公开(公告)号：US20160111246A1

公开(公告)日：2016-04-21

申请号：US14870842

申请日：2015-09-30

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi MATSUMOTO

IPC: H01J37/147 ,  H01J37/317

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J2237/0435

Abstract: A blanking device for multi charged particle beams includes a plurality of individual blanking mechanisms configured to individually deflect a corresponding beam of multi charged particle beams so as to control ON/OFF of the corresponding beam, and a common blanking mechanism configured to include a plurality of electrode groups, each composed of facing electrodes, where an array pitch of a plurality of electrode groups is smaller than or equal to a pitch of the multi charged particle beams, and to collectively deflect the multi charged particle beams in order to control an exposure time.

Abstract translation: 用于多带电粒子束的消隐装置包括多个单独的冲裁机构，其被配置为单独地偏转相应的多带电粒子束束，以便控制对应的光束的ON / OFF;以及公共消隐机构，被配置为包括多个 电极组，每个由面对电极组成，其中多个电极组的阵列间距小于或等于多带电粒子束的间距，并且共同偏转多带电粒子束以便控制曝光时间 。

公开(公告)号：US09287090B2

公开(公告)日：2016-03-15

申请号：US14556503

申请日：2014-12-01

Applicant: NuFlare Technology, Inc.

Inventor： Ryoichi Yoshikawa ,  Hiroshi Matsumoto

IPC: H01J37/317 ,  H01J37/302 ,  H01J37/24 ,  H01J37/147 ,  H01J37/04

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/1471 ,  H01J37/243 ,  H01J37/3023 ,  H01J2237/0437

Abstract: A multi charged particle beam writing apparatus includes a divided shot data generation unit to generate, for each shot of multi beams of charged particle beams, data for plural times of divided shots such that irradiation for one shot of each beam is divided into plural times of divided shots each having a different irradiation time, an individual blanking system to provide blanking control individually for each of multi beams, based on the data for plural times of divided shots, an elastic rate correction value acquisition unit to acquire, for each of plural times of divided shots, an elastic rate correction value for correcting an elastic rate of an image of the whole multi beams, depending upon the number of ON-beams of the multi beams, and a lens to correct, for each divided shot, the elastic rate of the image of the whole multi beams by using the correction value.

Abstract translation: 多带电粒子束写入装置包括：分割镜头数据生成单元，对于多束带电粒子束的每个镜头，生成多次分割镜头的数据，使得每个光束的一次照射被分割成多次 各个具有不同照射时间的分割镜头，单独的消隐系统，用于基于多次分割镜头的数据为每个多光束分别提供消隐控制;弹性率校正值获取单元，用于多次获取 分割镜头的弹性速率校正值，用于根据多光束的ON光束的数量来校正整个多光束的图像的弹性率，以及用于针对每个分割镜头校正弹性率的透镜 的整个多光束的图像。

公开(公告)号：US20160064179A1

公开(公告)日：2016-03-03

申请号：US14838907

申请日：2015-08-28

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi YAMASHITA ,  Ryoichi YOSHIKAWA ,  Kazuhiro CHIBA ,  Hiroshi MATSUMOTO

IPC: H01J37/04

CPC classification number: H01J37/045 ,  H01J37/1471 ,  H01J37/20 ,  H01J37/3026 ,  H01J37/3177 ,  H01J2237/043 ,  H01J2237/0435 ,  H01J2237/20292 ,  H01J2237/30483 ,  H01J2237/3175

Abstract: A blanking device for multi-beams includes arrayed plural separate blanking systems, each performing blanking control switching a corresponding beam of multi charged particle beams between a beam ON state and a beam OFF state and each including a first electrode, a first potential applying mechanism applying two different potentials selectively to the first electrode for the blanking control, and a second electrode performing blanking deflection of the corresponding beam, the second electrode being grounded and paired with the first electrode, and a potential change mechanism changing a potential of the second electrode from a ground potential to another potential, wherein when a potential of the first electrode included in one of the separate blanking systems is fixed to the ground potential, the potential change mechanism changes the potential of the second electrode corresponding to the first electrode fixed to the ground potential, from the ground potential to the another potential.

