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公开(公告)号：US10527959B2
公开(公告)日：2020-01-07
申请号：US16325471
申请日：2017-06-30
发明人： Simon Reinald Huisman , Simon Gijsbert Josephus Mathijssen , Sebastianus Adrianus Goorden , Duygu Akbulut , Alessandro Polo
摘要： An alignment sensor for a lithographic apparatus has an optical system configured to deliver, collect and process radiation selectively in a first waveband (e.g. 500-900 nm) and/or in a second waveband (e.g. 1500-2500 nm). The radiation of the first and second wavebands share a common optical path in at least some portion of the optical system, while the radiation of the first waveband is processed by a first processing sub-system and the radiation of the second waveband is processed by a second processing sub-system. The processing subsystems in one example include self-referencing interferometers. The radiation of the second waveband allows marks to be measured through an opaque layer. Optical coatings and other components of each processing sub-system can be tailored to the respective waveband, without completely duplicating the optical system.
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公开(公告)号：US20190384184A1
公开(公告)日：2019-12-19
申请号：US16431833
申请日：2019-06-05
发明人： Nitesh Pandey , Arie Jeffrey Den Boef , Duygu Akbulut , Marinus Johannes Maria Van Dam , Hans Butler , Hugo Augustinus Joseph Cramer , Engelbertus Antonius Fransiscu Van Der Pasch , Ferry Zijp , Jeroen Arnoldus Leonardus Raaymakers , Marinus Petrus Reijnders
IPC分类号： G03F7/20 , G01N21/956
摘要： A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.
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公开(公告)号：US20160266503A1
公开(公告)日：2016-09-15
申请号：US15065674
申请日：2016-03-09
发明人： Peter Danny Van Voorst , Duygu Akbulut , Koos Van Berkel , Jeroen Johan Maarten Van De Wijdeven , Ferry Zijp
CPC分类号： G03F7/70483 , G01B11/00 , G01N21/956 , G02B21/0016 , G02B21/33 , G02B27/0988 , G03F7/70625 , G03F7/70633
摘要： A method of position control of an optical component relative to a surface is disclosed. The method may include: obtaining a first signal by a first position measurement process; controlling relative movement between the optical component and the surface for a first range of motion using the first signal; obtaining a second signal by a second position measurement process different than the first position measurement process; and controlling relative movement between the optical component and the surface for a second range of motion using the second signal, the second range of motion being nearer the surface than the first range of motion.
摘要翻译： 公开了一种光学部件相对于表面的位置控制的方法。 该方法可以包括：通过第一位置测量处理获得第一信号; 使用所述第一信号来控制所述光学部件和所述表面之间的第一运动范围的相对运动; 通过与第一位置测量处理不同的第二位置测量处理获得第二信号; 以及使用所述第二信号来控制所述光学部件和所述表面之间的相对运动的第二运动范围，所述第二运动范围比所述第一运动范围更靠近所述表面。
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公开(公告)号：US11927891B2
公开(公告)日：2024-03-12
申请号：US16963273
申请日：2018-12-20
IPC分类号： G01N29/11 , G01B9/02015 , G01N29/06 , G03F7/00 , G03F9/00
CPC分类号： G03F9/7061 , G01B9/02015 , G01N29/0681 , G03F7/70625 , G03F7/70633 , G01B2290/25 , G01N2291/2697
摘要： A sensor is disclosed, wherein a transducer generates acoustic waves, which are received by a lens assembly. The lens assembly transmits and directs at least a part of the acoustic waves to a target. The lens assembly then receives at least a part of acoustic waves, after interaction with the target. The sensor further comprises an optical detector that comprises at least one optically reflective member located at a surface of the lens assembly, which surface is arranged opposite to a surface of the lens assembly which faces a focal plane of the lens assembly, wherein the at least one optically reflective member is mechanically displaced in response to the acoustic waves, which are received and transmitted by the lens assembly.
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公开(公告)号：US11333985B2
公开(公告)日：2022-05-17
申请号：US17254601
申请日：2019-06-05
发明人： Sebastianus Adrianus Goorden , Simon Reinald Huisman , Duygu Akbulut , Alessandro Polo , Johannes Antonius Gerardus Akkermans , Arie Jeffrey Den Boef
IPC分类号： G03F9/00
摘要： The invention provides a position sensor (300) which comprises an optical system (305,306) configured to provide measurement radiation (304) to a substrate (307). The optical system is arranged to receive at least a portion of radiation (309) diffracted by a mark (308) provided on the substrate. A processor (313) is applied to derive at least one position-sensitive signal (312) from the received radiation. The measurement radiation comprises at least a first and a second selected radiation wavelength. The selection of the at least first and second radiation wavelengths is based on a position error swing-curve model.
