LASER DRILLING PROCESS FOR INTEGRATED CIRCUIT PACKAGE

    公开(公告)号:US20230230849A1

    公开(公告)日:2023-07-20

    申请号:US17661940

    申请日:2022-05-04

    摘要: A method includes forming an insulating layer over a package. The package has a plurality of locations where openings are subsequently formed. A first laser shot is performed, location by location, on each of the locations across the package. A first laser spot of the first laser shot overlaps with each of the locations. The first laser shot removes a first portion of the insulating layer below the first laser spot. Another laser shot is performed, location by location, on each of the locations across the package. Another laser spot of the another laser shot overlaps with each of the locations. The another laser shot removes another portion of the insulating layer below the another laser spot. Performing the another laser shot, location by location, on each of the locations across the package is repeated multiple times, until desired portions of the insulating layer are removed.

    SEMICONDUCTOR DEVICES INCLUDING A THICK METAL LAYER AND A BUMP

    公开(公告)号:US20230154876A1

    公开(公告)日:2023-05-18

    申请号:US18093880

    申请日:2023-01-06

    IPC分类号: H01L23/00 H01L21/56

    摘要: A semiconductor device includes an interlayer insulating layer disposed on a substrate; a plurality of middle interconnections disposed in the interlayer insulating layer; a pad disposed on the interlayer insulating layer; an upper interconnection disposed on the interlayer insulating layer; a protective insulating layer covering an edge of the pad, the upper interconnection, and a horizontal gap between the pad and the upper interconnection, the protective insulating layer having an opening on the pad; and a bump disposed on the pad, the bump extending on the protective insulating layer and overlapping the upper interconnection from a top-down view. At least one of the plurality of middle interconnections from among middle interconnections vertically closest to the pad has a first vertical thickness, the pad has a second vertical thickness that is twice to 100 times the first vertical thickness, a length of the gap between the pad and the upper interconnection is 1 μm or more, and an upper surface of the protective insulating layer is planar.

    Fan-out wafer-level packaging structure and method packaging the same

    公开(公告)号:US11652085B2

    公开(公告)日:2023-05-16

    申请号:US17830290

    申请日:2022-06-01

    发明人: Hailin Zhao

    IPC分类号: H01L23/00 H01L21/56

    摘要: The present disclosure provides a fan-out wafer-level packaging structure and a method for packaging the same. The structure includes: two or more semiconductor chips with a bonding pad, the semiconductor chips are arranged in a fan-out wafer array, and each of the semiconductor chips has an initial position, respectively; a plastic packaging layer, covering surfaces of the semiconductor chips and between the semiconductor chips, each of the semiconductor chips has an offset position, respectively, and the offset position has an offset distance relative to the initial position; a redistribution layer formed on the semiconductor chips, to realize interconnection between the semiconductor chips, the redistribution layer includes at least one first redistribution layer, the first redistribution layer is formed on a surface of the semiconductor chips and is aligned and in contact with the bonding pad of the semiconductor chips; and a metal bump formed on the redistribution layer.