公开(公告)号：US09111657B2

公开(公告)日：2015-08-18

申请号：US14477769

申请日：2014-09-04

Applicant: Mapper Lithography IP B.V.

Inventor： Sohail Chatoor ,  Joost Witteveen ,  Alon Rosenthal ,  Johan Joost Koning

IPC: G21K1/08 ,  H01J37/147 ,  G21K1/093 ,  G21K1/087 ,  H01J37/317 ,  H01F7/06

CPC classification number: G21K1/093 ,  G21K1/087 ,  H01F2007/068 ,  H01J37/1475 ,  H01J37/3177 ,  H01J2237/1526 ,  H01J2237/31774

Abstract: The invention relates to a charged particle optical device for manipulating a trajectory of multiple beamlets of charged particles. Said charged particle optical device comprising an electromagnetic deflector comprising a planar substrate having an upper side and a lower side of said substrate, and an even thickness. The substrate comprises: a through opening for passing said beamlets there through, wherein said through opening debouches in the upper and lower side of said substrate; a first and a second coil, wherein each of said coils preferably is a substantially helical coil and comprises conducting upper leads arranged at the upper side, conducting lower leads arranged at the lower side, and vias extending through said substrate and which conductively connect one of said upper leads with one of said lower leads for forming said coil; wherein said first and second coils are arranged on either side of the through opening.

Abstract translation: 本发明涉及一种用于操纵带电粒子的多个子束的轨迹的带电粒子光学装置。 所述带电粒子光学器件包括电磁偏转器，该电磁偏转器包括具有所述基底的上侧和下侧的平面基底和均匀的厚度。 基板包括：用于使所述子束通过的通孔，其中所述通孔在所述基板的上侧和下侧消失; 第一和第二线圈，其中每个所述线圈优选地是基本上螺旋形的线圈，并且包括导通布置在上侧的上引线，导电布置在下侧的下引线和穿过所述基板的通孔，并且导电地连接 所述上引线与所述下导线之一形成所述线圈; 其中所述第一和第二线圈布置在所述通孔的任一侧上。

公开(公告)号：US20150179398A1

公开(公告)日：2015-06-25

申请号：US14581728

申请日：2014-12-23

Applicant: Mapper Lithography IP B.V.

Inventor： Paul IJmert Scheffers ,  Jan Andries Meijer ,  Carel Ferdinand Daudey

IPC: H01J37/22 ,  H01J37/20

CPC classification number: H01J37/22 ,  H01J37/20 ,  H01J37/244 ,  H01J37/3177 ,  H01J2237/10 ,  H01J2237/202 ,  H01J2237/2443 ,  H01J2237/24507

Abstract: The invention relates to a charged particle lithography system for transferring a pattern onto a target, said system comprising:a target positioning device comprising a target holder having a first side for holding the target,a charged particle optical unit for generating a charged particle beam, modulating said charged particle beam, and directing said charged particle beam towards the first side of the target holder, anda sensor assembly comprising a converter element for converting charged particles which impinge on said converter element into light, wherein the converter element is arranged on said target positioning device, a light sensor for detecting the light, wherein the light sensor is arranged at a distance from said target positioning device, and a light optical lens which is arranged between the converter element and the light sensor for directing light originating from said converter element to said sensor.

Abstract translation: 本发明涉及一种用于将图案转印到目标上的带电粒子光刻系统，所述系统包括：目标定位装置，包括具有用于保持靶的第一侧的靶保持器，用于产生带电粒子束的带电粒子光学单元， 调制所述带电粒子束，并将所述带电粒子束引向所述目标保持器的第一侧;以及传感器组件，其包括用于将撞击在所述转换器元件上的带电粒子转换成光的转换器元件，其中所述转换器元件布置在所述 目标定位装置，用于检测光的光传感器，其中所述光传感器布置在距所述目标定位装置一定距离处;以及光学透镜，布置在所述转换器元件和所述光传感器之间，用于引导源自所述转换器的光 元件到所述传感器。

公开(公告)号：US20150177625A1

公开(公告)日：2015-06-25

申请号：US14630678

申请日：2015-02-25

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Guido DE BOER ,  Niels VERGEER

IPC: G03F7/20

CPC classification number: G03F9/7076 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/7046 ,  G03F9/7084 ,  H01J37/3045 ,  H01J37/3174

Abstract: The invention relates to a substrate comprising an optical position mark for being read-out by an optical recording head for emitting light of predetermined wavelength, preferably red or infra-red light, more in particular of 635 nm light, the optical position mark having a mark height, a mark length and a predetermined known position on the substrate, the optical position mark extending along a longitudinal direction and being arranged for varying a reflection coefficient of the position mark along said longitudinal direction, wherein the optical position mark comprises: a first region having a first reflection coefficient and a first width; a second region neighboring the first region and forming a first region pair, the second region having a second reflection coefficient and a second width, and the second reflection coefficient being different from the first reflection coefficient, wherein the first region comprises sub-wavelength structures in comparison with a wavelength of the predetermined wavelength light.

