公开(公告)号：US20240151655A1

公开(公告)日：2024-05-09

申请号：US18343990

申请日：2023-06-29

申请人： CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED

发明人： Xiaohong ZOU ,  Yunlong SONG ,  Huqiang XIN ,  Lei SONG ,  Xiaohui ZHANG

IPC分类号： G01N21/956 ,  G01N21/88 ,  H04N23/54 ,  H04N23/56

CPC分类号： G01N21/956 ,  G01N21/8851 ,  H04N23/54 ,  H04N23/56

摘要： The disclosure relates to the technical field of detection devices, and provides a carved code quality detection apparatus and system, wherein the carved code quality detection apparatus includes: a support assembly, including a guide rod, a baffle and a first support plate, the guide rod extending along the height direction, the baffle being fixedly connected to the upper end of the guide rod, and the first support plate being fixedly connected to the lower end of the guide rod; a visual detection system, including an imaging assembly movably connected to the guide rod; and a driving assembly, arranged on the baffle and connected to the imaging assembly, the driving assembly being configured to drive the imaging assembly. The technical solutions can achieve online detection of the carved code quality of a member to be detected, thereby reducing the risk of false detection or missed detection caused by manual visual inspection.

公开(公告)号：US11977034B2

公开(公告)日：2024-05-07

申请号：US17194558

申请日：2021-03-08

申请人： ASML Netherlands B.V.

发明人： Wouter Lodewijk Elings ,  Franciscus Bernardus Maria Van Bilsen ,  Christianus Gerardus Maria De Mol ,  Everhardus Cornelis Mos ,  Hoite Pieter Theodoor Tolsma ,  Peter Ten Berge ,  Paul Jacques Van Wijnen ,  Leonardus Henricus Marie Verstappen ,  Gerald Dicker ,  Reiner Maria Jungblut ,  Chung-Hsun Li

IPC分类号： G01B11/14 ,  G01B11/00 ,  G01B11/02 ,  G01B11/26 ,  G01N21/95 ,  G01N21/956 ,  G03F7/00 ,  G05B19/418 ,  H01L21/66

CPC分类号： G01N21/9501 ,  G01B11/002 ,  G01B11/02 ,  G01B11/14 ,  G01B11/26 ,  G01N21/956 ,  G01N21/95607 ,  G03F7/70508 ,  G03F7/70625 ,  G03F7/70633 ,  G05B19/41875 ,  H01L22/20 ,  G05B2219/37224 ,  Y02P90/02

摘要： In the measurement of properties of a wafer substrate, such as Critical Dimension or overlay a sampling plan is produced defined for measuring a property of a substrate, wherein the sampling plan comprises a plurality of sub-sampling plans. The sampling plan may be constrained to a predetermined fixed number of measurement points and is used to control an inspection apparatus to perform a plurality of measurements of the property of a plurality of substrates using different sub-sampling plans for respective substrates, optionally, the results are stacked to at least partially recompose the measurement results according to the sample plan.

公开(公告)号：US20240142516A1

公开(公告)日：2024-05-02

申请号：US18407903

申请日：2024-01-09

申请人： Battelle Memorial Institute

发明人： Thomas F. Kent ,  Jeremiah P. Schley ,  Anthony F. George ,  Richard J. Higgins ,  Katie T. Liszewski ,  David Maung

IPC分类号： G01R31/309 ,  G01N21/956 ,  G05B19/4099 ,  G06F18/24 ,  G06N20/00 ,  G06Q10/0639 ,  G06Q10/0875 ,  G06Q10/10 ,  G06Q30/018 ,  G06T7/00 ,  G06V20/62 ,  H04N23/951

CPC分类号： G01R31/309 ,  G01N21/956 ,  G05B19/4099 ,  G06F18/24 ,  G06N20/00 ,  G06Q10/06395 ,  G06Q10/0875 ,  G06Q10/10 ,  G06Q30/0185 ,  G06T7/001 ,  G06V20/62 ,  H04N23/951 ,  G01N2021/95638 ,  G01S13/89 ,  G05B2219/49023 ,  G06T2207/10048 ,  G06T2207/20081 ,  G06T2207/30141

摘要： A multispectral inspection (MSI) device for analyzing an electronic item having a printed circuit board (PCB). An electronic power supply powers the electronic item in accordance with one or more test vectors. An optical imaging scanner, terahertz (THz) imaging scanner, and a functional imaging scanner are each operative to scan the electronic item. An electronic processor is programmed to scan the various scanners and control the power supply to acquire optical, THz, and functional images of the electronic item. The images are combined to form a standard three-dimensional (3D) signature and artificial intelligence (AI) classifiers are applied to the 3D signature to perform non-destructive analyses of the electronic item.

公开(公告)号：US11974046B2

公开(公告)日：2024-04-30

申请号：US17274046

申请日：2019-08-27

申请人： ORBOTECH LTD.

发明人： Yigal Katzir ,  Ilia Lutsker ,  Elie Meimoun

IPC分类号： G01N21/956 ,  H04N5/265 ,  H04N23/74

CPC分类号： H04N23/74 ,  G01N21/956 ,  H04N5/265 ,  G01N2021/95638

摘要： An inspection system including an illumination subsystem and an image sensing subsystem, the illumination subsystem providing a plurality of illumination modalities, the system simultaneously illuminating at least two areas of an object with different ones of the plurality of illumination modalities, images of which are acquired by a single sensor forming part of the image sensing subsystem.

公开(公告)号：US11940739B2

公开(公告)日：2024-03-26

申请号：US17562446

申请日：2021-12-27

申请人： ASML Netherlands B.V.

