公开(公告)号：US12172372B2

公开(公告)日：2024-12-24

申请号：US18514899

申请日：2023-11-20

Applicant: EOS GmbH Electro Optical Systems

Inventor： Thomas Mattes ,  Stefan Paternoster ,  Gerd Cantzler ,  Jochen Philippi ,  Stephan Gronenborn ,  Gero Heusler ,  Holger Moench ,  Ralf Conrads

IPC: B29C64/153 ,  B22F12/00 ,  B22F12/42 ,  B22F12/44 ,  B22F12/45 ,  B22F12/47 ,  B22F12/49 ,  B23K26/064 ,  B23K26/08 ,  B23K26/342 ,  B29C64/20 ,  B29C64/25 ,  B29C64/268 ,  B29C64/277 ,  B29C64/282 ,  B29C64/386 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/02 ,  B41J2/45 ,  B41J2/455 ,  H01S5/00 ,  H01S5/42 ,  B22F10/28 ,  G03G15/22

Abstract: The invention describes a laser printing system (100) for illuminating an object moving relative to a laser module of the laser printing system (100) in a working plane (180), the laser module comprising at least two laser arrays of semiconductor lasers and at least one optical element, wherein the optical element is adapted to image laser light emitted by the laser arrays, such that laser light of semiconductor lasers of one laser array is imaged to one pixel in the working plane of the laser printing system, and wherein the laser printing system is a 3D printing system for additive manufacturing and wherein two, three, four or a multitude of laser modules (201, 202) are provided, which are arranged in columns (c1, c2) perpendicular to a direction of movement (250) of the object in the working plane (180), and wherein the columns are staggered with respect to each other such that a first laser module (201) of a first column of laser modules (c1) is adapted to illuminate a first area (y1) of the object and a second laser module (202) of a second column (c2) of laser modules is adapted to illuminate a second area (y2) of the object, wherein the first area (y1) is adjacent to the second area (y2) such that continuous illumination of the object is enabled.

公开(公告)号：US12162219B2

公开(公告)日：2024-12-10

申请号：US18343431

申请日：2023-06-28

Applicant: Seurat Technologies, Inc.

Inventor： James A. DeMuth ,  Erik Toomre ,  Francis L. Leard ,  Kourosh Kamshad ,  Heiner Fees ,  Eugene Berdichevsky

IPC: B29C64/264 ,  B22F3/24 ,  B22F10/00 ,  B22F12/00 ,  B22F12/33 ,  B22F12/44 ,  B22F12/70 ,  B23K15/00 ,  B23K15/06 ,  B23K26/03 ,  B23K26/08 ,  B23K26/12 ,  B23K26/142 ,  B23K26/144 ,  B23K26/16 ,  B23K26/36 ,  B23K26/70 ,  B23K37/04 ,  B29C64/153 ,  B29C64/268 ,  B29C64/386 ,  B33Y10/00 ,  B33Y40/00 ,  B33Y50/02 ,  B33Y70/00 ,  B33Y80/00 ,  G02B7/14 ,  G02B7/16 ,  G02B7/182 ,  G02B15/04 ,  G02B15/10 ,  G02B19/00 ,  G02B26/08 ,  G02F1/01 ,  G02F1/1333 ,  G02F1/135 ,  B22F10/10 ,  B22F10/32 ,  B22F10/47 ,  B22F10/50 ,  B22F10/64 ,  B22F10/73 ,  B22F12/17 ,  B22F12/20 ,  B22F12/41 ,  B22F12/45 ,  B22F12/53 ,  B23K26/00 ,  B23K26/082 ,  B23K26/342 ,  B23K101/00 ,  B23K101/02 ,  B23K101/24 ,  B23K103/00 ,  B25J11/00 ,  B28B1/00 ,  B29K105/00 ,  B33Y30/00 ,  B33Y99/00 ,  G02B27/00 ,  G02B27/09 ,  G02B27/10 ,  G02B27/14 ,  G02B27/28 ,  G05B17/02 ,  G07C3/14 ,  H01S5/40

Abstract: An apparatus for additive printing is provided. The apparatus includes a print head, an optical-mechanical assembly, and a rejected energy handling device. The print head includes an energy source and one or more energy patterning devices configured to provide one or more two-dimensional patterned incident beams to process a powdered material. The optical-mechanical assembly includes optical components arranged to receive and direct the one or more incident beams into a location. The rejected energy handling device is configured to reuse beam energy rejected by the one or more energy patterning devices by relaying the rejected beam energy to either or both of an electricity generator and a thermal management system.