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公开(公告)号：US11243470B2
公开(公告)日：2022-02-08
申请号：US16331547
申请日：2017-08-21
发明人： Nitish Kumar , Adrianus Johannes Hendrikus Schellekens , Sietse Thijmen Van Der Post , Ferry Zijp , Willem Maria Julia Marcel Coene , Peter Danny Van Voorst , Duygu Akbulut , Sarathi Roy
IPC分类号： G03F7/20
摘要： An optical system delivers illuminating radiation and collects radiation after interaction with a target structure on a substrate. A measurement intensity profile is used to calculate a measurement of the property of the structure. The optical system may include a solid immersion lens. In a method, the optical system is controlled to obtain a first intensity profile using a first illumination profile and a second intensity profile using a second illumination profile. The profiles are used to derive a correction for mitigating the effect of, e.g., ghost reflections. Using, e.g., half-moon illumination profiles in different orientations, the method can measure ghost reflections even where a solid immersion lens would cause total internal reflection. The optical system may include a contaminant detection system to control a movement based on received scattered detection radiation. The optical system may include an optical component having a dielectric coating to enhance evanescent wave interaction.
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公开(公告)号：US11940739B2
公开(公告)日：2024-03-26
申请号：US17562446
申请日：2021-12-27
发明人： Nitesh Pandey , Arie Jeffrey Den Boef , Duygu Akbulut , Marinus Johannes Maria Van Dam , Hans Butler , Hugo Augustinus Joseph Cramer , Engelbertus Antonius Fransiscus Van Der Pasch , Ferry Zijp , Jeroen Arnoldus Leonardus Johannes Raaymakers , Marinus Petrus Reijnders
IPC分类号： G03F7/20 , G01N21/956 , G03F7/00
CPC分类号： G03F7/70625 , G01N21/956 , G03F7/7015 , G03F7/70633
摘要： A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.
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公开(公告)号：US20210124276A1
公开(公告)日：2021-04-29
申请号：US17254601
申请日：2019-06-05
发明人： Sebastianus Adrianus Goorden , Simon Reinald Huisman , Duygu Akbulut , Alessandro Polo , Johannes Antonius Gerardus Akkermans , Arie Jeffrey Den Boef
IPC分类号： G03F9/00
摘要： The invention provides a position sensor (300) which comprises an optical system (305, 306) configured to provide measurement radiation (304) to a substrate (307). The optical system is arranged to receive at least a portion of radiation (309) diffracted by a mark (308) provided on the substrate. A processor (313) is applied to derive at least one position-sensitive signal (312) from the received radiation. The measurement radiation comprises at least a first and a second selected radiation wavelength. The selection of the at least first and second radiation wavelengths is based on a position error swing-curve model.
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公开(公告)号：US10908514B2
公开(公告)日：2021-02-02
申请号：US16562869
申请日：2019-09-06
发明人： Janneke Ravensbergen , Duygu Akbulut , Nitesh Pandey , Jin Lian
摘要： A metrology apparatus is disclosed that has an optical system to focus radiation onto a structure and directs redirected radiation from the structure to a detection system. The optical system applies a plurality of different offsets of an optical characteristic to radiation before and/or after redirected by the structure, such that a corresponding plurality of different offsets are provided to redirected radiation derived from a first point of a pupil plane field distribution relative to redirected radiation derived from a second point of the pupil plane field distribution. The detection system detects a corresponding plurality of radiation intensities resulting from interference between the redirected radiation derived from the first point of the pupil plane field distribution and the redirected radiation derived from the second point of the pupil plane field distribution. Each radiation intensity corresponds to a different one of the plurality of different offsets.
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公开(公告)号：US10788766B2
公开(公告)日：2020-09-29
申请号：US16611500
申请日：2018-03-06
发明人： Sebastianus Adrianus Goorden , Simon Reinald Huisman , Duygu Akbulut , Alessandro Polo , Simon Gijsbert Josephus Mathijssen
摘要： Disclosed is a metrology sensor apparatus and associated method. The metrology sensor apparatus comprises an illumination system operable to illuminate a metrology mark on a substrate with illumination radiation having a first polarization state and an optical collection system configured to collect scattered radiation, following scattering of the illumination radiation by the metrology mark. The metrology mark comprises a main structure and changes, relative to the first polarization state, at least one of a polarization state of a first portion of the scattered radiation predominately resultant from scattering by the main structure and a polarization state of a second portion of radiation predominately resultant from scattering by one or more features other than the main structure, such that the polarization state of the first portion of the scattered radiation is different to the polarization state of the second portion of the scattered radiation. The metrology sensor apparatus further comprises an optical filtering system which filters out the second portion of the scattered radiation based on its polarization state.
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