Abstract translation: 本发明涉及一种包括光学位置标记的基板，该光学位置标记由用于发射预定波长的光的光学位置标记读出，优选为红色或红外光，特别是635nm的光，光学位置标记具有 标记高度，标记长度和预定的已知位置，所述光学位置标记沿着纵向方向延伸并且被布置成用于改变位置标记沿着所述纵向方向的反射系数，其中所述光学位置标记包括：第一 区域具有第一反射系数和第一宽度; 与所述第一区域相邻并形成第一区域对的第二区域，所述第二区域具有第二反射系数和第二宽度，并且所述第二反射系数与所述第一反射系数不同，其中所述第一区域包括： 与预定波长的光的波长进行比较。

公开(公告)号：USRE45552E1

公开(公告)日：2015-06-09

申请号：US13689665

申请日：2012-11-29

Applicant: Mapper Lithography IP B.V.

Inventor： Pieter Kruit ,  Remco Jager ,  Stijn Willem Herman Karel Steenbrink ,  Marco Jan-Jaco Wieland

IPC: G21K5/04 ,  H01J37/317

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70291 ,  G03F7/70383 ,  G03F7/70508 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/31764 ,  H01J2237/31766 ,  H01J2237/31771 ,  H01L21/67282

Abstract: The present invention relates a probe forming lithography system for generating a pattern on to a target surface such as a wafer, using a black and white writing strategy, i.e. writing or not writing a grid cell, thereby dividing said pattern over a grid comprising grid cells, said pattern comprising features of a size larger than that of a grid cell, in each of which cells said probe is switched “on” or “off, wherein a probe on said target covers a significantly larger surface area than a grid cell, and wherein within a feature a position dependent distribution of black and white writings is effected within the range of the probe size as well as to a method upon which such system may be based.

Abstract translation: 本发明涉及一种探针形成光刻系统，用于使用黑白写入策略（即写入或不写入网格单元）在诸如晶片的目标表面上产生图案，从而将所述图案划分在包括网格单元的格子上 所述图案包括尺寸大于网格单元的尺寸的特征，在每个单元中，所述探针被切换为“开”或“关”，其中所述目标上的探针覆盖比网格单元大得多的表面积，以及 其中在特征内，在探针大小的范围以及这种系统可以基于的方法上实现黑白写入的位置相关分布。

公开(公告)号：US20150136995A1

公开(公告)日：2015-05-21

申请号：US14541233

申请日：2014-11-14

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Marco Jan-Jaco WIELAND ,  Willem Henk URBANUS

IPC: G21K1/02 ,  G21K5/04 ,  H01J37/30

CPC classification number: G21K1/02 ,  G21K5/04 ,  H01J37/026 ,  H01J37/065 ,  H01J37/12 ,  H01J37/16 ,  H01J37/24 ,  H01J37/3002 ,  H01J37/3007 ,  H01J37/3174 ,  H01J37/3175 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/0216 ,  H01J2237/024 ,  H01J2237/032 ,  H01J2237/04 ,  H01J2237/1215 ,  H01J2237/16 ,  H01J2237/1825 ,  H01J2237/303 ,  H01J2237/30472

Abstract: The invention relates to a collimator electrode stack (70), comprising: at least three collimator electrodes (71-80) for collimating a charged particle beam along an optical axis (A), wherein each collimator electrode comprises an electrode body with an electrode aperture for allowing passage to the charged particle beam, wherein the electrode bodies are spaced along an axial direction (Z) which is substantially parallel with the optical axis, and wherein the electrode apertures are coaxially aligned along the optical axis; and a plurality of spacing structures (89) provided between each pair of adjacent collimator electrodes and made of an electrically insulating material, for positioning the collimator electrodes at predetermined distances along the axial direction. Each of the collimator electrodes (71-80) is electrically connected to a separate voltage output (151-160).The invention further relates to a method of operating a charged particle beam generator.