公开(公告)号：US12157268B2

公开(公告)日：2024-12-03

申请号：US17255290

申请日：2019-06-26

Applicant: CSIR

Inventor： Hencharl Strauss ,  Darryl Naidoo

IPC: B29C64/153 ,  B22F10/31 ,  B22F10/36 ,  B22F10/80 ,  B22F12/40 ,  B22F12/41 ,  B22F12/44 ,  B22F12/49 ,  B22F12/90 ,  B23K26/03 ,  B23K26/342 ,  B23K26/70 ,  B28B1/00 ,  B28B17/00 ,  B29C64/268 ,  B29C64/393 ,  B33Y30/00 ,  B33Y50/02 ,  G02F1/29 ,  H01S5/00

Abstract: A control system for thermo optical control of focus position of an energy beam in an additive manufacturing apparatus has a first doped medium and a second doped medium, each of which is optically transparent and doped with a dopant. The first doped medium has a positive thermo-optical coefficient (dn/dT) and the second doped medium has a negative thermo-optical coefficient (dn/dT) and is in series with the first doped medium. An energy beam input or coupling is configured to generate or receive an energy beam that is required to be controlled, the energy beam being within a first wavelength range and directed towards the first and second doped mediums. An absorbed beam input or coupling is configured to generate or receive at least one absorbed beam in a second wavelength range which is different from the first wavelength range, the absorbed beam being directed towards the first and second doped mediums. The first and second doped mediums have a higher beam absorption characteristic in the second wavelength range than in the first wavelength range, causing the absorbed beam to have a higher absorption than the energy beam in the first and second doped mediums and the first and second doped mediums each have a coating which allows transmission at both the first and the second wavelength ranges.

公开(公告)号：US20240342988A1

公开(公告)日：2024-10-17

申请号：US18753760

申请日：2024-06-25

Applicant: Seurat Technologies, Inc.

Inventor： James A. DeMuth ,  Erik Toomre ,  Francis L. Leard ,  Kourosh Kamshad ,  Heiner Fees ,  Eugene Berdichevsky

IPC: B29C64/264 ,  B22F3/24 ,  B22F10/00 ,  B22F10/10 ,  B22F10/28 ,  B22F10/32 ,  B22F10/34 ,  B22F10/36 ,  B22F10/47 ,  B22F10/50 ,  B22F10/64 ,  B22F10/70 ,  B22F10/73 ,  B22F12/00 ,  B22F12/17 ,  B22F12/20 ,  B22F12/30 ,  B22F12/33 ,  B22F12/41 ,  B22F12/44 ,  B22F12/45 ,  B22F12/53 ,  B22F12/70 ,  B22F12/88 ,  B22F12/90 ,  B23K15/00 ,  B23K15/06 ,  B23K26/00 ,  B23K26/03 ,  B23K26/08 ,  B23K26/082 ,  B23K26/12 ,  B23K26/142 ,  B23K26/144 ,  B23K26/16 ,  B23K26/342 ,  B23K26/36 ,  B23K26/70 ,  B23K37/04 ,  B23K101/00 ,  B23K101/02 ,  B23K101/24 ,  B23K103/00 ,  B25J11/00 ,  B28B1/00 ,  B29C64/153 ,  B29C64/268 ,  B29C64/386 ,  B29K105/00 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y40/00 ,  B33Y50/02 ,  B33Y70/00 ,  B33Y80/00 ,  B33Y99/00 ,  G02B7/14 ,  G02B7/16 ,  G02B7/182 ,  G02B15/04 ,  G02B15/10 ,  G02B19/00 ,  G02B26/08 ,  G02B27/00 ,  G02B27/09 ,  G02B27/10 ,  G02B27/14 ,  G02B27/28 ,  G02F1/01 ,  G02F1/1333 ,  G02F1/135 ,  G05B17/02 ,  G07C3/14 ,  H01S5/00 ,  H01S5/40

