-
公开(公告)号：US11940739B2
公开(公告)日：2024-03-26
申请号：US17562446
申请日：2021-12-27
Applicant: ASML Netherlands B.V.
Inventor： Nitesh Pandey , Arie Jeffrey Den Boef , Duygu Akbulut , Marinus Johannes Maria Van Dam , Hans Butler , Hugo Augustinus Joseph Cramer , Engelbertus Antonius Fransiscus Van Der Pasch , Ferry Zijp , Jeroen Arnoldus Leonardus Johannes Raaymakers , Marinus Petrus Reijnders
IPC: G03F7/20 , G01N21/956 , G03F7/00
CPC classification number: G03F7/70625 , G01N21/956 , G03F7/7015 , G03F7/70633
Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.
-
公开(公告)号：US20190146352A1
公开(公告)日：2019-05-16
申请号：US16249518
申请日：2019-01-16
Applicant: ASML Netherlands B.V.
Inventor： Seerwan Saeed , Petrus Martinus Gerardus Johannes Arts , Harold Sebastiaan Buddenberg , Erik Henricus Egidius Catharina Eummelen , Giovanni Luca Gattobigio , Floor Lodewijk Keukens , Ferdy Migchelbrink , Jeroen Arnoldus Leonardus Johannes Raaymakers , Arnoldus Johannes Martinus Jozeph Ras , Gheorghe Tanasa , Jimmy Matheus Wilhelmus Van De Winkel , Daan Daniel Johannes Antonius Van Sommeren , Marijn Wouters , Miao Yu
Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.
-
公开(公告)号：US10191393B2
公开(公告)日：2019-01-29
申请号：US15558552
申请日：2016-02-22
Applicant: ASML Netherlands B.V.
Inventor： Jan Steven Christiaan Westerlaken , Marcel Koenraad Marie Baggen , Fransiscus Mathijs Jacobs , Jeroen Arnoldus Leonardus Johannes Raaymakers , Frank Pieter Albert Van Den Berkmortel , Marc Wilhelmus Maria Van Der Wijst
Abstract: A measurement system for a lithographic apparatus includes a sub-frame compliantly mounted on a reference frame. A measurement device, e.g. an alignment sensor, is mounted on the sub-frame. Soft mounting of the sub-frame isolates the alignment sensor from high-frequency disturbances, e.g. acoustic noise, by acting as a low-pass filter with a cut-off frequency, e.g. in the range of from 100 to 200 Hz.
-
Patent Agency Ranking
公开(公告)号：US10345713B2
公开(公告)日：2019-07-09
申请号：US16309490
申请日：2017-06-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Jeroen Arnoldus Leonardus Johannes Raaymakers , Pascal Jean Henri Bloemen , Petrus Theodorus Jutte , Arnoldus Johannes Martinus Jozeph Ras , Miao Yu
IPC: G03F7/20
Abstract: An inspection substrate for inspecting a component of an apparatus for processing production substrates, the inspection substrate has: a body having dimensions similar to the production substrates so that the inspection substrate is compatible with the apparatus; an illumination device embedded in the body, the illumination device configured to emit radiation toward a target area of the component of the apparatus; an imaging device embedded in the body, the imaging device configured to detect radiation scattered at the target area and generate an image from the detected radiation, wherein the illumination device is configured to emit the radiation such that radiation that is specularly reflected at the target area does not contribute to the image generated by the imaging device.
-
公开(公告)号：US10216100B2
公开(公告)日：2019-02-26
申请号：US15738701
申请日：2016-06-16
Applicant: ASML Netherlands B.V.
Inventor： Seerwan Saeed , Petrus Martinus Gerardus Johannes Arts , Harold Sebastiaan Buddenberg , Erik Henricus Egidius Catharina Eummelen , Giovanni Luca Gattobigio , Floor Lodewijk Keukens , Ferdy Migchelbrink , Jeroen Arnoldus Leonardus Johannes Raaymakers , Arnoldus Johannes Martinus Jozeph Ras , Gheorghe Tanasa , Jimmy Matheus Wilhelmus Van De Winkel , Daan Daniel Johannes Antonius Van Sommeren , Marijn Wouters , Miao Yu
IPC: G01N21/00 , G03F7/20 , H01L21/66 , G01N21/95 , H01L27/146 , H01L27/148
Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.
-
公开(公告)号：US11262661B2
公开(公告)日：2022-03-01
申请号：US16431833
申请日：2019-06-05
Applicant: ASML Netherlands B.V.
Inventor： Nitesh Pandey , Arie Jeffrey Den Boef , Duygu Akbulut , Marinus Johannes Maria Van Dam , Hans Butler , Hugo Augustinus Joseph Cramer , Engelbertus Antonius Fransiscus Van Der Pasch , Ferry Zijp , Jeroen Arnoldus Leonardus Johannes Raaymakers , Marinus Petrus Reijnders
IPC: G01N21/956 , G03F7/20
Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.
-
公开(公告)号：US11099490B2
公开(公告)日：2021-08-24
申请号：US16310537
申请日：2017-06-15
Applicant: ASML NETHERLANDS B.V.
Abstract: An inspection substrate for inspecting a component of an apparatus for processing production substrates, the inspection substrate having: a body having dimensions similar to the production substrates so that the inspection substrate is compatible with the apparatus; a sensor configured to generate inspection information relating to a parameter of the component of the apparatus, the sensor embedded in the body; a control detector embedded in the body and configured to detect a control signal transmitted by the apparatus for processing production substrates; and a controller embedded in the body and configured to control the sensor in response to detection of the control signal.
-
公开(公告)号：US10725390B2
公开(公告)日：2020-07-28
申请号：US16249518
申请日：2019-01-16
Applicant: ASML Netherlands B.V.
Inventor： Seerwan Saeed , Petrus Martinus Gerardus Johannes Arts , Harold Sebastiaan Buddenberg , Erik Henricus Egidius Catharina Eummelen , Giovanni Luca Gattobigio , Floor Lodewijk Keukens , Ferdy Migchelbrink , Jeroen Arnoldus Leonardus Johannes Raaymakers , Arnoldus Johannes Martinus Jozeph Ras , Gheorghe Tanasa , Jimmy Matheus Wilhelmus Van De Winkel , Daan Daniel Johannes Antonius Van Sommeren , Marijn Wouters , Miao Yu
IPC: G03F7/20 , H01L21/66 , G01N21/95 , H01L27/146 , H01L27/148
Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.
-
-
-
-
-
-
-
Search Results
8
records
(took 0.016 seconds)
