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    PHOTOELECTRIC SURFACE ELECTRON SOURCE
    73.
    发明公开
    PHOTOELECTRIC SURFACE ELECTRON SOURCE 审中-公开

    公开(公告)号：US20230290605A1

    公开(公告)日：2023-09-14

    申请号：US18020989

    申请日：2021-06-09

    Applicant: HAMAMATSU PHOTONICS K.K. ,  NuFlare Technology, Inc.

    Inventor： Tomohiko HIRANO ,  Hiroyuki TAKETOMI ,  Motohiro SUYAMA ,  Wataru MATSUDAIRA ,  Akihiro KAGEYAMA ,  Kota IWASAKI ,  Taku YAMADA

    IPC: H01J37/06 ,  H01J37/10

    CPC classification number: H01J37/06 ,  H01J37/10 ,  H01J2237/026

    Abstract: A photoelectric surface electron source includes a glass substrate configured to receive laser light incident from a substrate back surface to emit the laser light from a substrate main surface, a photoelectric surface provided on the substrate main surface and configured to receive the laser light and emit a photoelectron, a lens array disposed on the substrate back surface and including a plurality of microlenses for condensing the laser light toward the photoelectric surface, and a light shielding portion provided on the glass substrate. The light shielding portion has a back surface-side light shielding layer provided on a back surface-side light shielding surface interposed between the plurality of microlenses on the substrate back surface, and a main surface-side light shielding layer provided on a main surface-side light shielding surface.

    Ion milling device and milling processing method using same
    74.
    发明授权
    Ion milling device and milling processing method using same 有权

    公开(公告)号：US11742178B2

    公开(公告)日：2023-08-29

    申请号：US17637728

    申请日：2019-08-23

    Applicant: Hitachi High-Tech Corporation

    Inventor： Hitoshi Kamoshida ,  Hisayuki Takasu ,  Atsushi Kamino ,  Shota Aida ,  Megumi Nakamura

    IPC: H01J37/305 ,  H01J37/08 ,  H01J37/20 ,  H01J37/304

    CPC classification number: H01J37/3056 ,  H01J37/08 ,  H01J37/20 ,  H01J37/304 ,  H01J2237/026 ,  H01J2237/20207 ,  H01J2237/24535

    Abstract: The invention provides an ion milling device capable of cross-sectional milling on an all-solid-state battery while reducing an occurrence of a short circuit due to a redeposition film. The ion milling device includes a sample stage 5 on which a sample 8 is placed, an ion source 1 configured to emit an unfocused ion beam 4 toward the sample, a stage controller 6 configured to cause the sample stage to perform a swing operation centered on a swing axis S0 set to be orthogonal to an ion beam center B0 of the ion beam, and cause the sample stage to perform a sliding operation along a line of intersection between a plane (YZ plane) including the ion beam center and perpendicularly intersecting the swing axis and a sample placement surface of the sample stage, in which the stage controller causes, in a first mode operation, the sample stage to perform the swing operation and the ion source to emit the ion beam to mill the sample, and causes in a second mode operation, the sample stage to perform the sliding operation and the ion source to emit the ion beam to remove sputter particles adhered again to the sample in the first mode operation.

    HOLDING DEVICE, AND USE OF THE HOLDING DEVICE
    75.
    发明公开
    HOLDING DEVICE, AND USE OF THE HOLDING DEVICE 审中-公开

    公开(公告)号：US20230245868A1

    公开(公告)日：2023-08-03

    申请号：US17998541

    申请日：2021-05-07

    Applicant: HANWHA Q CELLS GMBH

    Inventor： Martin SCHAPER

    IPC: H01J37/32 ,  H01L21/673 ,  C23C16/46 ,  C23C16/458

    CPC classification number: H01J37/32724 ,  C23C16/463 ,  C23C16/4583 ,  H01L21/6733 ,  H01L21/67316 ,  H01J2237/002 ,  H01J2237/026 ,  H01J2237/201 ,  H01J2237/3321

    Abstract: A holding device for holding a plurality of substrates for plasma-enhanced deposition of a layer from the gas phase on the substrates, having: inner carrier plates, arranged parallel to one another and designed to carry substrates on mutually opposite sides; outer carrier plates, arranged parallel to the inner carrier plates and having an inner side facing the inner carrier plates, and an outer side facing away from the inner carrier plates, wherein each outer carrier plate is designed to carry one or more substrates on its inner side and to be free of substrates on its outer side; and shielding plates which are each arranged at a distance from the outer side of the outer carrier plate such that, as seen in a plan view of the outer carrier plates, the shielding plates at least predominantly shield the outer carrier plates, wherein each shielding plate is free of substrates.