CPC classification number: B29C64/264 ,  B22F3/24 ,  B22F10/00 ,  B22F10/28 ,  B22F10/34 ,  B22F10/36 ,  B22F10/70 ,  B22F12/00 ,  B22F12/226 ,  B22F12/30 ,  B22F12/33 ,  B22F12/38 ,  B22F12/44 ,  B22F12/70 ,  B22F12/88 ,  B22F12/90 ,  B23K15/0006 ,  B23K15/0013 ,  B23K15/002 ,  B23K15/0026 ,  B23K15/0093 ,  B23K15/06 ,  B23K26/03 ,  B23K26/032 ,  B23K26/083 ,  B23K26/0846 ,  B23K26/1224 ,  B23K26/123 ,  B23K26/127 ,  B23K26/142 ,  B23K26/144 ,  B23K26/16 ,  B23K26/36 ,  B23K26/702 ,  B23K26/703 ,  B23K26/704 ,  B23K37/0426 ,  B25J11/00 ,  B29C64/153 ,  B29C64/268 ,  B29C64/386 ,  B33Y10/00 ,  B33Y40/00 ,  B33Y50/02 ,  B33Y70/00 ,  B33Y80/00 ,  B33Y99/00 ,  G02B7/14 ,  G02B7/16 ,  G02B7/1827 ,  G02B15/04 ,  G02B15/10 ,  G02B19/0028 ,  G02B19/0047 ,  G02B26/0816 ,  G02B27/108 ,  G02F1/0136 ,  G02F1/133362 ,  G02F1/135 ,  G05B17/02 ,  H01S5/005 ,  H01S5/4012 ,  B22F2003/247 ,  B22F2003/248 ,  B22F10/10 ,  B22F10/32 ,  B22F10/47 ,  B22F10/50 ,  B22F10/64 ,  B22F10/73 ,  B22F12/17 ,  B22F12/20 ,  B22F12/222 ,  B22F12/41 ,  B22F12/45 ,  B22F12/53 ,  B22F2998/10 ,  B22F2999/00 ,  B23K15/0086 ,  B23K26/0006 ,  B23K26/082 ,  B23K26/342 ,  B23K37/0408 ,  B23K2101/001 ,  B23K2101/008 ,  B23K2101/02 ,  B23K2101/24 ,  B23K2103/00 ,  B23K2103/42 ,  B23K2103/50 ,  B28B1/001 ,  B29K2105/251 ,  B33Y30/00 ,  G02B27/0068 ,  G02B27/0905 ,  G02B27/141 ,  G02B27/283 ,  G02B27/286 ,  G05B2219/49023 ,  G07C3/146 ,  Y02P10/25 ,  Y02P80/40

Abstract: A method of additive manufacture suitable for large and high resolution structures is disclosed. The method may include sequentially advancing each portion of a continuous part in the longitudinal direction from a first zone to a second zone. In the first zone, selected granules of a granular material may be amalgamated. In the second zone, unamalgamated granules of the granular material may be removed. The method may further include advancing a first portion of the continuous part from the second zone to a third zone while (1) a last portion of the continuous part is formed within the first zone and (2) the first portion is maintained in the same position in the lateral and transverse directions that the first portion occupied within the first zone and the second zone.

公开(公告)号：US20240247361A1

公开(公告)日：2024-07-25

申请号：US18443968

申请日：2024-02-16

Applicant: AUBURN UNIVERSITY

Inventor： Masoud MAHJOURI-SAMANI ,  Nima SHAMSAEI

IPC: C23C14/22 ,  B22F10/25 ,  B22F10/34 ,  B22F12/44 ,  B22F12/53 ,  B22F12/70 ,  B22F12/90 ,  B23K26/14 ,  B23K26/144 ,  B23K26/36 ,  B23K103/00 ,  B28B1/00 ,  B33Y10/00 ,  B33Y30/00

CPC classification number: C23C14/228 ,  B22F10/25 ,  B22F10/34 ,  B22F12/53 ,  B22F12/70 ,  B23K26/1437 ,  B23K26/144 ,  B23K26/1464 ,  B23K26/1482 ,  B23K26/36 ,  B28B1/001 ,  B33Y10/00 ,  B33Y30/00 ,  B22F12/44 ,  B22F12/90 ,  B23K2103/50

