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公开(公告)号:US20240355638A1
公开(公告)日:2024-10-24
申请号:US18760515
申请日:2024-07-01
发明人: Yong LIU , Yusheng LIN , Liangbiao CHEN
IPC分类号: H01L21/48 , H01L21/56 , H01L23/28 , H01L23/495 , H01L23/498
CPC分类号: H01L21/4821 , H01L21/56 , H01L23/28 , H01L23/49534 , H01L23/49575 , H01L23/49582 , H01L23/498 , H01L23/49822 , H01L23/49861
摘要: Methods of forming semiconductor packages include providing a first insulator layer coupled with a first metallic layer. A recess is formed in the first metallic layer and a semiconductor die is mechanically coupled therein. The die is mechanically coupled with a second metallic layer and the second metallic layer is coupled with a second insulator layer. The die and layers are at least partially encapsulated to form the semiconductor package. The first and/or second metallic layers may be insulator-metal substrates, metal-insulator-metal (MIM) substrates, or may be formed of lead frames. In implementations the package does not include a spacer between the die and the first metallic layer and does not include a spacer between the die and the second metallic layer. In implementations the first insulator layer and the second insulator layer are exposed through the encapsulant or are mechanically coupled with metallic layers exposed through the encapsulant.
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公开(公告)号:US20240321825A1
公开(公告)日:2024-09-26
申请号:US18680211
申请日:2024-05-31
发明人: Maohua DU
CPC分类号: H01L24/96 , H01L21/561 , H01L23/28 , H01L24/19 , H01L24/20 , H01L2224/19 , H01L2224/214 , H01L2224/96
摘要: A fan-out packaging method and packaging structure are provided. The method includes: providing a wafer carrier, a panel carrier, and groups of first chips; fixing first surfaces of the groups of first chips on the wafer carrier; forming a first plastic encapsulation layer on second surfaces of the groups of first chips; separating the groups of first chips from the wafer carrier; forming a high-density interconnection wiring layer on the first surfaces of the groups of first chips; cutting the groups of first chips; fixing one side of the groups of first chips with the high-density interconnection wiring layer on the panel carrier; forming a second plastic encapsulation layer on another side of the groups of first chips away from the high-density interconnection wiring layer; separating the groups of first chips from the panel carrier; and forming a low-density interconnection wiring layer on the high-density interconnection wiring layer.
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公开(公告)号:US20240258260A1
公开(公告)日:2024-08-01
申请号:US18422034
申请日:2024-01-25
发明人: Hwee Seng Chew
CPC分类号: H01L24/19 , H01L21/561 , H01L21/568 , H01L23/28 , H01L24/20 , H01L2224/19 , H01L2224/21
摘要: The present application discloses a semiconductor structure including one or more dies, a protective layer formed on a die active surface, pre-vias formed in the protective layer, and a molding layer encapsulating the die(s) and the protective layer. The die has a die back surface exposed from the molding layer, and the molding layer has a molding thickness larger than a die thickness and a thickness of the protective layer combined for forming a cavity contour. The semiconductor structure also includes a conductive layer formed conformally to the cavity contour for forming a concave contour of the conductive layer. The present application also discloses methods of making the semiconductor structure having a sacrificial layer for solving an issue of die cracking during a thinning process such as backgrinding to a reconstituted panel with the dies embedded within the molding layer.
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公开(公告)号:US12046505B2
公开(公告)日:2024-07-23
申请号:US16390496
申请日:2019-04-22
申请人: Qorvo US, Inc.
发明人: Julio C. Costa , Michael Carroll
IPC分类号: H01L23/66 , H01L21/56 , H01L21/762 , H01L23/00 , H01L23/28 , H01L23/29 , H01L23/31 , H01L23/373 , H01L23/48
CPC分类号: H01L21/76245 , H01L21/565 , H01L23/29 , H01L23/3121 , H01L23/3735 , H01L23/66 , H01L24/17
摘要: The present disclosure relates to a radio frequency (RF) device including a device substrate, a thinned device die with a device region over the device substrate, a first mold compound, and a second mold compound. The device region includes an isolation portion, a back-end-of-line (BEOL) portion, and a front-end-of-line (FEOL) portion with a contact layer and an active section. The contact layer resides over the BEOL portion, the active section resides over the contact layer, and the isolation portion resides over the contact layer to encapsulate the active section. The first mold compound resides over the device substrate, surrounds the thinned device die, and extends vertically beyond the thinned device die to define an opening over the thinned device die and within the first mold compound. The second mold compound fills the opening and directly connects the isolation portion of the thinned device die.
