公开(公告)号：US20240274418A1

公开(公告)日：2024-08-15

申请号：US18455949

申请日：2023-08-25

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sungho Jang ,  Protopopov Vladimir ,  Dohoon Kwon ,  Sangki Nam ,  Dougyong Sung ,  Sungwon Cho

IPC: H01J37/32

CPC classification number: H01J37/32972 ,  H01J2237/24564

Abstract: An apparatus for measuring real-time plasma density includes, at least one plasma density measurement sensor in a process chamber, the at least one plasma density measurement sensor being configured to sense a plasma current between a first electrode and a second electrode when plasma is generated, and to generate an optical signal in response to the plasma current, and an optical signal detector on a side surface of the process chamber, the optical signal detector being configured to detect the optical signal from the at least one plasma density measurement sensor.

公开(公告)号：US10229818B2

公开(公告)日：2019-03-12

申请号：US15260910

申请日：2016-09-09

Applicant: Samsung Electronics Co., Ltd.

Inventor： Protopopov Vladimir ,  Ki Ho Hwang ,  Doug Yong Sung ,  Se Jin Oh ,  Kul Inn ,  Sung Ho Jang ,  Yun Kwang Jeon

IPC: G06K9/00 ,  H01J37/32 ,  H04N5/225

Abstract: An apparatus for monitoring an interior of a process chamber including a process chamber including a chamber body and a view port defined in the chamber body, a cover section including a pinhole in one end, the cover section disposed to correspond to an end portion of the view port, the cover section having a first length in a direction toward a center point of the process chamber, and a sensing unit inserted into the view port to monitor the interior of the process chamber through the pinhole, a region in the process chamber to be sensed by the sensing unit determined based on the first length may be provided.

公开(公告)号：US20180130651A1

公开(公告)日：2018-05-10

申请号：US15727198

申请日：2017-10-06

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： VLADIMIR VOLYNETS ,  Protopopov Vladimir ,  Young Do Kim ,  Yuri Barsukov ,  Sang Heon Lee ,  Sung Ho Jang

IPC: H01J49/40 ,  G01J3/443 ,  H01J49/10 ,  H01J49/00 ,  H01J49/12 ,  H01L21/02 ,  C23C16/455 ,  H01J37/32 ,  H01L29/786

CPC classification number: H01J49/40 ,  C23C16/45502 ,  G01J3/2889 ,  G01J3/443 ,  H01J37/32963 ,  H01J49/0031 ,  H01J49/10 ,  H01J49/12 ,  H01J2237/327 ,  H01L21/02274 ,  H01L29/78696

Abstract: A pulsed plasma analyzer includes a pulse modulator that controls an off-time of a pulsed plasma that includes a target radical, an optical spectrometer that measures optical emissions of the pulsed plasma after the off-time to determine optical emission data, and a concentration estimating module that estimates a concentration of the target radical during the off-time based on an initial optical emission value of the optical emission data that changes as a function of the off-time, and outputs an estimated concentration.

公开(公告)号：US10971343B2

公开(公告)日：2021-04-06

申请号：US16262024

申请日：2019-01-30

Applicant: Samsung Electronics Co., Ltd.

Inventor： Protopopov Vladimir ,  Ki Ho Hwang ,  Doug Yong Sung ,  Se Jin Oh ,  Kul Inn ,  Sung Ho Jang ,  Yun Kwang Jeon

IPC: G06K9/00 ,  H01J37/32 ,  H04N5/225

Abstract: An apparatus for monitoring an interior of a process chamber including a process chamber including a chamber body and a view port defined in the chamber body, a cover section including a pinhole in one end, the cover section disposed to correspond to an end portion of the view port, the cover section having a first length in a direction toward a center point of the process chamber, and a sensing unit inserted into the view port to monitor the interior of the process chamber through the pinhole, a region in the process chamber to be sensed by the sensing unit determined based on the first length may be provided.

公开(公告)号：US10249485B2

公开(公告)日：2019-04-02

申请号：US15727198

申请日：2017-10-06

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Vladimir Volynets ,  Protopopov Vladimir ,  Young Do Kim ,  Yuri Barsukov ,  Sang Heon Lee ,  Sung Ho Jang

IPC: G01J3/30 ,  H01J49/40 ,  C23C16/455 ,  G01J3/443 ,  H01J37/32 ,  H01J49/00 ,  H01J49/10 ,  H01J49/12 ,  H01L21/02 ,  H01L29/786 ,  G01J3/28

Abstract: A pulsed plasma analyzer includes a pulse modulator that controls an off-time of a pulsed plasma that includes a target radical, an optical spectrometer that measures optical emissions of the pulsed plasma after the off-time to determine optical emission data, and a concentration estimating module that estimates a concentration of the target radical during the off-time based on an initial optical emission value of the optical emission data that changes as a function of the off-time, and outputs an estimated concentration.