Abstract: A device including a chamber and a nozzle detachably connected to the chamber, the nozzle defining an aperture, a target carousel disposed within the chamber, a first laser configured to generate a first beam directed toward the target carousel to perform in-situ ablation to form a laser plume, a gas flow system configured to supply gas into the chamber, such that the gas interacts with the laser plume and causes condensation and formation of nanoparticles, and a second laser configured to generate a second beam directed through the interior of the chamber, through the aperture of the nozzle, and toward a substrate disposed outside the device, the second laser beam configured to sinter and crystalize on the substrate the nanoparticles exiting the nozzle.

公开(公告)号：US20240083109A1

公开(公告)日：2024-03-14

申请号：US18514899

申请日：2023-11-20

Applicant: EOS GmbH Electro Optical Systems

Inventor： Thomas Mattes ,  Stefan Paternoster ,  Gerd Cantzler ,  Jochen Philippi ,  Stephan Gronenborn ,  Gero Heusler ,  Holger Moench ,  Ralf Conrads

IPC: B29C64/153 ,  B22F12/00 ,  B22F12/42 ,  B22F12/44 ,  B22F12/45 ,  B22F12/47 ,  B22F12/49 ,  B23K26/064 ,  B23K26/08 ,  B23K26/342 ,  B29C64/20 ,  B29C64/25 ,  B29C64/268 ,  B29C64/277 ,  B29C64/282 ,  B29C64/386 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/02 ,  B41J2/45 ,  B41J2/455 ,  H01S5/00 ,  H01S5/42

CPC classification number: B29C64/153 ,  B22F12/38 ,  B22F12/42 ,  B22F12/44 ,  B22F12/45 ,  B22F12/47 ,  B22F12/49 ,  B23K26/064 ,  B23K26/0853 ,  B23K26/342 ,  B29C64/20 ,  B29C64/25 ,  B29C64/268 ,  B29C64/277 ,  B29C64/282 ,  B29C64/386 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/02 ,  B41J2/451 ,  B41J2/455 ,  H01S5/0071 ,  H01S5/423 ,  G03G15/225

Abstract: The invention describes a laser printing system (100) for illuminating an object moving relative to a laser module of the laser printing system (100) in a working plane (180), the laser module comprising at least two laser arrays of semiconductor lasers and at least one optical element, wherein the optical element is adapted to image laser light emitted by the laser arrays, such that laser light of semiconductor lasers of one laser array is imaged to one pixel in the working plane of the laser printing system, and wherein the laser printing system is a 3D printing system for additive manufacturing and wherein two, three, four or a multitude of laser modules (201, 202) are provided, which are arranged in columns (c1, c2) perpendicular to a direction of movement (250) of the object in the working plane (180), and wherein the columns are staggered with respect to each other such that a first laser module (201) of a first column of laser modules (c1) is adapted to illuminate a first area (y1) of the object and a second laser module (202) of a second column (c2) of laser modules is adapted to illuminate a second area (y2) of the object, wherein the first area (y1) is adjacent to the second area (y2) such that continuous illumination of the object is enabled.

公开(公告)号：US20240059019A1

公开(公告)日：2024-02-22

申请号：US18221471

申请日：2023-07-13

Applicant: Velo3D, Inc.

Inventor： Erel Milshtein ,  Benyamin Buller ,  Alexander Brudny

IPC: B29C64/393 ,  B29C64/153 ,  B29C64/268 ,  B29C64/35 ,  B28B17/00 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/02 ,  B23K26/354 ,  B23K26/34 ,  B23K26/062 ,  B28B1/00 ,  B23K26/06 ,  B23K26/70 ,  B23K26/12 ,  B23K26/342 ,  B23K26/03 ,  B22F10/28 ,  B22F12/44 ,  B22F12/90 ,  B22F10/31 ,  B22F10/36 ,  B29C64/135

