公开(公告)号：US08586922B2

公开(公告)日：2013-11-19

申请号：US13505119

申请日：2010-12-06

Applicant: Isao Nagaoki ,  Toshiaki Tanigaki ,  Yoshihiro Ohtsu

Inventor： Isao Nagaoki ,  Toshiaki Tanigaki ,  Yoshihiro Ohtsu

IPC: H01J37/26

CPC classification number: H01J37/09 ,  H01J37/244 ,  H01J37/26 ,  H01J2237/24475

Abstract: A transmission electron microscope includes an electron gun 1 that irradiates a sample 5 with an electron beam 2; an electron detector 13 that detects electrons that are passed through the sample 5 and scattered; a first detection-side annular aperture 15 that is located between the electron detector 13 and the sample 5 and has a ring-shaped slit that limits inner and outer diameters of a transmission region of electrons scattered from the sample 5; and a second detection-side annular aperture 16 that is located between the first detection-side annular aperture 15 and the electron detector 13 and has a ring-shaped slit that limits inner and outer diameters of a transmission region of scattered electrons that have passed through the first detection-side annular aperture 15. It is, therefore, possible to detect electrons scattered at high scattering angles without a limitation caused by a spherical aberration of an electron lens and improve a depth resolution.

Abstract translation: 透射电子显微镜包括：用电子束2照射样品5的电子枪1; 电子检测器13，其检测通过样品5并分散的电子; 第一检测侧环形孔15位于电子检测器13和样品5之间，并且具有限制从样品5散射的电子的透射区域的内径和外径的环形狭缝; 以及第二检测侧环形孔16，其位于第一检测侧环形孔15和电子检测器13之间，并且具有限制已经通过的散射电子的透射区域的内径和外径的环形狭缝 第一检测侧环形孔15.因此，可以检测以高散射角度散射的电子，而不受电子透镜的球面像差引起的限制并提高深度分辨率。

公开(公告)号：US08563951B2

公开(公告)日：2013-10-22

申请号：US13419761

申请日：2012-03-14

Applicant: Jin Choi ,  Jin-Ha Jeong ,  Vladimir Urazaev ,  Hea-Yun Lee

Inventor： Jin Choi ,  Jin-Ha Jeong ,  Vladimir Urazaev ,  Hea-Yun Lee

IPC: G21K5/04

CPC classification number: G03F1/78 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/0455 ,  H01J2237/30472 ,  H01J2237/31776

Abstract: Exposure systems include a beam generator, which is configured to irradiate source beams in a direction of an object to be exposed by the source beams, along with first and second beam shapers. The first beam shaper, which is disposed proximate the beam generator, has a first aperture therein positioned to pass through the source beams received from the beam generator. The second beam shaper is disposed proximate the first beam shaper. The second beam shaper includes a plate having a second aperture therein, which is positioned to receive the source beams that are passed through the first aperture of the first beam shaper. The second beam shaper further includes a first actuator and a first shift screen mechanically coupled to the first actuator.

Abstract translation: 曝光系统包括光束发生器，其被配置成沿着第一和第二光束整形器照射源光束的待曝光物体的方向上的光源射束。 设置在光束发生器附近的第一光束整形器具有其中定位成穿过从光束发生器接收的源光束的第一孔。 第二光束整形器靠近第一光束整形器设置。 第二光束整形器包括其中具有第二孔的板，其被定位成接收穿过第一光束整形器的第一孔的源光束。 第二光束整形器还包括机械耦合到第一致动器的第一致动器和第一移位屏幕。

公开(公告)号：US08552407B2

公开(公告)日：2013-10-08

申请号：US13386980

申请日：2010-07-14

Applicant: Asako Kaneko ,  Hirobumi Muto ,  Atsushi Kamino

Inventor： Asako Kaneko ,  Hirobumi Muto ,  Atsushi Kamino

IPC: G01N1/32

CPC classification number: H01J37/09 ,  G01N1/286 ,  H01J37/20 ,  H01J37/305 ,  H01J37/31

Abstract: Disclosed is a shield (8, 10) disposed between an ion source (1) of an ion milling device and a sample (7) so as to be in contact with the sample. The shield is characterized by having a circular shape having an opening at the center, and by being capable of rotating about an axis (11) extending through the opening. Further, a groove is provided in the ion source-side surface of an end portion of the shield, and an inclined surface is provided on an end portion of the shield. Thus, an ion milling device having a shield, wherein the maximum number of machining operations can be increased, and the position of the shield can be accurately adjusted.

