Transmitted and/or incident light microscope
    52.
    发明授权
    Transmitted and/or incident light microscope 失效
    透射和/或入射光学显微镜

    公开(公告)号:US4784481A

    公开(公告)日:1988-11-15

    申请号:US897759

    申请日:1986-08-13

    Applicant: Volker Wuerfel

    Inventor: Volker Wuerfel

    Abstract: Transmitted-light and/or reflected-light microscope in closed or open vertical-frame stand design (1; 2) having a vertical object stage plane (5) and a horizontal optical microscope axis (7) which is perpendicular to the object stage (5). An alternative embodiment of the microscope casing comprises at least two vertical stand parts (11; 12) which are connected together by a stand plate (13) and--as seen by the observer (47)--are arranged one behind the other. A vertical object stage (5), to which the horizontally-extending optical axis (7) is perpendicular, is located between the two stand parts (11; 12). The angular deflection .alpha. between the vertical plane (63) and the object stage plane, and thus the angular deflection between the horizontal and the optical axis (7), can be up to 30.degree. in both versions, according to the condition: 0.degree..ltoreq..alpha..ltoreq.30.degree.. In all embodiments, contamination-free handling and inspection of large-surface-area objects (6), particularly wafers, is achieved by the establishment of a laminar flow, acting in the region of the object. The observer (47) can carry out all necessary microexamination and handling functions from ergonomically-designed control panels (45, 55), which are all located outside of the critical object region on the instrument. The instrument system can be employed in fully-automated, in-process computer-controlled wafer inspection, measuring and handling lines as a central component.

    Abstract translation: PCT No.PCT / DE85 / 00526 Sec。 371日期1986年8月13日 102(e)日期1986年8月13日PCT提交1985年12月14日PCT公布。 出版物WO86 / 03847 日期:1986年7月3日。具有垂直物镜平面(5)和水平光学显微镜轴(7)的封闭或开放的垂直框架架设计(1; 2)中的透射光和/或反射光显微镜 垂直于物体台(5)。 显微镜外壳的替代实施例包括至少两个垂直支架部分(11; 12),它们由支撑板(13)连接在一起,并且由观察者(47)所看到 - 布置成彼此靠近。 水平延伸的光轴(7)垂直于其的垂直物体台(5)位于两个支架部分(11; 12)之间。 根据以下条件,垂直平面(63)和物镜平面之间的角度偏转α(水平和光轴(7))之间的角度偏差可以在两个版本中高达30°

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