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公开(公告)号：US10971343B2
公开(公告)日：2021-04-06
申请号：US16262024
申请日：2019-01-30
Applicant: Samsung Electronics Co., Ltd.
Inventor： Protopopov Vladimir , Ki Ho Hwang , Doug Yong Sung , Se Jin Oh , Kul Inn , Sung Ho Jang , Yun Kwang Jeon
Abstract: An apparatus for monitoring an interior of a process chamber including a process chamber including a chamber body and a view port defined in the chamber body, a cover section including a pinhole in one end, the cover section disposed to correspond to an end portion of the view port, the cover section having a first length in a direction toward a center point of the process chamber, and a sensing unit inserted into the view port to monitor the interior of the process chamber through the pinhole, a region in the process chamber to be sensed by the sensing unit determined based on the first length may be provided.
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公开(公告)号：US20210092825A1
公开(公告)日：2021-03-25
申请号：US16861595
申请日：2020-04-29
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： In Ho CHOI , Min Seok Choi , Jeong-Gil Kim , Hyuck Shin , In Jae Lee , Sung Ho Jang
IPC: H05G2/00
Abstract: An extreme ultraviolet generation apparatus is provided. The extreme ultraviolet generation apparatus includes a chamber, a droplet generator configured to provide a droplet into the chamber, a shroud which extends along a movement path of the droplet inside the chamber and surrounds the movement path of the droplet, a charging unit configured to charge the droplet, a monitoring unit configured to measure a position of the charged droplet, an alignment unit including at least one electromagnet, the alignment unit configured to correct the position of the charged droplet within the shroud using the at least one electromagnet, and an acceleration unit configured to accelerate the charged droplet after the position of the charged droplet has been corrected.
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公开(公告)号：US10551326B2
公开(公告)日：2020-02-04
申请号：US15855520
申请日：2017-12-27
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Hyo Hyeong Kang , Kang Woong Ko , Sung Yoon Ryu , Gil Woo Song , Jae Hyung Ahn , Chul Hyung Yoo , Kyoung Hwan Lee , Sung Ho Jang , Yong Ju Jeon , Hyoung Jo Jeon
Abstract: A method for measuring a semiconductor device is provided. A method for measuring a semiconductor device includes defining an interest area and an acceptable area in a chip area on a wafer; performing a first measurement of the chip area with a spectral imaging device to acquire spectrum data of the chip area; assuming the distribution of the spectrum data of a first pixel in the acceptable area is a normal distribution; calculating a distance from a central point on the normal distribution to second pixels in the interest area; selecting a position of a second pixel having a distance from the central point on the normal distribution greater than a predetermined range, among the second pixels, as a candidate position; and performing a second measurement of the candidate position.
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公开(公告)号：US10249485B2
公开(公告)日：2019-04-02
申请号：US15727198
申请日：2017-10-06
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Vladimir Volynets , Protopopov Vladimir , Young Do Kim , Yuri Barsukov , Sang Heon Lee , Sung Ho Jang
IPC: G01J3/30 , H01J49/40 , C23C16/455 , G01J3/443 , H01J37/32 , H01J49/00 , H01J49/10 , H01J49/12 , H01L21/02 , H01L29/786 , G01J3/28
Abstract: A pulsed plasma analyzer includes a pulse modulator that controls an off-time of a pulsed plasma that includes a target radical, an optical spectrometer that measures optical emissions of the pulsed plasma after the off-time to determine optical emission data, and a concentration estimating module that estimates a concentration of the target radical during the off-time based on an initial optical emission value of the optical emission data that changes as a function of the off-time, and outputs an estimated concentration.
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Patent Agency Ranking
公开(公告)号：US12215974B2
公开(公告)日：2025-02-04
申请号：US17969200
申请日：2022-10-19
Applicant: Samsung Electronics Co., Ltd.
Inventor： Seung Woo Lee , Wook Rae Kim , Kwang Soo Kim , Myung Jun Lee , Seo Yeon Jeong , Sung Ho Jang
IPC: G01B9/02055 , G01B9/02 , G01B9/02001 , G01B9/02015 , H01L21/66
Abstract: A optical measurement apparatus includes: an optical system which generates a pupil image of a measurement target, using light; a polarization generator which generates a polarized light from the light; a self-interference generator which generates a plurality of beams divided from the pupil image, using the polarized light, and causes the plurality of beams to interfere with each other to generate a self-interference image; and an image analysis unit configured to extract phase data from the self-interference image, and to move the measurement target to a focus position on the basis of the phase data.