Abstract translation: 公开了设置在离子铣削装置的离子源（1）和样品（7）之间以与样品接触的屏蔽（8,10）。 该屏蔽的特征在于具有在中心具有开口的圆形形状，并且能够绕延伸穿过开口的轴线（11）旋转。 此外，在屏蔽的端部的离子源侧表面设置有槽，并且在屏蔽的端部设置有倾斜面。 因此，具有屏蔽件的离子铣削装置，其中可以增加最大数量的加工操作，并且可以精确地调节护罩的位置。

公开(公告)号：US20130216953A1

公开(公告)日：2013-08-22

申请号：US13768258

申请日：2013-02-15

Applicant: NuFlare Technology, Inc.

Inventor： Takanao TOUYA ,  Takahito NAKAYAMA

IPC: G21K5/08

CPC classification number: G21K5/08 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/12 ,  H01J37/3174

Abstract: An electron beam writing apparatus comprising a stage that a sample is placed on, an electron optical column, an electron gun emitting an electron beam disposed in the optical column, an electrostatic lens provided with electrodes aligned in an axial direction of the electron beam disposed in the optical column, and a voltage supply device for applying positive voltage constantly to the electrostatic lens. A shield plate is disposed between the XY stage and the electron optical column to block reflected electrons or secondary electrons generated by irradiation to the sample with the electron beam. The electrostatic lens is disposed immediately above the shield plate to change a focal position of the electron beam. A voltage supply device applies a positive voltage constantly to the electrostatic lens.

Abstract translation: 一种电子束写入装置，包括放置样品的电极，电子光学柱，发射设置在光学柱中的电子束的电子枪，设置有沿着电子束的轴向排列的电极的静电透镜， 光学柱，以及用于向静电透镜恒定施加正电压的电压供给装置。 屏蔽板设置在XY平台和电子光学柱之间以阻挡通过用电子束照射到样品产生的反射电子或二次电子。 静电透镜设置在屏蔽板的正上方，以改变电子束的焦点位置。 电压供给装置将静电透镜恒定地施加正电压。

公开(公告)号：US08497476B2

公开(公告)日：2013-07-30

申请号：US13420731

申请日：2012-03-15

Applicant: Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Yoshihiko Naito ,  Yasushi Toma ,  Tsutomu Karimata ,  Takehide Hayashi ,  Kiwamu Tsukamoto ,  Tatsuya Kohama ,  Noboru Kobayashi

Inventor： Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Yoshihiko Naito ,  Yasushi Toma ,  Tsutomu Karimata ,  Takehide Hayashi ,  Kiwamu Tsukamoto ,  Tatsuya Kohama ,  Noboru Kobayashi

IPC: G01N23/225

CPC classification number: H01J37/073 ,  G01N23/22 ,  G01N23/223 ,  G01N23/2251 ,  G01N2223/611 ,  H01J1/34 ,  H01J37/09 ,  H01J37/10 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J37/29 ,  H01J2237/0048 ,  H01J2237/022 ,  H01J2237/032 ,  H01J2237/038 ,  H01J2237/045 ,  H01J2237/0458 ,  H01J2237/0473 ,  H01J2237/0492 ,  H01J2237/061 ,  H01J2237/06333 ,  H01J2237/166 ,  H01J2237/186 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/2008 ,  H01J2237/2448 ,  H01J2237/2482 ,  H01J2237/2485 ,  H01J2237/2817 ,  H01J2237/2855 ,  H01J2237/2857

Abstract: An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator capable of generating one of either charge particles or an electromagnetic wave as a beam, a primary optical system capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture, an image processing system capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.