Abstract translation: 本发明涉及一种准直电极堆叠（70），包括：用于沿着光轴（A）准直带电粒子束的至少三个准直器电极（71-80），其中每个准直器电极包括具有电极孔 允许通过所述带电粒子束，其中所述电极体沿着与所述光轴基本平行的轴向方向（Z）间隔开，并且其中所述电极孔沿着所述光轴同轴对准; 以及设置在每对相邻的准直器电极之间并由电绝缘材料制成的多个间隔结构（89），用于沿着轴向将准直器电极定位在预定距离。 每个准直器电极（71-80）电连接到单独的电压输出（151-160）。 本发明还涉及一种操作带电粒子束发生器的方法。

公开(公告)号：US20150124229A1

公开(公告)日：2015-05-07

申请号：US14400569

申请日：2013-05-14

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Alexander Hendrik Vincent Van Veen ,  Willem Henk Urbanus

IPC: H01J37/317

CPC classification number: H01J37/09 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/147 ,  H01J37/3007 ,  H01J37/302 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/026 ,  H01J2237/0262 ,  H01J2237/0264 ,  H01J2237/16 ,  H01J2237/182 ,  H01J2237/188

Abstract: The invention relates to a charged particle lithography system for exposing a target. The system includes a charged particle beam generator for generating a charged particle beam; an aperture array (6) for forming a plurality of beamlets from the charged particle beam; and a beamlet projector (12) for projecting the beamlets onto a surface of the target. The charged particle beam generator includes a charged particle source (3) for generating a diverging charged particle beam; a collimator system (5a,5b,5c,5d; 72;300) for refracting the diverging charged particle beam; and a cooling arrangement (203) for removing heat from the collimator system, the cooling arrangement comprising a body surrounding at least a portion of the collimator system.

Abstract translation: 本发明涉及用于曝光目标物的带电粒子光刻系统。 该系统包括用于产生带电粒子束的带电粒子束发生器; 用于从带电粒子束形成多个子束的孔径阵列（6） 以及用于将子束投影到目标表面上的小射束投影仪（12）。 带电粒子束发生器包括用于产生发散带电粒子束的带电粒子源（3） 用于折射发散带电粒子束的准直器系统（5a，5b，5c，5d; 72; 300） 以及用于从准直器系统去除热的冷却装置（203），所述冷却装置包括围绕准直器系统的至少一部分的主体。

公开(公告)号：US20150109601A1

公开(公告)日：2015-04-23

申请号：US14383569

申请日：2013-03-08

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Paul IJmert Scheffers ,  Jan Andries Meijer ,  Erwin Slot ,  Vincent Sylvester Kuiper ,  Niels Vergeer

IPC: G03F7/20

CPC classification number: G03F7/707 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3045 ,  H01J37/3177 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/3045

Abstract: A multi-beamlet charged particle beamlet lithography system for transferring a pattern to a surface of a substrate. The system comprises a projection system (311) for projecting a plurality of charged particle beamlets (7) onto the surface of the substrate; a chuck (313) moveable with respect to the projection system; a beamlet measurement sensor (i.a. 505, 511) for determining one or more characteristics of one or more of the charged particle beamlets, the beamlet measurement sensor having a surface (501) for receiving one or more of the charged particle beamlets; and a position mark measurement system for measuring a position of a position mark (610, 620, 635), the position mark measurement system comprising an alignment sensor (361, 362). The chuck comprises a substrate support portion for supporting the substrate, a beamlet measurement sensor portion (460) for accommodating the surface of the beamlet measurement sensor, and a position mark portion (470) for accommodating the position mark.

Abstract translation: 一种用于将图案转印到基板表面的多子束带电粒子光束光刻系统。 该系统包括用于将多个带电粒子子束（7）投影到衬底的表面上的投影系统（311） 相对于投影系统可移动的卡盘（313）; 用于确定一个或多个带电粒子子束的一个或多个特征的小波束测量传感器（即505,511），所述小束测量传感器具有用于接收一个或多个带电粒子子束的表面（501） 以及用于测量位置标记（610,620,635）的位置的位置标记测量系统，所述位置标记测量系统包括对准传感器（361,362）。 卡盘包括用于支撑基板的基板支撑部分，用于容纳小梁测量传感器的表面的小梁测量传感器部分（460）和用于容纳位置标记的位置标记部分（470）。

公开(公告)号：US08841920B2

公开(公告)日：2014-09-23

申请号：US14064255

申请日：2013-10-28

Applicant: Mapper Lithography IP B.V.

