公开(公告)号：US20190384184A1

公开(公告)日：2019-12-19

申请号：US16431833

申请日：2019-06-05

申请人： ASML Netherlands B.V.

发明人： Nitesh Pandey ,  Arie Jeffrey Den Boef ,  Duygu Akbulut ,  Marinus Johannes Maria Van Dam ,  Hans Butler ,  Hugo Augustinus Joseph Cramer ,  Engelbertus Antonius Fransiscu Van Der Pasch ,  Ferry Zijp ,  Jeroen Arnoldus Leonardus Raaymakers ,  Marinus Petrus Reijnders

IPC分类号： G03F7/20 ,  G01N21/956

摘要： A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.