发明授权
- 专利标题: Metrology apparatus
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申请号: US17562446申请日: 2021-12-27
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公开(公告)号: US11940739B2公开(公告)日: 2024-03-26
- 发明人: Nitesh Pandey , Arie Jeffrey Den Boef , Duygu Akbulut , Marinus Johannes Maria Van Dam , Hans Butler , Hugo Augustinus Joseph Cramer , Engelbertus Antonius Fransiscus Van Der Pasch , Ferry Zijp , Jeroen Arnoldus Leonardus Johannes Raaymakers , Marinus Petrus Reijnders
- 申请人: ASML Netherlands B.V.
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 优先权: EP 177431 2018.06.13 EP 189926 2018.08.21 EP 207812 2018.11.22
- 主分类号: G03F7/20
- IPC分类号: G03F7/20 ; G01N21/956 ; G03F7/00
摘要:
A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.
公开/授权文献
- US20220121127A1 METROLOGY APPARATUS 公开/授权日:2022-04-21
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