公开(公告)号：US20190172677A1

公开(公告)日：2019-06-06

申请号：US16200421

申请日：2018-11-26

Applicant: Hermes Microvision, Inc.

Inventor： Weiming REN ,  Xuedong LIU ,  Xuerang HU ,  Zhongwei CHEN

IPC: H01J37/28 ,  H01J37/29 ,  H01J37/20 ,  H01J37/153 ,  H01J37/244 ,  H01J37/141 ,  H01J37/14

Abstract: A secondary projection imaging system in a multi-beam apparatus is proposed, which makes the secondary electron detection with high collection efficiency and low cross-talk. The system employs one zoom lens, one projection lens and one anti-scanning deflection unit. The zoom lens and the projection lens respectively perform the zoom function and the anti-rotating function to remain the total imaging magnification and the total image rotation with respect to the landing energies and/or the currents of the plural primary beamlets. The anti-scanning deflection unit performs the anti-scanning function to eliminate the dynamic image displacement due to the deflection scanning of the plural primary beamlets.

公开(公告)号：US10276342B2

公开(公告)日：2019-04-30

申请号：US15952989

申请日：2018-04-13

Applicant: JEOL Ltd.

Inventor： Masaki Mukai

IPC: H01J37/153 ,  H01J37/22 ,  H01J37/21 ,  H01J37/05 ,  H01J37/12 ,  H01J37/14

Abstract: An electron microscope includes a monochromator, an image acquiring portion for obtaining an electron microscope image containing interference fringes of the electron beam formed by an aperture located behind the monochromator, a line profile acquiring portion for obtaining a plurality of line profiles passing through the center of the aperture on the EM image, an energy dispersion direction identifying portion for identifying the direction of energy dispersion of the monochromator on the basis of the line profiles obtained by the line profile acquiring portion, and an optics controller for controlling an optical system on the basis of a line profile in the direction of energy dispersion to bring the focal plane for the electron beam exiting from the monochromator into coincidence with the achromatic plane.

公开(公告)号：US20190088446A1

公开(公告)日：2019-03-21

申请号：US16154350

申请日：2017-05-05

Applicant: Weiwei Xu

Inventor： Weiwei Xu

IPC: H01J37/26 ,  H01J37/10 ,  H01J37/147 ,  H01J37/153 ,  H01J37/21

Abstract: An apparatus includes at least one electron beam column, with an electron emitter source, a gun lens focusing electrons from the electron emitter source into an electron beam, and a final beam forming aperture. Each electron beam column includes one or more of a double Wein filter disposed along a trajectory of the electron beam between the gun lens and the final beam forming aperture, and a dispersion corrector disposed along a trajectory of the electron beam after the final beam forming aperture.

公开(公告)号：US20190066968A1

公开(公告)日：2019-02-28

申请号：US16109837

申请日：2018-08-23

Applicant: JEOL Ltd.

Inventor： Yuji Kohno ,  Akiho Nakamura

IPC: H01J37/153 ,  H01J37/26 ,  H01J37/28 ,  H01J37/244 ,  H01J37/147

Abstract: An aberration measurement method for an objective lens in an electron microscope including an objective lens which focuses an electron beam that illuminates a specimen, and a detector which detects an electron beam having passed through the specimen, includes: introducing a coma aberration to the objective lens; measuring an aberration of the objective lens before introducing the coma aberration to the objective lens; measuring an aberration of the objective lens after introducing the coma aberration to the objective lens; and obtaining a position of an optical axis of the objective lens on a detector plane of the detector based on measurement results of the aberration of the objective lens before and after introducing the coma aberration.

公开(公告)号：US10115559B2

公开(公告)日：2018-10-30

申请号：US15403685

申请日：2017-01-11

Applicant: Hermes Microvision Inc.

Inventor： Xuedong Liu ,  Weiming Ren ,  Shuai Li ,  Zhongwei Chen

IPC: H01J37/14 ,  H01J37/147 ,  H01J37/28 ,  H01J37/04 ,  H01J37/153

Abstract: One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.

公开(公告)号：US10096448B2

公开(公告)日：2018-10-09

申请号：US15559967

申请日：2016-02-08

Applicant: NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY

Inventor： Tadahiro Kawasaki ,  Takayoshi Tanji ,  Takashi Ikuta

IPC: H01J37/14 ,  H01J37/153 ,  H01J37/145

Abstract: An electromagnetic lens for charged particle beam exhibits positive spherical aberration. A complicated combination of electromagnetic lenses had been necessary for correcting this spherical aberration. One of a circular aperture or a ring-shaped aperture is provided on an incident plate arranged on an incident side of charged particle beam, another of the circular aperture or the ring-shaped aperture is provided on a plate arranged on an emission side thereof, and a voltage is applied between the incident plate and the emission plate. By so doing, an electric field generated in the ring-shaped aperture emanates, which resolves the positive spherical aberration. The spherical aberration can be corrected by an extremely simple and easily implemented structure.

