公开(公告)号：US10816906B2

公开(公告)日：2020-10-27

申请号：US16254896

申请日：2019-01-23

Applicant: ASML Netherlands B.V.

Inventor： Nan Lin ,  Arie Jeffrey Den Boef ,  Sander Bas Roobol ,  Simon Gijsbert Josephus Mathijssen ,  Niels Geypen

IPC: G03F7/20 ,  G01N21/95 ,  G01N21/956 ,  G01B11/24 ,  G02F1/355 ,  G02F1/37 ,  H01S3/00 ,  H01S3/13 ,  H01S3/16 ,  G01N21/88

Abstract: Disclosed is a method of performing a measurement in an inspection apparatus, and an associated inspection apparatus and HHG source. The method comprises configuring one or more controllable characteristics of at least one driving laser pulse of a high harmonic generation radiation source to control the output emission spectrum of illumination radiation provided by the high harmonic generation radiation source; and illuminating a target structure with said illuminating radiation. The method may comprise configuring the driving laser pulse so that the output emission spectrum comprises a plurality of discrete harmonic peaks. Alternatively the method may comprise using a plurality of driving laser pulses of different wavelengths such that the output emission spectrum is substantially monochromatic.

公开(公告)号：US10705437B2

公开(公告)日：2020-07-07

申请号：US16155424

申请日：2018-10-09

Applicant: ASML Netherlands B.V.

Inventor： Narjes Javaheri ,  Mohammadreza Hajiahmadi ,  Murat Bozkurt ,  Alberto Da Costa Assafrao ,  Marc Johannes Noot ,  Simon Gijsbert Josephus Mathijssen ,  Jin Lian

IPC: G03F7/20 ,  G01N21/47 ,  G01B11/24 ,  G01B11/30 ,  H01L23/544

Abstract: Disclosed is a method, and associated apparatuses, for measuring a parameter of interest relating to a structure having at least two layers. The method comprises illuminating the structure with measurement radiation and detecting scattered radiation having been scattered by said structure. The scattered radiation comprises normal and complementary higher diffraction orders. A scatterometry model which relates a scattered radiation parameter to at least a parameter of interest and an asymmetry model which relates the scattered radiation parameter to at least one asymmetry parameter are defined, the asymmetry parameter relating to one or more measurement system errors and/or an asymmetry in the target other than a misalignment between the two layers. A combination of the scatterometry model and asymmetry model is used to determine a system of equations, and the system of equations is then solved for the parameter of interest.

公开(公告)号：US10451559B2

公开(公告)日：2019-10-22

申请号：US16102178

申请日：2018-08-13

Applicant: ASML Netherlands B.V.

Inventor： Peter Danny Van Voorst ,  Nan Lin ,  Sander Bas Roobol ,  Simon Gijsbert Josephus Mathijssen ,  Sietse Thijmen Van Der Post

IPC: G01N21/88 ,  G03F7/20 ,  G01N21/95 ,  H05G2/00 ,  G01N21/956

Abstract: Disclosed is an inspection apparatus and associated method for measuring a target structure on a substrate. The inspection apparatus comprises an illumination source for generating measurement radiation; an optical arrangement for focusing the measurement radiation onto said target structure; and a compensatory optical device. The compensatory optical device may comprise an SLM operable to spatially modulate the wavefront of the measurement radiation so as to compensate for a non-uniform manufacturing defect in said optical arrangement. In alternative embodiments, the compensatory optical device may be located in the beam of measurement radiation, or in the beam of pump radiation used to generate high harmonic radiation in a HHG source. Where located in the beam of pump radiation, the compensatory optical device may be used to correct pointing errors, or impart a desired profile or varying illumination pattern in a beam of the measurement radiation.

公开(公告)号：US20180239160A1

公开(公告)日：2018-08-23

申请号：US15898394

申请日：2018-02-16

Applicant: ASML Netherlands B.V.

Inventor： Sander Bas Roobol ,  Simon Gijsbert Josephus Mathijssen ,  Stefan Michael Bruno Bäumer

IPC: G02B27/42

CPC classification number: G02B27/4255 ,  G02B27/62 ,  G03F7/70158 ,  G03F7/70258 ,  G03F7/70316 ,  G03F7/70575 ,  G03F7/70591 ,  G03F7/7085

Abstract: A method of aligning a diffractive optical system, to be operated with an operating beam, comprises: aligning (558) the diffractive optical system using an alignment beam having a different wavelength range from the operating beam and using a diffractive optical element optimized (552) to diffract the alignment beam and the operating beam in the same (or a predetermined) direction. In an example, the alignment beam comprises infra-red (IR) radiation and the operating beam comprises soft X-ray (SXR) radiation. The diffractive optical element is optimized by providing it with a first periodic structure with a first pitch (pIR) and a second periodic structure with a second pitch (pSXR). After alignment, the vacuum system is pumped down (562) and in operation the SXR operating beam is generated (564) by a high harmonic generation (HHG) optical source pumped by the IR alignment beam’ optical source.

公开(公告)号：US09939742B2

公开(公告)日：2018-04-10

申请号：US14427942

申请日：2013-11-04

Applicant: ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus Tinnemans ,  Arie Jeffrey Den Boef ,  Simon Gijsbert Josephus Mathijssen

IPC: G03B27/68 ,  G03F9/00

CPC classification number: G03F9/7069 ,  G03F9/7088

Abstract: A lithographic apparatus includes a sensor, such as an alignment sensor including a self-referencing interferometer, configured to determine the position of an alignment target including a periodic structure. An illumination optical system focuses radiation of different colors and polarizations into a spot which scans the structure. Multiple position-dependent signals are detected and processed to obtain multiple candidate position measurements. Asymmetry of the structure is calculated by comparing the multiple position-dependent signals. The asymmetry measurement is used to improve accuracy of the position read by the sensor. Additional information on asymmetry may be obtained by an asymmetry sensor receiving a share of positive and negative orders of radiation diffracted by the periodic structure to produce a measurement of asymmetry in the periodic structure.