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公开(公告)号:US12033426B2
公开(公告)日:2024-07-09
申请号:US17480176
申请日:2021-09-21
发明人: Matias N. Troccoli , Tian Xiao
IPC分类号: B32B7/022 , C23C28/00 , C23C28/04 , G06V40/13 , H01L23/28 , B32B17/06 , B32B17/10 , B32B27/06 , C23C14/06 , C23C16/26 , C23C16/30 , C23C16/34 , H01L23/00 , H01L23/29 , H01L23/31
CPC分类号: G06V40/1329 , B32B7/022 , C23C28/046 , C23C28/048 , C23C28/40 , C23C28/42 , C23C28/44 , H01L23/28 , B32B17/06 , B32B17/10 , B32B27/06 , B32B2250/40 , B32B2250/42 , B32B2255/20 , B32B2255/24 , B32B2255/26 , B32B2255/28 , B32B2307/204 , B32B2307/302 , B32B2307/554 , B32B2307/558 , B32B2307/584 , B32B2307/702 , B32B2307/704 , B32B2313/04 , B32B2315/00 , B32B2327/12 , B32B2457/00 , B32B2457/14 , C23C14/0605 , C23C14/0641 , C23C14/0647 , C23C16/26 , C23C16/303 , C23C16/34 , C23C16/342 , C23C28/04 , G06V40/1306 , H01L23/29 , H01L23/291 , H01L23/3192 , H01L23/562 , Y10S428/9088 , Y10T428/24942 , Y10T428/24983 , Y10T428/3154
摘要: A protective coating layer, an electronic device including such a protective coating layer, and the methods of making the same are provided. The electronic device includes a substrate, a thin film circuit layer disposed over the substrate, and a protective coating layer disposed over the thin film circuit layer. The protective coating layer includes a first coating and a second coating disposed over the first coating. Each coating has a cross-plane thermal conductivity in a direction normal to a respective coating surface equal to or higher than 0.5 W/(m*K). The first coating and the second coating have different crystal or amorphous structures, different crystalline orientations, different compositions, or a combination thereof to provide different nanoindentation hardness. The first coating has a hardness lower than that of the second coating.
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公开(公告)号:US11935821B2
公开(公告)日:2024-03-19
申请号:US17210392
申请日:2021-03-23
发明人: Nazila Dadvand
IPC分类号: H01L23/495 , H01L23/00 , H01L23/28 , H01L23/532 , H05K3/34
CPC分类号: H01L23/49582 , H01L23/28 , H01L23/4951 , H01L23/49541 , H01L23/49575 , H01L23/53233 , H01L24/97 , H05K3/3442
摘要: A device and method for fabrication thereof is provided which results in corrosion resistance of metal flanges (802) of a semiconductor package, such as a quad flat no-lead package (QFN). Using metal electroplating (such as electroplating of nickel (Ni) or nickel alloys on copper flanges of the QFN package), corrosion resistance for the flanges is provided using a process that allows an electric current to reach the entire backside of a substrate (102) to permit electroplating. In addition, the method may be used to directly connect a semiconductor die (202) to the metal substrate (102) of the package.