Abstract translation: 用于多光束的消隐装置包括排列的多个单独的消隐系统，每个消隐控制系统执行消隐控制，以在光束接通状态和光束关闭状态之间切换相应的多带电粒子束束，并且每个包括第一电极，第一电位施加机构 选择性地与用于消隐控制的第一电极相对应的两个不同的电位，以及执行相应光束的消隐偏转的第二电极，第二电极与第一电极接地并配对;以及电位改变机构，改变第二电极的电位 将地电位转换为另一电势，其中当包括在一个分离的消隐系统中的第一电极的电位固定到接地电位时，电位改变机构改变对应于固定到地面的第一电极的第二电极的电位 潜力，从地面潜力到另一个潜力 。

公开(公告)号：US20160042908A1

公开(公告)日：2016-02-11

申请号：US14885726

申请日：2015-10-16

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi MATSUMOTO ,  Tomohiro IIJIMA ,  Munehiro OGASAWARA ,  Hideo INOUE ,  Ryoichi YOSHIKAWA

IPC: H01J37/04

CPC classification number: H01J37/045 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0432 ,  H01J2237/0435 ,  H01J2237/31771 ,  H01J2237/31774

Abstract: A multi charged particle beam writing method includes performing ON/OFF switching of a beam by an individual blanking system for the beam concerned, for each beam in multi-beams of charged particle beam, with respect to each time irradiation of irradiation of a plurality of times, by using a plurality of individual blanking systems that respectively perform beam ON/OFF control of a corresponding beam in the multi-beams, and performing blanking control, in addition to the performing ON/OFF switching of the beam for the each beam by the individual blanking system, with respect to the each time irradiation of the irradiation of the plurality of times, so that the beam is in an ON state during an irradiation time corresponding to irradiation concerned, by using a common blanking system that collectively performs beam ON/OFF control for a whole of the multi-beams.

Abstract translation: 多带电粒子束写入方法包括：对于多束带电粒子束中的每个束，针对相关束的单个消隐系统，对于多个照射束的每次照射，执行光束的ON / OFF切换 次，通过使用多个单独的消隐系统，分别执行多光束中相应光束的光束ON / OFF控制，以及执行消隐控制，除了通过对每个光束的光束进行ON / OFF切换 单个消隐系统相对于每次照射多次照射，使得在对应于照射的照射时间期间光束处于ON状态，通过使用共同执行光束ON的公共消隐系统 / OFF控制整个多光束。

公开(公告)号：US20160013019A1

公开(公告)日：2016-01-14

申请号：US14795535

申请日：2015-07-09

Applicant: IMS Nanofabrication AG

Inventor： Elmar Platzgummer

IPC: H01J37/317 ,  H01J37/04

CPC classification number: H01J37/3177 ,  G06F17/5072 ,  G06F17/5081 ,  H01J37/045 ,  H01J37/09 ,  H01J37/3026 ,  H01J37/3175 ,  H01J2237/043 ,  H01J2237/3175 ,  H01J2237/31764

Abstract: An exposure pattern is computed for exposing a desired pattern on a target in a charged-particle multi-beam processing apparatus to match a reference writing tool, and/or for compensating a deviation of the imaging from a pattern definition device onto the target from a desired value of critical dimension along at least one direction in the image area on the target: The desired pattern is provided as a graphical representation suitable for the reference tool, on the image area on the target. A convolution kernel is used which describes a mapping from an element of the graphical representation to a group of pixels which is centered around a nominal position of said element. A nominal exposure pattern is calculated by convolution of the graphical representation with the convolution kernel, said nominal exposure pattern being suitable to create a nominal dose distribution on the target when exposed with the processing apparatus.

Abstract translation: 计算曝光图案以在带电粒子多光束处理装置中的目标上曝光期望图案以匹配参考写入工具，和/或用于从图案定义装置将图像偏离从图案定义装置补偿到目标上 在目标图像区域中至少沿一个方向的临界尺寸的期望值：所需图案作为适合参考工具的图形表示，在目标上的图像区域上提供。 使用卷积核，其描述从图形表示的元素到以所述元素的标称位置为中心的一组像素的映射。 通过图形表示与卷积核的卷积来计算标称曝光图案，所述标称曝光图案适于在用处理装置曝光时在目标上产生标称剂量分布。