    LIGHT SOURCE APPARATUS
    78.
    发明申请
    LIGHT SOURCE APPARATUS 有权
    光源设备

    公开(公告)号：US20160330826A1

    公开(公告)日：2016-11-10

    申请号：US15107824

    申请日：2014-12-12

    Applicant: USHIO DENKI KABUSHIKI KAISHA

    Inventor： Gota NIIMI ,  Hironobu YABUTA

    IPC: H05G2/00 ,  H01J37/16 ,  H01J37/32 ,  F21V14/04

    CPC classification number: H05G2/003 ,  F21V14/04 ,  G03F7/70033 ,  G03F7/70916 ,  H01J37/16 ,  H01J37/3244 ,  H01J37/3266 ,  H01J2237/022 ,  H01J2237/026 ,  H01J2237/028 ,  H05G2/008

    Abstract: Disclosed herein a light source apparatus that is capable of suppressing a light transmission rate of a debris trap to be lowered and a reflection rate in a light condenser mirror to be lowered. In the light source apparatus, a shielding member is provided having an aperture is provided in front of a stationary type foil trap to limit a solid angle of light emitted from a high temperature plasma. Furthermore, the stationary type foil trap is provided with a driving mechanism to allow the foil trap to be revolved such that an adhesion part of the debris of the foil trap is deviated from a position of the foil trap facing the aperture.

    Abstract translation: 这里公开了一种光源装置，其能够抑制要降低的碎屑陷阱的光透射率和降低聚光镜中的反射率。 在光源装置中，设置有在固定型箔捕获器的前方设置有孔径以限制从高温等离子体发射的光的立体角的屏蔽构件。 此外，固定式箔捕获器设置有驱动机构，以允许箔捕获器旋转，使得箔捕获器的碎屑的粘附部分偏离面向孔的箔捕获器的位置。

    Charged particle beam lithography apparatus and method, and article manufacturing method
    79.
    发明授权
    Charged particle beam lithography apparatus and method, and article manufacturing method 失效
    带电粒子束光刻设备及方法及制品制造方法

    公开(公告)号：US08772734B2

    公开(公告)日：2014-07-08

    申请号：US13727710

    申请日：2012-12-27

    Applicant: Canon Kabushiki Kaisha

    Inventor： Toshiro Yamanaka

    IPC: H01J3/07 ,  H01J37/147 ,  H01J3/26

    CPC classification number: G21K5/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/3177 ,  H01J2237/026 ,  H01J2237/0435 ,  H01J2237/31794

    Abstract: A lithograph apparatus that performs writing on a substrate with a plurality of charged particle beams. A blanking deflector array blanks the plurality of charged particle beams. An aperture array blocks n charged particle beam deflected by the blanking deflector array. A sealing mechanism seals an opening or at least one of the blanking deflector array and the aperture array with a shielding material that shields a charged particle beam. A moving mechanism moves the substrate so that the writing is performed with a blankable charged particle beam instead of an unblankable charged particle beam shielded by the shielding material.

    Abstract translation: 在多个带电粒子束的基板上进行写入的平版印刷装置。 消隐偏转器阵列空白多个带电粒子束。 孔径阵列阻挡由消隐偏转器阵列偏转的带电粒子束。 密封机构利用遮蔽带电粒子束的屏蔽材料来密封消隐偏转器阵列和孔径阵列中的开口或至少一个。 移动机构移动基板，使得用可无遮挡的带电粒子束执行写入，而不是屏蔽材料屏蔽的不可白化的带电粒子束。

    ARC CHAMBER WITH MULTIPLE CATHODES FOR AN ION SOURCE
    80.
    发明申请
    ARC CHAMBER WITH MULTIPLE CATHODES FOR AN ION SOURCE 有权
    具有多个阴极的电弧室用于离子源

    公开(公告)号：US20140167614A1

    公开(公告)日：2014-06-19

    申请号：US13719309

    申请日：2012-12-19

    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

    Inventor： Chin-Tsung LIN ,  Hsiao-Yin HSIEH ,  Chi-Hao HUANG ,  Hong-Hsing CHOU ,  Yeh-Chieh WANG

    IPC: H01J37/08 ,  H01J37/317

    CPC classification number: H01J37/08 ,  H01J37/244 ,  H01J37/3171 ,  H01J2237/0203 ,  H01J2237/024 ,  H01J2237/026 ,  H01J2237/08 ,  H01J2237/303 ,  H01J2237/30405

    Abstract: An apparatus for extending the useful life of an ion source, comprising an arc chamber containing a plurality of cathodes to be used sequentially and a plurality of repellers to protect cathodes when not in use. The arc chamber includes an arc chamber housing defining a reaction cavity, gas injection openings, a plurality of cathodes, and at least one repeller element. A method for extending the useful life of an ion source includes providing power to a first cathode of an arc chamber in an ion source, operating the first cathode, detecting a failure or degradation in performance of the first cathode, energizing a second cathode, and continuing operation of the arc chamber with the second cathode.

    Abstract translation: 一种用于延长离子源的使用寿命的装置，包括电弧室，其包含要顺序使用的多个阴极，以及多个防水剂，以在不使用时保护阴极。 电弧室包括限定反应腔的电弧室壳体，气体注入开口，多个阴极和至少一个排斥元件。 用于延长离子源的使用寿命的方法包括向离子源中的电弧室的第一阴极提供电力，操作第一阴极，检测第一阴极的故障或性能下降，激励第二阴极，以及 与第二阴极连续操作电弧室。

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