公开(公告)号：US20180011029A1

公开(公告)日：2018-01-11

申请号：US15641579

申请日：2017-07-05

Applicant: ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus TINNEMANS ,  Nan Lin ,  Sander Bas Roobol ,  Simon Gijsbert Josephus Mathijssen

IPC: G01N21/88 ,  G02F1/35 ,  G01N21/47 ,  G01N21/956

CPC classification number: G01N21/8806 ,  G01N21/4788 ,  G01N21/956 ,  G01N2021/95676 ,  G01N2201/0697 ,  G02F1/353 ,  G03F7/70008 ,  G03F7/70616

Abstract: Disclosed is an illumination source for generating measurement radiation for an inspection apparatus. The source generates at least first measurement radiation and second measurement radiation such that the first measurement radiation and the second measurement radiation interfere to form combined measurement radiation modulated with a beat component. The illumination source may be a HHG source. Also disclosed is an inspection apparatus comprising such a source and an associated inspection method.

公开(公告)号：US09733572B2

公开(公告)日：2017-08-15

申请号：US14764939

申请日：2014-03-06

Applicant: ASML Netherlands B.V.

Inventor： Simon Gijsbert Josephus Mathijssen

IPC: G01B11/00 ,  G03F7/20 ,  G01B11/14 ,  G03F9/00

CPC classification number: G03F7/70141 ,  G01B11/14 ,  G03F9/7046 ,  G03F9/7076 ,  G03F9/7088 ,  G03F9/7092

Abstract: A lithographic apparatus includes an alignment sensor including a self-referencing interferometer for reading the position of a mark including a periodic structure. An illumination optical system focuses radiation of different colors and polarizations into a spot which scans said structure. Multiple position-dependent signals are detected in a detection optical system and processed to obtain multiple candidate position measurements. Each mark includes sub-structures of a size smaller than a resolution of the optical system. Each mark is formed with a positional offset between the sub-structures and larger structures that is a combination of both known and unknown components. A measured position of at least one mark is calculated using signals from a pair of marks, together with information on differences between the known offsets, in order to correct for said unknown component of said positional offset.

公开(公告)号：US20150261097A1

公开(公告)日：2015-09-17

申请号：US14418373

申请日：2013-07-16

Applicant: ASML Netherlands B.V.

Inventor： Simon Gijsbert Josephus Mathijssen ,  Arie Jeffrey Den Boef

IPC: G03F7/20

CPC classification number: G03F7/70141 ,  G03F9/7026 ,  G03F9/7034

Abstract: An apparatus for measuring positions of marks on a substrate, includes an illumination arrangement for supplying radiation with a predetermined illumination profile across a pupil of the apparatus, an objective lens for forming a spot of radiation on a mark using radiation supplied by said illumination arrangement, a radiation processing element for processing radiation that is diffracted by the mark, a first detection arrangement for detecting variations in an intensity of radiation output by the radiation processing element and for calculating therefrom a position of the mark, an optical arrangement, a second detection arrangement, wherein the optical arrangement serves to direct diffracted radiation to the second detection arrangement, and wherein the second detection arrangement is configured to detect size and/or position variations in the radiation and to calculate therefrom a defocus and/or local tilt of the mark.

Abstract translation: 一种用于测量基板上的标记位置的装置，包括：用于向装置的瞳孔提供具有预定照明轮廓的辐射的照明装置;用于使用由所述照明装置提供的辐射在标记上形成辐射点的物镜; 用于处理由标记衍射的辐射的辐射处理元件;第一检测装置，用于检测由辐射处理元件输出的辐射强度的变化，并从其计算标记的位置，光学装置，第二检测装置 ，其中所述光学装置用于将衍射辐射引导到所述第二检测装置，并且其中所述第二检测装置被配置为检测所述辐射中的尺寸和/或位置变化并由其计算所述标记的散焦和/或所述局部倾斜。

公开(公告)号：US12158435B2

公开(公告)日：2024-12-03

申请号：US17634588

申请日：2020-07-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Nitesh Pandey ,  Simon Gijsbert Josephus Mathijssen ,  Kaustuve Bhattacharyya ,  Arie Jeffrey Den Boef

IPC: G01J3/36 ,  G01N21/95 ,  G02B27/10 ,  G02B27/14 ,  G03F7/00

Abstract: An illumination and detection apparatus for a metrology tool, and associated method. The apparatus includes an illumination arrangement operable to produce measurement illumination having a plurality of discrete wavelength bands and having a spectrum having no more than a single peak within each wavelength band. The detection arrangement includes a detection beamsplitter to split scattered radiation into a plurality of channels, each channel corresponding to a different one of the wavelength bands; and at least one detector for separate detection of each channel.

公开(公告)号：US12130246B2

公开(公告)日：2024-10-29

申请号：US17419653

申请日：2019-12-19

Applicant: ASML Netherlands B.V.

Inventor： Simon Gijsbert Josephus Mathijssen ,  Arie Jeffrey Den Boef ,  Kaustuve Bhattacharyya

IPC: G01N23/20 ,  G03F7/00 ,  G06T5/10

CPC classification number: G01N23/20 ,  G03F7/70633 ,  G06T5/10 ,  G06T2207/30148

Abstract: A method includes receiving an image formed in a metrology apparatus wherein the image comprises at least the resulting effect of at least two diffraction orders, and processing the image wherein the processing comprises at least a filtering step, for example a Fourier filter. The process of applying a filter may be obtained also by placing an aperture in the detection branch of the metrology apparatus.