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6.发明授权公开(公告)号：US12105027B2
公开(公告)日：2024-10-01
申请号：US17684052
申请日：2022-03-01
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Jang Ryul Park , Soon Yang Kwon , Kwang Rak Kim , Myung Jun Lee , Sung Ho Jang
CPC classification number: G01N21/9501 , G02B7/005 , G01N2021/8845 , G02B2003/0093
Abstract: A method for fabricating a semiconductor device is provided. The method includes: loading a substrate on a stage of an apparatus for inspecting the substrate; extracting a first light having a first wavelength from a light by using a light source; acquiring first position information on at least one focal point, formed on the substrate, based on the first wavelength by using a controller, the at least one focal point being a pre-calculated at least one focal point; adjusting a position of at least one from among an objective lens and at least one microsphere in a vertical direction by using the first position information in the controller; condensing the first light, which has passed through the at least one microsphere, on the at least one focal point formed on the substrate; and inspecting the substrate by using the first light condensed on the at least one focal point.
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公开(公告)号：US11109474B2
公开(公告)日：2021-08-31
申请号：US16861595
申请日：2020-04-29
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： In Ho Choi , Min Seok Choi , Jeong-Gil Kim , Hyuck Shin , In Jae Lee , Sung Ho Jang
IPC: H05G2/00
Abstract: An extreme ultraviolet generation apparatus is provided. The extreme ultraviolet generation apparatus includes a chamber, a droplet generator configured to provide a droplet into the chamber, a shroud which extends along a movement path of the droplet inside the chamber and surrounds the movement path of the droplet, a charging unit configured to charge the droplet, a monitoring unit configured to measure a position of the charged droplet, an alignment unit including at least one electromagnet, the alignment unit configured to correct the position of the charged droplet within the shroud using the at least one electromagnet, and an acceleration unit configured to accelerate the charged droplet after the position of the charged droplet has been corrected.
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公开(公告)号：US10229818B2
公开(公告)日：2019-03-12
申请号：US15260910
申请日：2016-09-09
Applicant: Samsung Electronics Co., Ltd.
Inventor： Protopopov Vladimir , Ki Ho Hwang , Doug Yong Sung , Se Jin Oh , Kul Inn , Sung Ho Jang , Yun Kwang Jeon
Abstract: An apparatus for monitoring an interior of a process chamber including a process chamber including a chamber body and a view port defined in the chamber body, a cover section including a pinhole in one end, the cover section disposed to correspond to an end portion of the view port, the cover section having a first length in a direction toward a center point of the process chamber, and a sensing unit inserted into the view port to monitor the interior of the process chamber through the pinhole, a region in the process chamber to be sensed by the sensing unit determined based on the first length may be provided.
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公开(公告)号：US20180130651A1
公开(公告)日：2018-05-10
申请号：US15727198
申请日：2017-10-06
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： VLADIMIR VOLYNETS , Protopopov Vladimir , Young Do Kim , Yuri Barsukov , Sang Heon Lee , Sung Ho Jang
IPC: H01J49/40 , G01J3/443 , H01J49/10 , H01J49/00 , H01J49/12 , H01L21/02 , C23C16/455 , H01J37/32 , H01L29/786
CPC classification number: H01J49/40 , C23C16/45502 , G01J3/2889 , G01J3/443 , H01J37/32963 , H01J49/0031 , H01J49/10 , H01J49/12 , H01J2237/327 , H01L21/02274 , H01L29/78696
Abstract: A pulsed plasma analyzer includes a pulse modulator that controls an off-time of a pulsed plasma that includes a target radical, an optical spectrometer that measures optical emissions of the pulsed plasma after the off-time to determine optical emission data, and a concentration estimating module that estimates a concentration of the target radical during the off-time based on an initial optical emission value of the optical emission data that changes as a function of the off-time, and outputs an estimated concentration.
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