公开(公告)号：US10014153B2

公开(公告)日：2018-07-03

申请号：US15422936

申请日：2017-02-02

Applicant: JEOL Ltd.

Inventor： Yuji Kohno

IPC: H01J37/153 ,  H01J37/22 ,  H01J37/28 ,  H01J37/244 ,  H01J37/26

CPC classification number: H01J37/153 ,  H01J37/22 ,  H01J37/222 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/1534 ,  H01J2237/24455 ,  H01J2237/2802

Abstract: There is provided an electron microscope capable of measuring aberration with high accuracy. The electron microscope (100) comprises: an electron beam source (10) for producing an electron beam (EB); an illumination lens system (101) for focusing the electron beam (EB) onto a sample (S); a scanner (12) for scanning the focused electron beam (EB) over the sample (S); an aperture stop (30) having a plurality of detection angle-limiting holes (32) for extracting rays of the electron beam (EB) having mutually different detection angles from the electron beam (EB) transmitted through the sample (S); and a detector (20) for detecting the rays of the electron beam (EB) passed through the aperture stop (30).

公开(公告)号：US20180166252A1

公开(公告)日：2018-06-14

申请号：US15372536

申请日：2016-12-08

Applicant: JEOL Ltd.

Inventor： Hidetaka Sawada ,  Yu Jimbo ,  Masashi Shimizu

IPC: H01J37/153 ,  H01J37/26 ,  H01J37/22 ,  H01J37/10 ,  H01J37/147

CPC classification number: H01J37/153 ,  H01J37/10 ,  H01J37/1474 ,  H01J37/22 ,  H01J37/26 ,  H01J2237/1534 ,  H01J2237/182

Abstract: There is provided a liner tube capable of reducing the effects of magnetic field variations on an electron beam. The liner tube (10) is disposed inside the electron optical column (2) of an electron microscope (100). The interior of the tube (10) forms a path for the electron beam (EB). The liner tube (10) has a first cylindrical member (110) that is made of copper, gold, silver, or an alloy consisting principally of one of these metals.

公开(公告)号：US20180144905A1

公开(公告)日：2018-05-24

申请号：US15806872

申请日：2017-11-08

Applicant: NuFlare Technology, Inc.

Inventor： Osamu IIZUKA ,  Yukitaka SHIMIZU

IPC: H01J37/302 ,  H01J37/317 ,  H01J37/04 ,  H01J37/20 ,  H01J37/10 ,  H01J37/153 ,  H01J37/147 ,  H01J37/244

CPC classification number: H01J37/302 ,  H01J37/045 ,  H01J37/10 ,  H01J37/147 ,  H01J37/153 ,  H01J37/20 ,  H01J37/244 ,  H01J37/304 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/1532 ,  H01J2237/20221 ,  H01J2237/21 ,  H01J2237/24514 ,  H01J2237/24564 ,  H01J2237/24592 ,  H01J2237/31774 ,  H01J2237/31798

Abstract: According to one embodiment, a multi charged particle beam writing apparatus includes an objective lens adjusting a focus position of multiple beams, a coil correcting astigmatism of the multiple beams, an inspection aperture disposed in a stage and configured to allow one beam of the multiple beams to pass therethrough, a deflector deflecting the multiple beams, a current detector detecting a beam current of each beam of the multiple beams scanned over the inspection aperture in the XY direction and passed through the inspection aperture, and a controller generating a beam image on the basis of the detected beam current, calculating a feature quantity of the beam image, and controlling the objective lens or the coil on the basis of the feature quantity.

公开(公告)号：US09953802B2

公开(公告)日：2018-04-24

申请号：US15112716

申请日：2015-01-21

Applicant: Ramot at Tel-Aviv University Ltd.

Inventor： Roy Shiloh ,  Yossi Lereah ,  Ady Arie

IPC: G21K1/08 ,  H01J37/153 ,  H01J37/26

CPC classification number: H01J37/153 ,  H01J37/26 ,  H01J37/261 ,  H01J37/263 ,  H01J2237/1532 ,  H01J2237/1534 ,  H01J2237/2614

Abstract: A method of manipulating an electron beam is disclosed. The method comprises transmitting the beam through a phase mask selected to spatially modulate a phase of the beam over a cross-section thereof.