Abstract translation: 用于使用光束检查检查对象的表面的检查装置包括能够产生电荷粒子或电磁波之一作为光束的光束发生器，能够将所述光束引导并照射到被检查对象的主光学系统 在工作室内，能够包括第一可移动数值孔径的二次光学系统和检测从检查对象产生的二次电荷粒子的第一检测器，通过第一可移动数值孔径的二次电荷粒子，能够 基于由所述第一检测器检测到的次级电荷粒子形成图像; 以及第二检测器，其布置在第一可移动数值孔径和第一检测器之间，并且检测在从检查对象生成的次级充电颗粒的交叉位置处的位置和形状。

公开(公告)号：US08476607B2

公开(公告)日：2013-07-02

申请号：US13534044

申请日：2012-06-27

Applicant: Tomonori Ishikawa ,  Nobushige Korenaga

Inventor： Tomonori Ishikawa ,  Nobushige Korenaga

IPC: H01J37/304

CPC classification number: H01J37/20 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/3177 ,  H01J2237/0264 ,  H01J2237/20221

Abstract: The drawing apparatus includes an optical system housing configured to emit a charged particle beam toward the substrate, a stage configured to hold the substrate and be moved at least in a direction perpendicular to an axis of the optical system housing, a detection device including a detector and a support for supporting the detector such that the detector faces a side surface of the stage, and configured for measuring a position of the stage, and a magnetic shield member provided to the stage and configured to shield an opening of the optical system housing that faces a top surface of the stage from a magnetic field. Here, the magnetic shield member is provided to the stage at a region, in a direction of the axis, other than a region where the detection device is provided.

Abstract translation: 所述绘制装置包括构造成向所述基板发射带电粒子束的光学系统壳体，被配置为保持所述基板并且至少沿垂直于所述光学系统壳体的轴线的方向移动的台架;检测装置，包括检测器 以及用于支撑所述检测器的支撑件，使得所述检测器面向所述台的侧表面并且被配置为用于测量所述台的位置;以及磁屏蔽构件，其设置在所述台上并且被配置为屏蔽所述光学系统壳体的开口， 从磁场面向舞台的顶面。 这里，除了设置有检测装置的区域以外，在轴的方向上的区域设置有磁屏蔽构件。

公开(公告)号：US08471203B2

公开(公告)日：2013-06-25

申请号：US12756455

申请日：2010-04-08

Applicant: Gerd Benner ,  Matthias Langer

Inventor： Gerd Benner ,  Matthias Langer

IPC: G01N23/00

CPC classification number: H01J37/244 ,  H01J37/09 ,  H01J37/153 ,  H01J37/263 ,  H01J2237/1534 ,  H01J2237/24455 ,  H01J2237/24475 ,  H01J2237/262 ,  H01J2237/28

Abstract: A particle beam microscope includes an illumination system generating a particle beam having a ring-shaped conical configuration. A selective detection system is configured to selectively detect one of two groups of particles having traversed the object region. The first group of particles includes the particles that traversed the object region un-scattered or scattered by a small scattering amount. The second group of particles includes particles scattered in the object region by a greater scattering amount.

Abstract translation: 粒子束显微镜包括产生具有环形锥形构造的粒子束的照明系统。 选择性检测系统被配置为选择性地检测穿过对象区域的两组颗粒中的一个。 第一组粒子包括通过小散射量穿过物体区域而不散射或散射的粒子。 第二组颗粒包括在物体区域散射较大散射量的颗粒。

公开(公告)号：US20130043414A1

公开(公告)日：2013-02-21

申请号：US13397703

申请日：2012-02-16

Applicant: Alon ROSENTHAL

Inventor： Alon ROSENTHAL

IPC: H05K9/00 ,  G21K5/00

CPC classification number: G03F7/70858 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/708 ,  H01J37/09 ,  H01J37/1475 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0264 ,  H01J2237/31754 ,  H01J2237/31774 ,  H01J2237/31793 ,  H01L21/6719 ,  H01L21/67213

Abstract: The invention relates to a system for magnetically shielding a charged particle lithography apparatus. The system comprises a first chamber, a second chamber and a set of two coils. The first chamber has walls comprising a magnetic shielding material, and, at least partially, encloses the charged particle lithography apparatus. The second chamber also has walls comprising a magnetic shielding material, and encloses the first chamber. The set of two coils is disposed in the second chamber on opposing sides of the first chamber. The two coils have a common axis.

