ground, and governing the variable reactances to change distribution of a plasma parameter such as plasma ion density or ion energy.
Abstract translation: 一种控制等离子体反应器中等离子体参数分布的方法，其具有RF驱动电极和与RF驱动电极相对的两个（或更多个）对置电极并且面对处理区的不同部分。 该方法包括提供连接在相应的对置电极和接地之间的两个（或多个）可变电抗，并且控制可变电抗以改变诸如等离子体离子密度或离子能量之类的等离子体参数的分布。
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7.发明申请公开(公告)号：US20140034612A1
公开(公告)日：2014-02-06
申请号：US13958898
申请日：2013-08-05
Applicant: APPLIED MATERIALS, INC.
Inventor： Yang Yang , Kartik Ramaswamy , Kenneth S. Collins , Steven Lane , Douglas A. Buchberger, JR. , Lawrence Wong , Nipun Misra
IPC: H01J37/32
CPC classification number: H01J37/32064 , H01J37/32082 , H01J37/32174 , H01J37/32623 , H01J37/32642 , H01J2237/2001 , H01L21/67109 , H01L21/6833
Abstract: A method of controlling distribution of a plasma parameter in a plasma reactor having an RF-driven electrode and two (or more) counter electrodes opposite the RF driven electrode and facing different portions of the process zones. The method includes providing two (or more) variable reactances connected between respective ones of the counter electrodes and ground, and governing the variable reactances to change distribution of a plasma parameter such as plasma ion density or ion energy.
Abstract translation: 一种控制等离子体反应器中等离子体参数分布的方法，其具有RF驱动电极和与RF驱动电极相对的两个（或更多个）对置电极并且面对处理区的不同部分。 该方法包括提供连接在相应的对置电极和接地之间的两个（或多个）可变电抗，并且控制可变电抗以改变诸如等离子体离子密度或离子能量之类的等离子体参数的分布。
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公开(公告)号：US11935724B2
公开(公告)日：2024-03-19
申请号：US18168421
申请日：2023-02-13
Applicant: Applied Materials, Inc.
Inventor： Kartik Ramaswamy , Igor Markovsky , Zhigang Chen , James D. Carducci , Kenneth S. Collins , Shahid Rauf , Nipun Misra , Leonid Dorf , Zheng John Ye
CPC classification number: H01J37/32091 , H01J37/32018 , H01J37/32082 , H01J37/32183 , H01J37/32541 , H01J37/32568 , H01J37/32577 , H01J37/32587 , H01J37/32596 , H01J37/3266 , H01J37/32715 , H01J37/32834
Abstract: The disclosure pertains to a capacitively coupled plasma source in which VHF power is applied through an impedance-matching coaxial resonator having a symmetrical power distribution.
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公开(公告)号：US20210313147A1
公开(公告)日：2021-10-07
申请号：US17353668
申请日：2021-06-21
Applicant: Applied Materials, Inc.
Inventor： Kartik Ramaswamy , Igor Markovsky , Zhigang Chen , James D. Carducci , Kenneth S. Collins , Shahid Rauf , Nipun Misra , Leonid Dorf , Zheng John Ye
IPC: H01J37/32
Abstract: The disclosure pertains to a capacitively coupled plasma source in which VHF power is applied through an impedance-matching coaxial resonator having a symmetrical power distribution.
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公开(公告)号：US11043361B2
公开(公告)日：2021-06-22
申请号：US15793802
申请日：2017-10-25
Applicant: Applied Materials, Inc.
Inventor： Kartik Ramaswamy , Igor Markovsky , Zhigang Chen , James D. Carducci , Kenneth S. Collins , Shahid Rauf , Nipun Misra , Leonid Dorf , Zheng John Ye
Abstract: The disclosure pertains to a capacitively coupled plasma source in which VHF power is applied through an impedance-matching coaxial resonator having a symmetrical power distribution.
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