APPARATUS AND METHOD FOR SUBSTRATE HANDLING

    公开(公告)号:US20220319903A1

    公开(公告)日:2022-10-06

    申请号:US17367631

    申请日:2021-07-06

    IPC分类号: H01L21/683 H01L21/687

    摘要: An apparatus and a method for handling a semiconductor substrate are provided. The apparatus includes a chuck table and a first flexible member. The chuck table includes a carrying surface, a first recess provided within the carrying surface, and a vacuum channel disposed below the carrying surface, and the chuck table is configured to hold the semiconductor substrate. The first flexible member is disposed within the first recess and includes a top surface protruded from the first recess, and the first flexible member is compressed as the semiconductor substrate presses against the first flexible member.

    SEMICONDUCTOR PACKAGE AND MANUFACTURING METHOD THEREOF

    公开(公告)号:US20220278023A1

    公开(公告)日:2022-09-01

    申请号:US17185966

    申请日:2021-02-26

    摘要: A semiconductor package and a manufacturing method are provided. The semiconductor package includes a carrier substrate, a through substrate via (TSV), a first conductive pattern, and an encapsulated die. The TSV penetrates through the carrier substrate and includes a first portion and a second portion connected to the first portion, the first portion includes a first slanted sidewall with a first slope, the second portion includes a second slanted sidewall with a second slope, and the first slope is substantially milder than the second slope. The first conductive pattern is disposed on the carrier substrate and connected to the first portion of the TSV. The encapsulated die is disposed on the carrier substrate and electrically coupled to the TSV through the first conductive pattern.