公开(公告)号：US20220328278A1

公开(公告)日：2022-10-13

申请号：US17655876

申请日：2022-03-22

Applicant: NuFlare Technology, Inc.

Inventor： Hirofumi MORITA ,  Takanao TOUYA

IPC: H01J37/147 ,  H01J37/317 ,  H01J37/12

Abstract: In one embodiment, a charged particle beam writing apparatus includes a positioning deflector adjusting an irradiation position of a charged particle beam radiated to a substrate which is a writing target, a fixed deflector which is disposed downstream of the positioning deflector in a traveling direction of the charged particle beam, and in which an amount of deflection is fixed, a focus correction lens performing focus correction on the charged particle beam according to a surface height of the substrate, and an object lens focusing the charged particle beam.

公开(公告)号：US20140175302A1

公开(公告)日：2014-06-26

申请号：US14108844

申请日：2013-12-17

Applicant: NuFlare Technology, Inc.

Inventor： Takanao TOUYA ,  Munehiro Ogasawara

IPC: H01J37/317

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3007 ,  H01J2237/04922 ,  Y10S430/143

Abstract: A multi charged particle beam writing apparatus includes a stage to mount a target object thereon and to be movable, an emission unit to emit a charged particle beam, an aperture member, in which a plurality of openings are formed, to produce multiple beams by letting a region including the whole of a plurality of openings be irradiated with the charged particle beam and letting portions of the charged particle beam respectively pass through a corresponding opening of a plurality of openings, a reduction optical system to reduce the multiple beams, and a doublet lens, arranged at the subsequent stage of the reduction optical system, in which a magnification is 1 and directions of magnetic fluxes are opposite.

Abstract translation: 一种多带电粒子束写入装置，包括：载置目标物体并可移动的载台，发射带电粒子束的发射单元，形成有多个开口的孔径构件，通过放电产生多个波束 对包含整个多个开口的区域照射带电粒子束并使带电粒子束的部分分别穿过多个开口的对应开口，还原光学系统以减少多个光束，并且双峰 透镜，布置在还原光学系统的后续阶段，其中放大率为1，磁通量的方向相反。

公开(公告)号：US20240013999A1

公开(公告)日：2024-01-11

申请号：US18331502

申请日：2023-06-08

Applicant: NuFlare Technology, Inc.

Inventor： Toshiki KIMURA ,  Hirofumi MORITA ,  Takanao TOUYA ,  Hayato KIMURA ,  Kazuhiro CHIBA

IPC: H01J37/04 ,  H01J37/147 ,  H01J37/304

CPC classification number: H01J37/045 ,  H01J37/147 ,  H01J37/304 ,  H01J2237/0437

Abstract: According to one embodiment of the present invention, a mounting substrate is installed on a multi charged particle beam irradiation apparatus, and a blanking aperture array chip provided with blanking electrodes to perform blanking deflection on beams in a multi charged particle beam is mounted on the mounting substrate. The mounting substrate includes an opening through which the multi charged particle beam passes, a plurality of control circuits that supply a control signal to the blanking electrodes for each of a plurality of areas into which the blanking aperture array chip is divided, and grounds, each of which is provided for a corresponding one of the plurality of control circuits and configured to supply a ground electrical potential to the corresponding control circuit. The grounds corresponding to the control circuits are electrically separated from each other.

公开(公告)号：US20220399181A1

公开(公告)日：2022-12-15

申请号：US17805887

申请日：2022-06-08

Applicant: NuFlare Technology, Inc.

Inventor： Toshiki KIMURA ,  Hirofumi MORITA ,  Takanao TOUYA ,  Mitsuhiro OKAZAWA

IPC: H01J37/317 ,  H01J37/04 ,  H01J37/09

Abstract: In one embodiment, a multi charged particle beam writing apparatus includes a blanking aperture array substrate provided with a plurality of blankers configured to respectively perform blanking deflection on a plurality of charged particle beams included in a multi-beam, and a first shield member which is disposed downstream of the blanking aperture array substrate with respect to a travel direction of the multi-beam, has a cylindrical part in which the multi-beam passes through, and is composed of a high magnetic permeability material.

公开(公告)号：US20190115185A1

公开(公告)日：2019-04-18

申请号：US16214603

申请日：2018-12-10

Applicant: NuFlare Technology, Inc.

Inventor： Takahito NAKAYAMA ,  Takanao TOUYA

IPC: H01J37/04 ,  H01J37/10 ,  B82Y10/00 ,  H01J37/317 ,  B82Y40/00

Abstract: A charged particle beam writing apparatus according to one aspect of the present invention includes an emission unit to emit a charged particle beam, an electron lens to converge the charged particle beam, a blanking deflector, arranged backward of the electron lens with respect to a direction of an optical axis, to deflect the charged particle beam in the case of performing a blanking control of switching between beam-on and beam-off, a blanking aperture member, arranged backward of the blanking deflector with respect to the direction of the optical axis, to block the charged particle beam having been deflected to be in a beam-off state, and a magnet coil, arranged in a center height position of the blanking deflector, to deflect the charged particle beam.

公开(公告)号：US20180342366A1

公开(公告)日：2018-11-29

申请号：US15943745

申请日：2018-04-03

Applicant: NuFlare Technology, Inc.