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公开(公告)号:US20240087903A1
公开(公告)日:2024-03-14
申请号:US18510646
申请日:2023-11-16
发明人: Feng-Cheng Hsu , Shuo-Mao Chen , Shin-Puu Jeng
IPC分类号: H01L21/304 , B28D5/00 , H01L21/02 , H01L21/48 , H01L21/56 , H01L21/67 , H01L21/683 , H01L21/78 , H01L23/00 , H01L23/28 , H01L23/31 , H01L23/367 , H01L23/498 , H01L23/538 , H01L25/00 , H01L25/10
CPC分类号: H01L21/3043 , B28D5/00 , H01L21/02109 , H01L21/4853 , H01L21/4857 , H01L21/486 , H01L21/565 , H01L21/67092 , H01L21/6835 , H01L21/6836 , H01L21/78 , H01L23/28 , H01L23/3114 , H01L23/3675 , H01L23/49811 , H01L23/5383 , H01L23/5384 , H01L23/5386 , H01L23/5389 , H01L23/562 , H01L24/19 , H01L24/20 , H01L25/105 , H01L25/50 , H01L23/3128 , H01L2221/68345 , H01L2221/68359 , H01L2224/023 , H01L2224/214 , H01L2225/1035 , H01L2225/1058 , H01L2225/1094 , H01L2924/19011 , H01L2924/19106 , H01L2924/3511
摘要: Provided is a package structure including a die, a through via, an encapsulant, a warpage controlling layer, and a cap. The through via is laterally aside the die. The encapsulant laterally encapsulates the through via and the die. The warpage controlling layer covers the encapsulant and the die. The cap is laterally aside the warpage controlling layer and on the through via. The cap has a top surface higher than a top surface of the encapsulant and lower than a top surface of the warpage controlling layer.
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公开(公告)号:US11923261B2
公开(公告)日:2024-03-05
申请号:US17487674
申请日:2021-09-28
发明人: Koutarou Maeda
IPC分类号: H01L23/28 , H01L21/56 , H01L23/053 , H01L23/31
CPC分类号: H01L23/3107 , H01L21/565 , H01L23/053
摘要: A semiconductor chip is provided on a semiconductor circuit base on one surface of an insulating substrate. A reinforcement and balance base is provided on the one surface of the insulating substrate spaced to the semiconductor circuit base. The insulating substrate 4, the semiconductor circuit base, the semiconductor chip, and the reinforcement and balance base are sealed into a resin-molded sealing body. The sealing body has resin non-adhering portions.
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公开(公告)号:US11862514B2
公开(公告)日:2024-01-02
申请号:US17984874
申请日:2022-11-10
发明人: Sanghoon Ahn , Woojin Lee , Kyuhee Han
IPC分类号: H01L21/768 , H01L23/522 , H01L23/532 , H10B12/00 , H01L23/48 , H01L23/28
CPC分类号: H01L21/7682 , H01L21/76831 , H01L21/76834 , H01L21/76877 , H01L23/5226 , H01L23/5329 , H01L21/76895 , H01L23/28 , H01L23/48 , H10B12/482
摘要: An integrated circuit device according to the inventive concepts includes lower wiring structures formed on a substrate, an air gap arranged between the lower wiring structures, a capping layer covering an upper surface of the air gap, an etch stop layer conformally covering an upper surfaces of the lower wiring structures and the capping layer and having a protrusion and recess structure, an insulating layer covering the etch stop layer, and an upper wiring structure penetrating the insulating layer and connected to the upper surface of the lower wiring structure not covered with the etch stop layer, wherein the upper wiring structure covers a portion of an upper surface of the capping layer, and a level of the upper surface of the capping layer is higher than a level of the upper surface of the lower wiring structures.
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10.
公开(公告)号:US11842939B2
公开(公告)日:2023-12-12
申请号:US17330787
申请日:2021-05-26
申请人: Qorvo US, Inc.
发明人: Julio C. Costa , George Maxim
IPC分类号: H01L23/28 , H01L23/36 , H01L23/31 , H01L23/482 , H01L23/495 , H01L23/498 , H05K1/02
CPC分类号: H01L23/36 , H01L23/3128 , H01L23/4828 , H01L23/498 , H01L23/49568 , H05K1/021 , H05K2201/09118
摘要: The present disclosure relates to a thermally enhanced package, which includes a carrier, a thinned die over the carrier, a mold compound, and a heat extractor. The thinned die includes a device layer over the carrier and a dielectric layer over the device layer. The mold compound resides over the carrier, surrounds the thinned die, and extends beyond a top surface of the thinned die to define an opening within the mold compound and over the thinned die. The top surface of the thinned die is at a bottom of the opening. At least a portion of the heat extractor is inserted into the opening and in thermal contact with the thinned die. Herein the heat extractor is formed of a metal or an alloy.
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