Manufacturing method of substrate with through electrode
    41.
    发明授权
    Manufacturing method of substrate with through electrode 有权
    具有通孔电极的基板的制造方法

    公开(公告)号:US08349733B2

    公开(公告)日:2013-01-08

    申请号:US12132187

    申请日:2008-06-03

    申请人: Takaharu Yamano

    发明人: Takaharu Yamano

    IPC分类号: H01L21/768

    摘要: A manufacturing method of a substrate with through electrodes, comprising a substrate having through holes, and through electrodes received in the through holes, includes a through electrode formation step of forming the through electrodes on a support plate, a substrate formation step of forming the substrate, a through electrode reception step of stacking the substrate on the support plate 45 and receiving the through electrodes in the through holes, a resin filling step of filling gaps between side surfaces of the through electrodes and inner walls of the through holes of the substrate 11 with a resin, and a support plate removal step of removing the support plate after the resin filling step.

    摘要翻译: 具有贯通电极的基板的制造方法,具有通孔的基板和贯通孔内的电极,具有在支撑板上形成贯通电极的贯通电极形成工序,形成基板的基板形成工序 通孔电极接收步骤,将基板堆叠在支撑板45上并接收通孔中的通孔;树脂填充步骤,填充通孔的侧表面之间的间隙和基板11的通孔的内壁 以及在树脂填充步骤之后移除支撑板的支撑板移除步骤。

    SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
    43.
    发明申请
    SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME 审中-公开
    半导体器件及其制造方法

    公开(公告)号:US20120153507A1

    公开(公告)日:2012-06-21

    申请号:US13331121

    申请日:2011-12-20

    IPC分类号: H01L23/48 H01L21/56

    摘要: A method include disposing a semiconductor chip having an electrode pad formed on a circuit forming surface on one surface of a support so that the electrode pad contacts with the one surface of the support, forming a first insulating layer on the one surface of the support so that the first insulating layer covers at least a side surface of the semiconductor chip, removing the support and forming an interconnection terminal on the electrode pad, forming a second insulating layer on the circuit forming surface of the semiconductor chip and the first insulating layer so that the second insulating layer covers the interconnection terminal, exposing an end portion of the interconnection terminal from a top surface of the second insulating layer, and forming a wiring pattern that is electrically connected to the end portion of the interconnection terminal, on the top surface of the second insulating layer.

    摘要翻译: 一种方法包括在支撑体的一个表面上设置具有形成在电路形成表面上的电极焊盘的半导体芯片,使得电极焊盘与支撑体的一个表面接触,在支撑体的一个表面上形成第一绝缘层, 第一绝缘层至少覆盖半导体芯片的侧表面,去除支撑并在电极焊盘上形成互连端子,在半导体芯片的电路形成表面和第一绝缘层上形成第二绝缘层,使得 所述第二绝缘层覆盖所述互连端子,将所述互连端子的端部从所述第二绝缘层的顶表面露出,并且形成与所述互连端子的端部电连接的布线图案, 第二绝缘层。

    Method for forming wiring on insulating resin layer
    45.
    发明授权
    Method for forming wiring on insulating resin layer 有权
    在绝缘树脂层上形成布线的方法

    公开(公告)号:US07955454B2

    公开(公告)日:2011-06-07

    申请号:US11516737

    申请日:2006-09-07

    摘要: The method for forming wiring includes: laminating a thermosetting resin film and a metallic foil on an insulating substrate where base-layer wiring is formed, a mat surface of the metallic foil facing the resin film, pressing the film and the foil with application of heat; forming an opening in the metallic foil to expose a part of the insulating resin layer in which a via hole is to be formed; forming the via hole in the insulating resin layer by using as a mask the metallic foil; performing a desmear process of the via hole via the opening of the metallic foil; removing the metallic foil; forming an electroless-plated layer that covers the top surface of the insulating resin layer, a side surface of the via hole and a top surface of the base-layer wiring; and forming wiring including an electroplated layer on the electroless-plated layer.

    摘要翻译: 形成布线的方法包括:在形成基底布线的绝缘基板上层叠热固性树脂膜和金属箔,金属箔的面向树脂膜的垫表面,施加热量来压制膜和箔 ; 在所述金属箔中形成开口以暴露要形成通孔的绝缘树脂层的一部分; 通过使用金属箔作为掩模在绝缘树脂层中形成通孔; 经由金属箔的开口进行通孔的去污处理; 去除金属箔; 形成覆盖绝缘树脂层的顶面,通孔的侧面和基底布线的顶面的无电镀层; 以及在所述化学镀层上形成包括电镀层的布线。

    MANUFACTURING METHOD OF SUBSTRATE WITH THROUGH ELECTRODE
    50.
    发明申请
    MANUFACTURING METHOD OF SUBSTRATE WITH THROUGH ELECTRODE 有权
    通过电极制作基板的方法

    公开(公告)号:US20080299768A1

    公开(公告)日:2008-12-04

    申请号:US12132187

    申请日:2008-06-03

    申请人: Takaharu Yamano

    发明人: Takaharu Yamano

    IPC分类号: H01L21/768

    摘要: A manufacturing method of a substrate with through electrodes, comprising a substrate having through holes, and through electrodes received in the through holes, includes a through electrode formation step of forming the through electrodes on a support plate, a substrate formation step of forming the substrate, a through electrode reception step of stacking the substrate on the support plate 45 and receiving the through electrodes in the through holes, a resin filling step of filling gaps between side surfaces of the through electrodes and inner walls of the through holes of the substrate 11 with a resin, and a support plate removal step of removing the support plate after the resin filling step.

    摘要翻译: 具有贯通电极的基板的制造方法,具有通孔的基板和贯通孔内的电极,具有在支撑板上形成贯通电极的贯通电极形成工序,形成基板的基板形成工序 通孔电极接收步骤,将基板堆叠在支撑板45上并在通孔中容纳通孔;树脂填充步骤,填充通孔的侧表面之间的间隙和基板11的通孔的内壁 以及在树脂填充步骤之后移除支撑板的支撑板移除步骤。