公开(公告)号：US09214344B1

公开(公告)日：2015-12-15

申请号：US14296960

申请日：2014-06-05

Applicant: KLA-Tencor Corporation

Inventor： Alan D. Brodie ,  Yehiel Gotkis ,  Allen Carroll ,  Leonid Baranov

IPC: H01L21/20

CPC classification number: H01L21/20 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/3177 ,  H01J2237/0437 ,  H01J2237/1205 ,  Y10T156/10

Abstract: One embodiment relates to a pillar-supported array of micro electron lenses. The micro-lens array includes a base layer on a substrate, the base layer including an array of base electrode pads and an insulating border surrounding the base electrode pads so as to electrically isolate the base electrode pads from each other. The micro-lens array further includes an array of lens holes aligned with the array of base electrode pads and one or more stacked electrode layers having openings aligned with the array of lens holes. The micro-lens array further includes one or more layers of insulating pillars, each layer of insulating pillars supporting a stacked electrode layer. Another embodiment relates to a method of fabricating a pillar-supported array of micro electron lenses. Other embodiments, aspects and features are also disclosed.

Abstract translation: 一个实施例涉及一种立柱支撑的微电子透镜阵列。 微透镜阵列包括在基板上的基底层，基底层包括基极电极焊盘的阵列和围绕基极电极焊盘的绝缘边界，以将基极电极彼此电隔离。 微透镜阵列还包括与基极阵列阵列对准的透镜孔阵列和一个或多个具有与透镜孔阵列对准的开口的堆叠电极层。 微透镜阵列还包括一层或多层绝缘柱，每层绝缘柱支撑堆叠的电极层。 另一实施例涉及一种制造支柱支撑的微电子透镜阵列的方法。 还公开了其它实施例，方面和特征。

公开(公告)号：US09202673B2

公开(公告)日：2015-12-01

申请号：US14066940

申请日：2013-10-30

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi Matsumoto ,  Tomohiro Iijima ,  Munehiro Ogasawara ,  Hideo Inoue ,  Ryoichi Yoshikawa

IPC: H01J37/30 ,  H01J37/317 ,  H01J37/04

CPC classification number: H01J37/045 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0432 ,  H01J2237/0435 ,  H01J2237/31771 ,  H01J2237/31774

Abstract: A multi charged particle beam writing method includes performing ON/OFF switching of a beam by an individual blanking system for the beam concerned, for each beam in multi-beams of charged particle beam, with respect to each time irradiation of irradiation of a plurality of times, by using a plurality of individual blanking systems that respectively perform beam ON/OFF control of a corresponding beam in the multi-beams, and performing blanking control, in addition to the performing ON/OFF switching of the beam for the each beam by the individual blanking system, with respect to the each time irradiation of the irradiation of the plurality of times, so that the beam is in an ON state during an irradiation time corresponding to irradiation concerned, by using a common blanking system that collectively performs beam ON/OFF control for a whole of the multi-beams.

Abstract translation: 多带电粒子束写入方法包括：对于多束带电粒子束中的每个束，针对相关束的单个消隐系统，对于多个照射束的每次照射，执行光束的ON / OFF切换 次，通过使用多个单独的消隐系统，分别执行多光束中相应光束的光束ON / OFF控制，以及执行消隐控制，除了通过对每个光束的光束进行ON / OFF切换 单个消隐系统相对于每次照射多次照射，使得在对应于照射的照射时间期间光束处于ON状态，通过使用共同执行光束ON的公共消隐系统 / OFF控制整个多光束。

公开(公告)号：US20150325407A1

公开(公告)日：2015-11-12

申请号：US14709200

申请日：2015-05-11

Applicant: NUFLARE TECHNOLOGY, INC.

Inventor： Hironori MIZOGUCHI ,  Hideo INOUE

IPC: H01J37/244 ,  H01J37/317

CPC classification number: H01J37/244 ,  H01J37/045 ,  H01J37/3174 ,  H01J2237/24514 ,  H01J2237/24535 ,  H01J2237/31776

Abstract: A charged particle beam writing apparatus includes a first limiting aperture member, in which a first opening is formed, to block a charged particle beam having been blanking-controlled to be beam “off”, and to let a part of the charged particle beam having been blanking-controlled to be beam “on” pass through the first opening, a first detector to detect a first electron amount irradiating the first limiting aperture member, in a state were beam “on” and beam “off” are repeated, a first integration processing unit to generate a first integrated signal by integrating components in a band sufficiently lower than a band of a repetition cycle of beam “on” and beam “off”, in a first detected signal detected for obtaining the first electron amount, and a first irregularity detection unit to detect irregularity in a dose amount of the charged particle beam by using the first integrated signal.