Inventor： Guido De Boer ,  Johnny Joannes Jacobus Van Baar ,  Kaustubh Prabodh Padhye ,  Robert Mossel ,  Niels Vergeer ,  Stijn Willem Herman Karel Steenbrink

IPC: G01R27/26 ,  G01D5/241 ,  G01D3/036 ,  G01B7/02 ,  G03F9/00

CPC classification number: G01B7/023 ,  G01D3/036 ,  G01D5/2417 ,  G03F9/7026 ,  G03F9/7053

Abstract: The invention relates to a lithography system. The lithography system has a projection lens system and a capacitive sensing system. The projection lens system is provided with a final projection lens. The capacitive sensing system is arranged for making a measurement related to a distance between the final projection lens and a target. The capacitive sensing system includes at least one capacitive sensor. Additional, the capacitive sensing system is provided with a flexible printed circuit structure and at least one integrated flex print connector. The at least one sensor is located in the flexible printed circuit structure. The flexible printed circuit structure has a flexible base provided with conductive electrodes for the at least one sensor and conductive tracks. The conductive tracks extend from the electrodes along the at least one integrated flex print connector.

Abstract translation: 本发明涉及一种光刻系统。 光刻系统具有投影透镜系统和电容感测系统。 投影透镜系统设置有最终投影透镜。 电容感测系统被布置用于进行与最终投影透镜和目标之间的距离相关的测量。 电容感测系统包括至少一个电容式传感器。 此外，电容感测系统设置有柔性印刷电路结构和至少一个集成的柔性印刷连接器。 至少一个传感器位于柔性印刷电路结构中。 柔性印刷电路结构具有柔性基底，该基底设置有用于至少一个传感器和导电轨道的导电电极。 导电轨迹沿着至少一个集成的柔性印刷连接器从电极延伸。

公开(公告)号：US20140264086A1

公开(公告)日：2014-09-18

申请号：US14287234

申请日：2014-05-27

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Teunis VAN DE PEUT ,  Marco Jan-Jaco WIELAND

IPC: H01J37/04 ,  H01J37/317

CPC classification number: H01J37/3026 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70475 ,  G06T1/20 ,  G06T1/60 ,  H01J37/045 ,  H01J37/3002 ,  H01J37/3174 ,  H01J37/3175 ,  H01J37/3177 ,  H01J2237/3175 ,  H01J2237/31761 ,  H01J2237/31764 ,  H04N1/405

Abstract: A charged particle lithography system for exposing a wafer according to pattern data. The system comprises an electron optical column for generating a plurality of electron beamlets for exposing the wafer, the electron optical column including a beamlet blanker array for switching the beamlets on or off, a data path for transmitting beamlet control data for control of the switching of the beamlets, and a wafer positioning system for moving the wafer under the electron optical column in a scan direction. The wafer positioning system is provided with synchronization signals from the data path to align the wafer with the electron beams from the electron-optical column. The data path further comprises one or more processing units for generating the beamlet control data and one or more transmission channels for transmitting the beamlet control data to the beamlet blanker array.

Abstract translation: 一种用于根据图案数据曝光晶片的带电粒子光刻系统。 该系统包括用于产生用于暴露晶片的多个电子子束的电子光学柱，该电子光学柱包括用于开启或关闭子束的子束遮蔽器阵列，用于发射用于控制切换的子束控制数据的数据路径 子束，以及用于在扫描方向上移动电子光学柱下的晶片的晶片定位系统。 晶圆定位系统具有来自数据通路的同步信号，以将晶片与来自电子 - 光学柱的电子束对准。 数据路径还包括用于产生子束控制数据的一个或多个处理单元和用于将子束控制数据发送到子束消隐器阵列的一个或多个传输信道。

公开(公告)号：US20140252953A1

公开(公告)日：2014-09-11

申请号：US14348071

申请日：2012-09-28

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Marc Smits ,  Chris Franciscus Jessica Lodewijk

IPC: H01J37/32

CPC classification number: H01J37/32082 ,  H01J37/3002 ,  H01J37/32862 ,  H05H1/30 ,  H05H1/46 ,  H05H2001/4667 ,  H05H2001/4675 ,  H05H2001/4682

Abstract: An arrangement for generating plasma, the arrangement comprising a primary plasma source (1) arranged for generating plasma, a hollow guiding body (11) arranged for guiding at least a portion of the plasma generated by the primary plasma source to a secondary plasma source (25), and an outlet (14) for emitting at least a portion of the atomic radicals produced by the plasma from the arrangement.

Abstract translation: 一种用于产生等离子体的装置，该装置包括布置成产生等离子体的初级等离子体源（1），中空引导体（11），其布置成将由初级等离子体源产生的等离子体的至少一部分引导到次级等离子体源 25）和用于从该装置发射由等离子​​体产生的至少一部分原子自由基的出口（14）。