Inventor： Munehiro OGASAWARA ,  Takanao TOUYA

IPC: H01J37/141 ,  H01J37/24 ,  H01J37/20 ,  H01J37/153

Abstract: A charged particle beam writing method includes forming an aperture image by making a charged particle beam pass through an aperture substrate, changing, in the state where a plurality of crossover positions of the charged particle beam and positions of all of one or more intermediate images of the aperture image are adjusted to matching positions with respect to the aperture image with the first magnification, magnification of the aperture image from the first magnification to the second magnification by using a plurality of lenses while maintaining the last crossover position of the charged particle beam and the position of the last intermediate image of the aperture image to be fixed, and forming, using an objective lens, the aperture image whose magnification has been changed to the second magnification on the surface of the target object, and writing the aperture image.

公开(公告)号：US20160071682A1

公开(公告)日：2016-03-10

申请号：US14943243

申请日：2015-11-17

Applicant: NuFlare Technology, Inc.

Inventor： Takahito NAKAYAMA ,  Takanao TOUYA

IPC: H01J37/04 ,  H01J37/10 ,  H01J37/317

CPC classification number: H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/10 ,  H01J37/3174 ,  H01J2237/30461 ,  H01J2237/31776

Abstract: A charged particle beam writing apparatus according to one aspect of the present invention includes an emission unit to emit a charged particle beam, an electron lens to converge the charged particle beam, a blanking deflector, arranged backward of the electron lens with respect to a direction of an optical axis, to deflect the charged particle beam in the case of performing a blanking control of switching between beam-on and beam-off, a blanking aperture member, arranged backward of the blanking deflector with respect to the direction of the optical axis, to block the charged particle beam having been deflected to be in a beam-off state, and a magnet coil, arranged in a center height position of the blanking deflector, to deflect the charged particle beam.

Abstract translation: 根据本发明的一个方面的带电粒子束写入装置包括发射带电粒子束的发射单元，使带电粒子束会聚的电子透镜，相对于方向布置在电子透镜的后方的消隐偏转器 的光轴，以便在执行在射束和射束之间切换的消隐控制的情况下使带电粒子束偏转;消隐孔径构件，相对于光轴的方向布置在消隐偏转器的后方 以阻挡被偏转成为光束断开状态的带电粒子束，以及布置在消隐偏转器的中心高度位置的磁体线圈，以偏转带电粒子束。

公开(公告)号：US20140175303A1

公开(公告)日：2014-06-26

申请号：US14108936

申请日：2013-12-17

Applicant: NuFlare Technology, Inc.

Inventor： Takanao TOUYA ,  Munehiro OGASAWARA

IPC: H01J37/317

CPC classification number: H01J37/3177 ,  H01J37/141 ,  H01J37/145 ,  H01J37/1474 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/1508

Abstract: A multi charged particle beam writing apparatus includes a stage to mount a target object thereon, an emission unit to emit a charged particle beam, an aperture member, in which a plurality of openings are formed, to form a multibeam by letting a region including a whole of the plurality of openings be irradiated with the charged particle beam and letting portions of the charged particle beam respectively pass through a corresponding opening of the plurality of openings, a plurality of electromagnetic lenses, directions of whose magnetic fields are opposite, and three or more electrostatic lenses, at least one of which is arranged in each of the magnetic fields of a plurality of electromagnetic lenses and one or more of which also serve as deflectors for collectively deflecting the multibeam onto the target object.

Abstract translation: 一种多带电粒子束写入装置，包括：在其上安装目标物体的台，发射带电粒子束的发射单元，其中形成有多个开口的孔径构件，以形成多波束， 整个多个开口被照射带电粒子束并使带电粒子束的部分分别穿过多个开口的对应开口，多个电磁透镜，其磁场相反的方向，以及三个或 更多的静电透镜，其中至少一个布置在多个电磁透镜的每个磁场中，并且其中一个或多个也用作用于将多光束共同偏转到目标物体上的偏转器。

公开(公告)号：US20230055778A1

公开(公告)日：2023-02-23

申请号：US17819048

申请日：2022-08-11

Applicant: NuFlare Technology, Inc.

Inventor： Hirofumi MORITA ,  Takanao TOUYA

IPC: H01J37/317 ,  H01J37/147

Abstract: In one embodiment, a multi charged particle beam writing method includes forming a multi charged particle beam with which a substrate serving as a writing target is irradiated, deflecting the multi charged particle beam to a position with a predetermined deflection offset added so that deflection voltages respectively applied to a plurality of electrodes of an electrostatic positioning deflector does not include a state where all the deflection voltages are zero, and irradiating the substrate with the multi charged particle beam. A positive common voltage is added to the deflection voltages which are applied to the respective electrodes of the electrostatic positioning deflector.

公开(公告)号：US20170345612A1

公开(公告)日：2017-11-30

申请号：US15591767

申请日：2017-05-10

Applicant: NuFlare Technology, Inc.

Inventor： Takanao TOUYA ,  Hiroshi Matsumoto ,  Munehiro Ogasawara ,  Hirofumi Morita

IPC: H01J37/04 ,  H01J37/317

CPC classification number: H01J37/045 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/31774

Abstract: A blanking device for multi charged particle beams includes a first substrate, in which plural first openings are formed in an array, to form multi-beams, a second substrate in which plural second openings are formed in an array, where a corresponding beam of the multi-beams passes through each of the plural second openings, plural control electrodes, which are on the second substrate and each of which is close to a corresponding one of the plural second openings and arranged not to be directly exposed to other second opening adjacent to the corresponding one of the plural second openings, to be switchably applied with first and second potentials, plural counter electrodes, each of which is facing a corresponding one of the plural control electrodes, to be applied with the second potential, and a shield film provided between the first substrate and the plural control electrodes.