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公开(公告)号：US10971343B2
公开(公告)日：2021-04-06
申请号：US16262024
申请日：2019-01-30
Applicant: Samsung Electronics Co., Ltd.
Inventor： Protopopov Vladimir , Ki Ho Hwang , Doug Yong Sung , Se Jin Oh , Kul Inn , Sung Ho Jang , Yun Kwang Jeon
Abstract: An apparatus for monitoring an interior of a process chamber including a process chamber including a chamber body and a view port defined in the chamber body, a cover section including a pinhole in one end, the cover section disposed to correspond to an end portion of the view port, the cover section having a first length in a direction toward a center point of the process chamber, and a sensing unit inserted into the view port to monitor the interior of the process chamber through the pinhole, a region in the process chamber to be sensed by the sensing unit determined based on the first length may be provided.
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公开(公告)号：US11490499B2
公开(公告)日：2022-11-01
申请号：US17242022
申请日：2021-04-27
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Sungho Jang , Yoonjae Kim , Hyuck Shin , Donghyub Lee , Kul Inn
Abstract: A method of manufacturing a semiconductor includes generating plasma in an amplifying tube using gas as a gain medium; detecting a state of the plasma generated in the amplifying tube; determining a virtual laser gain based on the detected state of the plasma; controlling the state of the plasma such that the virtual laser gain is within a target range; and manufacturing the semiconductor device including performing an exposure process on a substrate using a laser beam output from the amplifying tube adjusted to have the virtual laser gain within the target range.
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3.发明授权公开(公告)号：US10481005B2
公开(公告)日：2019-11-19
申请号：US16157682
申请日：2018-10-11
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Se Jin Oh , Tae Kyun Kang , Yu Sin Kim , Jae Ik Kim , Chan Bin Mo , Doug Yong Sung , Seung Bin Ahn , Kul Inn , Yun Kwang Jeon
Abstract: A semiconductor substrate measuring apparatus includes a light source unit generating irradiation light including light in a first wavelength band and light in a second wavelength band. An optical unit irradiates the irradiation light on a measurement object and condenses reflected light. A light splitting unit splits the reflected light, condensed in the optical unit, into a first optical path and a second optical path. A first detecting unit is disposed on the first optical path and detects first interference light in the first wavelength band in the reflected light. A second detecting unit is disposed on the second optical path and detects second interference light in the second wavelength band in the reflected light. A controlling unit calculates at least one of a surface shape or a thickness of the measurement object. The controlling unit calculates a temperature of the measurement object.
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公开(公告)号：US10229818B2
公开(公告)日：2019-03-12
申请号：US15260910
申请日：2016-09-09
Applicant: Samsung Electronics Co., Ltd.
Inventor： Protopopov Vladimir , Ki Ho Hwang , Doug Yong Sung , Se Jin Oh , Kul Inn , Sung Ho Jang , Yun Kwang Jeon
Abstract: An apparatus for monitoring an interior of a process chamber including a process chamber including a chamber body and a view port defined in the chamber body, a cover section including a pinhole in one end, the cover section disposed to correspond to an end portion of the view port, the cover section having a first length in a direction toward a center point of the process chamber, and a sensing unit inserted into the view port to monitor the interior of the process chamber through the pinhole, a region in the process chamber to be sensed by the sensing unit determined based on the first length may be provided.
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