公开(公告)号：US11107705B2

公开(公告)日：2021-08-31

申请号：US16505488

申请日：2019-07-08

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Beom Jin Yoo ,  Min Hyoung Kim ,  Sang Ki Nam ,  Won Hyuk Jang ,  Kyu Hee Han ,  Young Do Kim ,  Jeong Min Bang

IPC: H01L21/67 ,  H01J37/32 ,  H01L21/02

Abstract: A cleaning solution production system is for cleaning a semiconductor substrate. The system includes a pressure tank, a plasma reaction tank configured to form a plasma in gas bubbles suspended in a decompressed liquid obtained from the pressure tank to thereby generate radical species in the decompressed liquid, a storage tank configured to store a cleaning solution containing the radical species generated in the plasma reaction tank, and a nozzle configured to supply the cleaning solution from the storage tank to a semiconductor substrate.

公开(公告)号：US10249485B2

公开(公告)日：2019-04-02

申请号：US15727198

申请日：2017-10-06

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Vladimir Volynets ,  Protopopov Vladimir ,  Young Do Kim ,  Yuri Barsukov ,  Sang Heon Lee ,  Sung Ho Jang

IPC: G01J3/30 ,  H01J49/40 ,  C23C16/455 ,  G01J3/443 ,  H01J37/32 ,  H01J49/00 ,  H01J49/10 ,  H01J49/12 ,  H01L21/02 ,  H01L29/786 ,  G01J3/28

Abstract: A pulsed plasma analyzer includes a pulse modulator that controls an off-time of a pulsed plasma that includes a target radical, an optical spectrometer that measures optical emissions of the pulsed plasma after the off-time to determine optical emission data, and a concentration estimating module that estimates a concentration of the target radical during the off-time based on an initial optical emission value of the optical emission data that changes as a function of the off-time, and outputs an estimated concentration.

公开(公告)号：US11664242B2

公开(公告)日：2023-05-30

申请号：US17381246

申请日：2021-07-21

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Beom Jin Yoo ,  Min Hyoung Kim ,  Sang Ki Nam ,  Won Hyuk Jang ,  Kyu Hee Han ,  Young Do Kim ,  Jeong Min Bang

IPC: H01L21/67 ,  H01J37/32 ,  H01L21/02

CPC classification number: H01L21/67051 ,  H01J37/32541 ,  H01J37/32559 ,  H01J37/32568 ,  H01L21/02057 ,  H01L21/67017 ,  H01L21/67253 ,  H01J2237/335 ,  H01L21/02068

Abstract: A cleaning solution production system is for cleaning a semiconductor substrate. The system includes a pressure tank, a plasma reaction tank configured to form a plasma in gas bubbles suspended in a decompressed liquid obtained from the pressure tank to thereby generate radical species in the decompressed liquid, a storage tank configured to store a cleaning solution containing the radical species generated in the plasma reaction tank, and a nozzle configured to supply the cleaning solution from the storage tank to a semiconductor substrate.

公开(公告)号：US10901007B2

公开(公告)日：2021-01-26

申请号：US16261175

申请日：2019-01-29

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Young Do Kim ,  Sung Yong Lim ,  Chan Soo Kang ,  Do Hoon Kwon ,  Min Ju Kim ,  Sang Ki Nam ,  Jung Mo Yang ,  Jong Hun Pi ,  Kyu Hee Han

IPC: G01R15/18 ,  H05H1/46 ,  H01F27/28 ,  G01R15/16

Abstract: An RF sensing apparatus configured for use with a plasma processing chamber includes a penetration unit opened in an up/down direction, a main return path unit surrounding all or a portion of the penetration unit, and a secondary return path unit located between the penetration unit and the main return path unit, spaced apart from the main return path unit, and surrounding all or a portion of the penetration unit. The main return path unit and the secondary return path unit include a path through which a current flows in one of the up/down directions.

公开(公告)号：US20180130651A1

公开(公告)日：2018-05-10

申请号：US15727198

申请日：2017-10-06

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： VLADIMIR VOLYNETS ,  Protopopov Vladimir ,  Young Do Kim ,  Yuri Barsukov ,  Sang Heon Lee ,  Sung Ho Jang

IPC: H01J49/40 ,  G01J3/443 ,  H01J49/10 ,  H01J49/00 ,  H01J49/12 ,  H01L21/02 ,  C23C16/455 ,  H01J37/32 ,  H01L29/786

CPC classification number: H01J49/40 ,  C23C16/45502 ,  G01J3/2889 ,  G01J3/443 ,  H01J37/32963 ,  H01J49/0031 ,  H01J49/10 ,  H01J49/12 ,  H01J2237/327 ,  H01L21/02274 ,  H01L29/78696

Abstract: A pulsed plasma analyzer includes a pulse modulator that controls an off-time of a pulsed plasma that includes a target radical, an optical spectrometer that measures optical emissions of the pulsed plasma after the off-time to determine optical emission data, and a concentration estimating module that estimates a concentration of the target radical during the off-time based on an initial optical emission value of the optical emission data that changes as a function of the off-time, and outputs an estimated concentration.