发明人： Nitesh Pandey ,  Arie Jeffrey Den Boef ,  Duygu Akbulut ,  Marinus Johannes Maria Van Dam ,  Hans Butler ,  Hugo Augustinus Joseph Cramer ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Ferry Zijp ,  Jeroen Arnoldus Leonardus Johannes Raaymakers ,  Marinus Petrus Reijnders

IPC分类号： G03F7/20 ,  G01N21/956 ,  G03F7/00

CPC分类号： G03F7/70625 ,  G01N21/956 ,  G03F7/7015 ,  G03F7/70633

摘要： A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.

公开(公告)号：US20240085805A1

公开(公告)日：2024-03-14

申请号：US18263305

申请日：2022-01-28

申请人： NOVA LTD.

发明人： Gilad BARAK ,  Amir Sagiv ,  Yishai Schreiber ,  Jacob Ofek ,  Zvi Gorohovsky ,  Daphna Peimer

IPC分类号： G03F7/00 ,  G01N21/956

CPC分类号： G03F7/7065 ,  G01N21/95607 ,  G03F7/70625 ,  G03F7/706831 ,  G03F7/706833 ,  G03F7/706841 ,  H01L22/12

摘要： A semiconductor device metrology including creating a time-domain representation of wavelength-domain measurement data of light reflected by a patterned structure of a semiconductor device, selecting a relevant and irrelevant portion of the time-domain representation, and determining one or more measurements of one or more parameters of interest of the patterned structure by performing model-based processing using the relevant portion of the time-domain representation.

公开(公告)号：US20230417684A1

公开(公告)日：2023-12-28

申请号：US18154679

申请日：2023-01-13

申请人： Lasertec Corporation

发明人： Jun SAKUMA ,  Ryotaro MORI

IPC分类号： G01N21/956

CPC分类号： G01N21/956 ,  G01N2201/0636

摘要： A light-source apparatus, an inspection apparatus, and an adjustment method capable of facilitating the adjustment of the temperature of a BBO crystal are provided. A light-source apparatus according to the present disclosure includes a first light source configured to generate visible light, a first external resonator including a plurality of optical mirrors, a BBO crystal disposed in the first external resonator, capable of generating UV light in a wavelength range of 233 nm to 236 nm, the UV light being a second harmonic of the visible light, a one- or two-dimensional semiconductor sensor disposed near a far-field image plane formed through an optical element provided on an optical path of the UV light, and a calculation unit configured to calculate a representative position of a light intensity distribution detected by the semiconductor sensor.

公开(公告)号：US11852583B2

公开(公告)日：2023-12-26

申请号：US18179662

申请日：2023-03-07

申请人： Samsung Electronics Co., Ltd.

发明人： Jongju Park ,  Raewon Yi ,  Hakseung Han ,  Seongsue Kim

IPC分类号： G01N21/41 ,  G01N21/956 ,  G03F1/22 ,  G03F1/84 ,  G03F1/24 ,  G01J9/00 ,  G01N21/33

CPC分类号： G01N21/41 ,  G01J9/00 ,  G01N21/956 ,  G03F1/22 ,  G03F1/24 ,  G03F1/84 ,  G01N2021/335 ,  G01N2021/95676 ,  G01N2201/061 ,  G01N2201/0636

摘要： An apparatus and a method for correctly measuring a phase of an extreme ultraviolet (EUV) mask and a method of fabricating an EUV mask including the method are described. The apparatus for measuring the phase of the EUV mask includes an EUV light source configured to generate and output EUV light, at least one mirror configured to reflect the EUV light as reflected EUV light incident on an EUV mask to be measured, a mask stage on which the EUV mask is arranged, a detector configured to receive the EUV light reflected from the EUV mask, to obtain a two-dimensional (2D) image, and to measure reflectivity and diffraction efficiency of the EUV mask, and a processor configured to determine a phase of the EUV mask by using the reflectivity and diffraction efficiency of the EUV mask.

公开(公告)号：US20230400418A1

公开(公告)日：2023-12-14

申请号：US18249454

申请日：2021-10-20

申请人： COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES

发明人： Renaud VARACHE ,  Patrick Jeremy DAHAN

IPC分类号： G01N21/95 ,  H02S50/15 ,  G01N21/956 ,  G01N21/64

CPC分类号： G01N21/9505 ,  H02S50/15 ,  G01N21/956 ,  G01N21/6489 ,  G01N2021/646 ,  G01N2021/8461

摘要： A photoluminescence measurement device may include: a sample holder; a detector configured to collect a photoluminescence signal; a processing unit configured to process a signal collected by the detector; and a support disposed facing a rear face of the sample holder, opposite to the front face, and on one face, called the main face, of which rests at least one radiation source for emitting light radiation illuminating the rear face and likely to be collected, by transparency of the sample holder with respect to the light radiation, by the detector.

公开(公告)号：US11835471B2

公开(公告)日：2023-12-05

申请号：US17490461

申请日：2021-09-30

申请人： IDEXX Laboratories, Inc.

发明人： David C. Giroux ,  Nathanael Williams

IPC分类号： G01N21/956 ,  G01N35/00

CPC分类号： G01N21/956 ,  G01N35/00623 ,  G01N2035/00673

摘要： A Z-axis measurement fixture used for testing whether a chemical reagent test slide exhibits Z-axis variability, which may affect measurements performed by an automated chemical analyzer using such test slides, includes a planar main body that holds three stainless steel balls, each ball having a known and calibrated diameter. Portions of the stainless steel balls extend outwardly from the top wall and the bottom wall of the planar main body. A chemical reagent test slide is placed on the fixture to rest on and be supported at three points by the portions of the stainless steel balls which project outwardly from the top wall of the planar main body. The fixture is placed on the surface of a gauge block of an optical measurement system such that the lower portions of the three stainless steel balls will rest on the gauge block of the optical measurement system.