Abstract translation: 一种带电粒子束写入装置包括：第一限制孔径构件，其中形成有第一开口，以阻挡被消隐控制的带电粒子束以使其“离开”，并且使带电粒子束的一部分具有 被消隐控制为通过第一开口的光束“开”，用于检测在第一限制光圈部件中照射第一限制光圈部件的第一检测器处于反光的状态，并且反射光束“关”，第一检测器 积分处理单元，用于通过在被检测以获得第一电子量的第一检测信号中积分足够低于波束“开”的重复周期的波段和波束“截止”的波段的分量的分量来产生第一积分信号，以及 第一不规则检测单元，通过使用第一积分信号来检测带电粒子束的剂量的不均匀性。

公开(公告)号：US20150318139A1

公开(公告)日：2015-11-05

申请号：US14700237

申请日：2015-04-30

Applicant: CANON KABUSHIKI KAISHA

Inventor： Mitsuaki Amemiya

IPC: H01J37/04 ,  H01J37/147 ,  H01J37/20

CPC classification number: H01J37/3174 ,  H01J37/045 ,  H01J37/1474 ,  H01J37/20 ,  H01J37/3045 ,  H01J2237/043 ,  H01J2237/063 ,  H01J2237/15 ,  H01J2237/303 ,  H01J2237/30444

Abstract: Provided is a target device for scattering a charged particle incident thereon, the device comprising: a base; a reference mark provided on the base and having a range of the charged particle therein smaller than a range of the charged particle in the base; and a shield provided on the base apart from the reference mark and having a range of the charged particle therein smaller than the range of the charged particle in the base.

Abstract translation: 提供了用于散射入射到其上的带电粒子的目标装置，该装置包括：基座; 在基底上设置的参考标记，其中带电粒子的范围小于基底中的带电粒子的范围; 以及设置在所述基座上的与所述参考标记分开的屏蔽件，并且其带电粒子的范围小于所述基座中带电粒子的范围。

公开(公告)号：US09048060B2

公开(公告)日：2015-06-02

申请号：US14056710

申请日：2013-10-17

Applicant: FEI Company

Inventor： Erik René Kieft ,  Fredericus Bernardus Kiewiet ,  Adam Christopher Lassise ,  Otger Jan Luiten ,  Petrus Henricus Antonius Mutsaers ,  Edgar Jan Dirk Vredenbregt ,  Alexander Henstra

IPC: H01J37/26 ,  H01J37/04 ,  H01J37/28

CPC classification number: H01J37/045 ,  H01J37/28 ,  H01J2237/0432

Abstract: The invention relates to a charged-particle microscope comprising a charged-particle source; a sample holder; a charged-particle lens system; a detector; and a beam pulsing device, for causing the beam to repeatedly switch on and off so as to produce a pulsed beam. The beam pulsing device comprises a unitary resonant cavity disposed about a particle-optical axis and has an entrance aperture and an exit aperture for the beam. The resonant cavity is configured to simultaneously produce a first oscillatory deflection of the beam at a first frequency in a first direction and a second oscillatory deflection of the beam at a second, different frequency in a second, different direction. The resonant cavity may have an elongated (e.g. rectangular or elliptical) cross-section, with a long axis parallel to said first direction and a short axis parallel to said second direction.

Abstract translation: 本发明涉及包含带电粒子源的带电粒子显微镜; 样品架 带电粒子透镜系统; 检测器 以及光束脉冲装置，用于使光束重复打开和关闭以产生脉冲光束。 束脉冲装置包括围绕粒子 - 光轴设置的整体谐振腔，并具有用于束的入射孔和出射孔。 谐振腔被配置成同时在第一方向上以第一频率和第二不同频率处的第二不同方向上产生第一振荡偏转波束的第二振荡偏转。 谐振腔可以具有细长（例如矩形或椭圆形）横截面，其中长轴平行于所述第一方向和短轴平行于所述第二方向。