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公开(公告)号:US20190074157A1
公开(公告)日:2019-03-07
申请号:US16174146
申请日:2018-10-29
Applicant: Hermes Microvision, Inc.
Inventor: Xuedong LIU , Weiming REN , Shuai LI , Zhongwei CHEN
IPC: H01J37/147 , H01J37/04 , H01J37/28 , H01J37/153
CPC classification number: H01J37/147 , H01J37/04 , H01J37/153 , H01J37/28 , H01J2237/061 , H01J2237/083 , H01J2237/1532 , H01J2237/1534 , H01J2237/2817
Abstract: One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.
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公开(公告)号:US20170309449A1
公开(公告)日:2017-10-26
申请号:US15633639
申请日:2017-06-26
Applicant: Hermes Microvision, Inc.
Inventor: Weiming REN , Shuai LI , Xuedong LIU , Zhongwei CHEN
IPC: H01J37/28 , H01J37/12 , H01J37/147
CPC classification number: H01J37/28 , H01J37/12 , H01J37/1472 , H01J2237/04924 , H01J2237/083 , H01J2237/1205 , H01J2237/1516 , H01J2237/2817
Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.
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公开(公告)号:US20180350555A1
公开(公告)日:2018-12-06
申请号:US15925606
申请日:2018-03-19
Applicant: Hermes Microvision, Inc.
Inventor: Shuai LI , Weiming REN , Xuedong LIU , Juying DOU , Xuerang HU , Zhongwei CHEN
IPC: H01J37/28 , H01J37/10 , H01J37/244 , H01J37/20
CPC classification number: H01J37/28 , H01J37/10 , H01J37/20 , H01J37/244 , H01J2237/0453 , H01J2237/0492 , H01J2237/04924 , H01J2237/04926 , H01J2237/04928 , H01J2237/1205 , H01J2237/1501 , H01J2237/1502 , H01J2237/2446 , H01J2237/2448 , H01J2237/2806 , H01J2237/2817
Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.
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公开(公告)号:US20190172677A1
公开(公告)日:2019-06-06
申请号:US16200421
申请日:2018-11-26
Applicant: Hermes Microvision, Inc.
Inventor: Weiming REN , Xuedong LIU , Xuerang HU , Zhongwei CHEN
IPC: H01J37/28 , H01J37/29 , H01J37/20 , H01J37/153 , H01J37/244 , H01J37/141 , H01J37/14
Abstract: A secondary projection imaging system in a multi-beam apparatus is proposed, which makes the secondary electron detection with high collection efficiency and low cross-talk. The system employs one zoom lens, one projection lens and one anti-scanning deflection unit. The zoom lens and the projection lens respectively perform the zoom function and the anti-rotating function to remain the total imaging magnification and the total image rotation with respect to the landing energies and/or the currents of the plural primary beamlets. The anti-scanning deflection unit performs the anti-scanning function to eliminate the dynamic image displacement due to the deflection scanning of the plural primary beamlets.
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公开(公告)号:US20190043691A1
公开(公告)日:2019-02-07
申请号:US16053636
申请日:2018-08-02
Applicant: Hermes Microvision, Inc.
Inventor: Frank Nan ZHANG , Zhongwei CHEN , Yixiang WANG , Ying Crystal SHEN
Abstract: Systems and methods for implementing charged particle flooding in a charged particle beam apparatus are disclosed. According to certain embodiments, a charged particle beam system includes a charged particle source and a controller which controls the charged particle beam system to emit a charged particle beam in a first mode where the beam is defocused and a second mode where the beam is focused on a surface of a sample.
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