Invention Publication
- Patent Title: SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR
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Application No.: US18168421Application Date: 2023-02-13
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Publication No.: US20230197406A1Publication Date: 2023-06-22
- Inventor: Kartik Ramaswamy , Igor Markovsky , Zhigang Chen , James D. Carducci , Kenneth S. Collins , Shahid Rauf , Nipun Misra , Leonid Dorf , Zheng John Ye
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- The original application number of the division: US13047052 2011.03.14
- Main IPC: H01J37/32
- IPC: H01J37/32
Abstract:
The disclosure pertains to a capacitively coupled plasma source in which VHF power is applied through an impedance-matching coaxial resonator having a symmetrical power distribution.
Public/Granted literature
- US11935724B2 Symmetric VHF source for a plasma reactor Public/Granted day:2024-03-19
Information query