Abstract translation: 本发明涉及一种用于磁屏蔽带电粒子光刻设备的系统。 该系统包括第一室，第二室和一组两个盘管。 第一室具有包括磁屏蔽材料的壁，并且至少部分地包围带电粒子光刻设备。 第二室还具有包括磁屏蔽材料的壁，并且包围第一室。 该组两个线圈被布置在第二腔室中的第一腔室的相对侧上。 两个线圈具有公共轴。

公开(公告)号：US20130011797A1

公开(公告)日：2013-01-10

申请号：US13534044

申请日：2012-06-27

Applicant: Tomonori Ishikawa ,  Nobushige Korenaga

Inventor： Tomonori Ishikawa ,  Nobushige Korenaga

IPC: G03F7/20 ,  G21K5/10

CPC classification number: H01J37/20 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/3177 ,  H01J2237/0264 ,  H01J2237/20221

Abstract: The drawing apparatus of the present invention includes an optical system housing configured to emit a charged particle beam toward the substrate; a stage configured to hold the substrate and be moved at least in a direction perpendicular to an axis of the optical system housing; a detection device including a detector and a support for supporting the detector such that the detector faces a side surface of the stage, and configured for measuring a position of the stage; and a magnetic shield member provided to the stage and configured to shield an opening of the optical system housing that faces a top surface of the stage from a magnetic field. Here, the magnetic shield member is provided to the stage at a detection region, in a direction of the axis, other than a region where the detection device is provided.

Abstract translation: 本发明的绘图装置包括一个配置成向基片发射带电粒子束的光学系统壳体; 其被配置为保持所述基板并且至少沿垂直于所述光学系统壳体的轴线的方向移动; 检测装置，包括检测器和用于支撑所述检测器的支撑件，使得所述检测器面向所述台的侧表面，并且被配置用于测量所述台的位置; 以及磁屏蔽构件，其设置在所述平台上并被配置为将所述光学系统壳体的面向所述平台顶表面的开口与磁场隔离。 这里，除了设置有检测装置的区域以外，在轴的方向上的检测区域处将磁屏蔽构件设置在台架上。

公开(公告)号：US20120293780A1

公开(公告)日：2012-11-22

申请号：US13295249

申请日：2011-11-14

Applicant: Laura DINU-GÜRTLER ,  Willem Henk URBANUS ,  Marco Jan-Jaco WIELAND ,  Stijn Willem Herman Karel STEENBRINK

Inventor： Laura DINU-GÜRTLER ,  Willem Henk URBANUS ,  Marco Jan-Jaco WIELAND ,  Stijn Willem Herman Karel STEENBRINK

IPC: G03B27/52

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/16 ,  H01J37/18 ,  H01J37/301 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/188

Abstract: A charged particle lithography system for transferring a pattern onto the surface of a target, comprising a main vacuum chamber, a source chamber and an intermediate chamber, both located in the main vacuum chamber, a beam generator for generating a charged particle beam, the beam generator located in the source chamber, and a first aperture array element for generating a plurality of charged particle beamlets from the beam, the first aperture array element located in the intermediate chamber. The system is adapted for maintaining a first pressure in the main vacuum chamber, a second pressure in the intermediate chamber, and a third pressure in the source chamber, and wherein the first pressure is lower than an ambient pressure, the second pressure is lower than the first pressure, and the third pressure is lower than the second pressure.

Abstract translation: 一种用于将图案转印到目标表面上的带电粒子光刻系统，包括位于主真空室中的主真空室，源室和中间室，用于产生带电粒子束的束发生器， 位于源室中的发生器，以及用于从所述梁产生多个带电粒子子束的第一孔阵列元件，位于中间室中的第一孔阵列元件。 该系统适于维持主真空室中的第一压力，中间室中的第二压力和源室中的第三压力，并且其中第一压力低于环境压力，第二压力低于 第一压力和第三压力低于第二压力。