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公开(公告)号：US20230197406A1
公开(公告)日：2023-06-22
申请号：US18168421
申请日：2023-02-13
Applicant: Applied Materials, Inc.
Inventor： Kartik Ramaswamy , Igor Markovsky , Zhigang Chen , James D. Carducci , Kenneth S. Collins , Shahid Rauf , Nipun Misra , Leonid Dorf , Zheng John Ye
IPC: H01J37/32
CPC classification number: H01J37/32091 , H01J37/32541 , H01J37/3266 , H01J37/32018 , H01J37/32082 , H01J37/32183 , H01J37/32568 , H01J37/32577 , H01J37/32587 , H01J37/32596 , H01J37/32715 , H01J37/32834
Abstract: The disclosure pertains to a capacitively coupled plasma source in which VHF power is applied through an impedance-matching coaxial resonator having a symmetrical power distribution.
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公开(公告)号：US20180053630A1
公开(公告)日：2018-02-22
申请号：US15793802
申请日：2017-10-25
Applicant: Applied Materials, Inc.
Inventor： Kartik Ramaswamy , Igor Markovsky , Zhijang Chen , James D. Carducci , Kenneth S. Collins , Shahid Rauf , Nipun Misra , Leonid Dorf , Zheng John Ye
IPC: H01J37/32
CPC classification number: H01J37/32091 , H01J37/32018 , H01J37/32082 , H01J37/32183 , H01J37/32541 , H01J37/32568 , H01J37/32577 , H01J37/32587 , H01J37/32596 , H01J37/3266 , H01J37/32715 , H01J37/32834
Abstract: The disclosure pertains to a capacitively coupled plasma source in which VHF power is applied through an impedance-matching coaxial resonator having a symmetrical power distribution.
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公开(公告)号：US11587766B2
公开(公告)日：2023-02-21
申请号：US17353668
申请日：2021-06-21
Applicant: Applied Materials, Inc.
Inventor： Kartik Ramaswamy , Igor Markovsky , Zhigang Chen , James D. Carducci , Kenneth S. Collins , Shahid Rauf , Nipun Misra , Leonid Dorf , Zheng John Ye
Abstract: The disclosure pertains to a capacitively coupled plasma source in which VHF power is applied through an impedance-matching coaxial resonator having a symmetrical power distribution.
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Patent Agency Ranking
公开(公告)号：US20150075719A1
公开(公告)日：2015-03-19
申请号：US14548692
申请日：2014-11-20
Applicant: APPLIED MATERIALS, INC.
Inventor： Kartik Ramaswamy , Igor Markovsky , Zhigang Chen , James D. Carducci , Kenneth S. Collins , Shahid Rauf , Nipun Misra , Leonid Dorf , Zheng John Ye
IPC: H01J37/32
CPC classification number: H01J37/32091 , H01J37/32018 , H01J37/32082 , H01J37/32183 , H01J37/32541 , H01J37/32568 , H01J37/32577 , H01J37/32587 , H01J37/32596 , H01J37/3266 , H01J37/32715 , H01J37/32834
Abstract: The disclosure pertains to a capacitively coupled plasma source in which VHF power is applied through an impedance-matching coaxial resonator having a symmetrical power distribution.
Abstract translation: 本公开涉及通过具有对称功率分布的阻抗匹配同轴谐振器施加VHF功率的电容耦合等离子体源。
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公开(公告)号：US11935724B2
公开(公告)日：2024-03-19
申请号：US18168421
申请日：2023-02-13
Applicant: Applied Materials, Inc.
Inventor： Kartik Ramaswamy , Igor Markovsky , Zhigang Chen , James D. Carducci , Kenneth S. Collins , Shahid Rauf , Nipun Misra , Leonid Dorf , Zheng John Ye
CPC classification number: H01J37/32091 , H01J37/32018 , H01J37/32082 , H01J37/32183 , H01J37/32541 , H01J37/32568 , H01J37/32577 , H01J37/32587 , H01J37/32596 , H01J37/3266 , H01J37/32715 , H01J37/32834
Abstract: The disclosure pertains to a capacitively coupled plasma source in which VHF power is applied through an impedance-matching coaxial resonator having a symmetrical power distribution.
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公开(公告)号：US20210313147A1
公开(公告)日：2021-10-07
申请号：US17353668
申请日：2021-06-21
Applicant: Applied Materials, Inc.
Inventor： Kartik Ramaswamy , Igor Markovsky , Zhigang Chen , James D. Carducci , Kenneth S. Collins , Shahid Rauf , Nipun Misra , Leonid Dorf , Zheng John Ye
IPC: H01J37/32
Abstract: The disclosure pertains to a capacitively coupled plasma source in which VHF power is applied through an impedance-matching coaxial resonator having a symmetrical power distribution.
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公开(公告)号：US11043361B2
公开(公告)日：2021-06-22
申请号：US15793802
申请日：2017-10-25
Applicant: Applied Materials, Inc.
Inventor： Kartik Ramaswamy , Igor Markovsky , Zhigang Chen , James D. Carducci , Kenneth S. Collins , Shahid Rauf , Nipun Misra , Leonid Dorf , Zheng John Ye
Abstract: The disclosure pertains to a capacitively coupled plasma source in which VHF power is applied through an impedance-matching coaxial resonator having a symmetrical power distribution.
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公开(公告)号：US09824862B2
公开(公告)日：2017-11-21
申请号：US14548692
申请日：2014-11-20
Applicant: APPLIED MATERIALS, INC.
Inventor： Kartik Ramaswamy , Igor Markovsky , Zhigang Chen , James D. Carducci , Kenneth S. Collins , Shahid Rauf , Nipun Misra , Leonid Dorf , Zheng John Ye
CPC classification number: H01J37/32091 , H01J37/32018 , H01J37/32082 , H01J37/32183 , H01J37/32541 , H01J37/32568 , H01J37/32577 , H01J37/32587 , H01J37/32596 , H01J37/3266 , H01J37/32715 , H01J37/32834
Abstract: The disclosure pertains to a capacitively coupled plasma source in which VHF power is applied through an impedance-matching coaxial resonator having a symmetrical power distribution.
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