SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
    7.
    发明申请
    SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF 有权
    半导体器件及其制造方法

    公开(公告)号:US20090127665A1

    公开(公告)日:2009-05-21

    申请号:US12273901

    申请日:2008-11-19

    IPC分类号: H01L21/304 H01L23/58

    摘要: A method for manufacturing a semiconductor device has preparation step of preparing a semiconductor substrate having a plurality of semiconductor chip formation regions and a scribe region arranged between the plurality of the semiconductor chip formation regions and including a substrate cutting position, a semiconductor chip formation step of forming semiconductor chips having electrode pads on the plurality of semiconductor chip formation regions, a first insulation layer formation step of forming a first insulation layer on the semiconductor chips and the scribe region of the semiconductor substrate, a second insulation layer formation step of forming a second insulation layer on the first insulation layer except for a region corresponding to the substrate cutting position, and a cutting step of cutting the semiconductor substrate at the substrate cutting position.

    摘要翻译: 一种制造半导体器件的方法,具有制备具有多个半导体芯片形成区域的半导体衬底和布置在多个半导体芯片形成区域之间并包括衬底切割位置的划线区域的准备步骤,半导体芯片形成步骤 在所述多个半导体芯片形成区域上形成具有电极焊盘的半导体芯片,在所述半导体芯片上形成第一绝缘层和所述半导体基板的划线区域的第一绝缘层形成步骤,形成第二绝缘层形成工序, 除了与基板切断位置对应的区域之外的第一绝缘层上的绝缘层,以及在基板切断位置切断半导体基板的切断工序。

    ELECTRONIC DEVICE AND METHOD OF MANUFACTURING THE SAME
    9.
    发明申请
    ELECTRONIC DEVICE AND METHOD OF MANUFACTURING THE SAME 审中-公开
    电子设备及其制造方法

    公开(公告)号:US20090001570A1

    公开(公告)日:2009-01-01

    申请号:US12142053

    申请日:2008-06-19

    申请人: Takaharu YAMANO

    发明人: Takaharu YAMANO

    IPC分类号: H01L23/488 H01L21/44

    摘要: The present disclosure relates to a method of manufacturing an electronic device in which a plurality of first bumps serving as external connection terminals are formed on a conductive pattern. The method includes: (a) forming a second bump having a projection portion on an electrode pad formed on a substrate; (b) forming an insulating layer on the substrate; (c) exposing a portion of the projection portion from an upper surface of the insulating layer; (d) forming a flat stress absorbing layer in a bump providing area, in which the first bumps are provided, on the insulating layer; (e) forming a first conductive layer on the insulating layer and the stress absorbing layer and the exposed portion of the projection portion; (f) forming a second conductive layer by an electroplating using the first conductive layer as a power feeding layer; (g) forming the conductive pattern by patterning the second conductive layer; and (h) forming the first bumps on the conductive pattern formed on the stress absorbing layer.

    摘要翻译: 本发明涉及一种制造电子器件的方法,其中在导电图案上形成多个用作外部连接端子的第一凸起。 该方法包括:(a)在形成在基板上的电极焊盘上形成具有突出部分的第二凸块; (b)在基板上形成绝缘层; (c)从绝缘层的上表面露出突出部分的一部分; (d)在所述绝缘层上在设置有所述第一凸块的凸块供给区域中形成平坦的应力吸收层; (e)在绝缘层和应力吸收层和突出部分的暴露部分上形成第一导电层; (f)使用第一导电层作为供电层通过电镀形成第二导电层; (g)通过图案化所述第二导电层形成所述导电图案; 和(h)在形成在应力吸收层上的导电图案上形成第一凸块。