CPC classification number: B29C64/393 ,  B29C64/153 ,  B29C64/268 ,  B29C64/35 ,  B28B17/0081 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/02 ,  B23K26/354 ,  B23K26/34 ,  B23K26/062 ,  B28B1/001 ,  B23K26/0608 ,  B23K26/703 ,  B23K26/127 ,  B23K26/0604 ,  B23K26/342 ,  B23K26/125 ,  B23K26/032 ,  B22F10/28 ,  B22F12/44 ,  B22F12/90 ,  B22F10/31 ,  B22F10/36 ,  B29C64/135 ,  B22F2999/00 ,  B22F10/77

Abstract: The present disclosure provides various apparatuses, systems, software, and methods for three-dimensional (3D) printing. The disclosure delineates various optical components of the 3D printing system, their usage, and their optional calibration. The disclosure delineates calibration of one or more components of the 3D printer (e.g., the energy beam).

公开(公告)号：US11905588B2

公开(公告)日：2024-02-20

申请号：US16899765

申请日：2020-06-12

Applicant: AUBURN UNIVERSITY

Inventor： Masoud Mahjouri-Samani ,  Nima Shamsaei

IPC: C23C14/22 ,  B33Y10/00 ,  B33Y30/00 ,  B23K26/14 ,  B23K26/144 ,  B23K26/36 ,  B28B1/00 ,  B22F10/25 ,  B22F12/53 ,  B22F12/70 ,  B22F10/34 ,  B23K103/00 ,  B22F12/44 ,  B22F12/90

CPC classification number: C23C14/228 ,  B22F10/25 ,  B22F10/34 ,  B22F12/53 ,  B22F12/70 ,  B23K26/144 ,  B23K26/1437 ,  B23K26/1464 ,  B23K26/1482 ,  B23K26/36 ,  B28B1/001 ,  B33Y10/00 ,  B33Y30/00 ,  B22F12/44 ,  B22F12/90 ,  B23K2103/50 ,  B22F2999/00 ,  B22F9/04 ,  B22F9/12 ,  B22F2202/13 ,  B22F9/002 ,  B22F12/70

Abstract: A device including a chamber and a nozzle detachably connected to the chamber, the nozzle defining an aperture, a target carousel disposed within the chamber, a first laser configured to generate a first beam directed toward the target carousel to perform in-situ ablation to form a laser plume, a gas flow system configured to supply gas into the chamber, such that the gas interacts with the laser plume and causes condensation and formation of nanoparticles, and a second laser configured to generate a second beam directed through the interior of the chamber, through the aperture of the nozzle, and toward a substrate disposed outside the device, the second laser beam configured to sinter and crystalize on the substrate the nanoparticles exiting the nozzle.

公开(公告)号：US11904413B2

公开(公告)日：2024-02-20

申请号：US17688130

申请日：2022-03-07

Applicant: Concept Laser GmbH ,  Katholieke Universiteit Leuven

Inventor： Frank Herzog ,  Florian Bechmann ,  Sebastian Berumen ,  Jean Pierre Kruth ,  Tom Craeghs

IPC: B23K31/12 ,  B33Y40/00 ,  B33Y30/00 ,  B29C64/153 ,  B22F10/28 ,  B22F12/90 ,  B23K26/70 ,  B23K26/0622 ,  B33Y10/00 ,  B29C64/386 ,  B22F10/31 ,  B22F10/00 ,  B22F12/44 ,  B22F12/49 ,  B22F10/10

CPC classification number: B23K31/12 ,  B22F10/00 ,  B22F10/28 ,  B22F10/31 ,  B22F12/90 ,  B23K26/0622 ,  B23K26/705 ,  B23K31/125 ,  B29C64/153 ,  B29C64/386 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y40/00 ,  B22F10/10 ,  B22F12/44 ,  B22F12/49 ,  Y02P10/25

Abstract: Sensor values captured by a sensor device are determined, one or more regions of a three-dimensional component having a deviation from an intended value are determined based at least in part on build coordinates for additively manufacturing the three-dimensional component corresponding to the sensor values, and a quality of the three-dimensional component is evaluated based at least in part on the one or more regions of the three-dimensional component having a deviation from the intended value. The sensor values correspond to an electromagnetic spectrum emitted by a melt pool formed by exposing a powder bed to a beam of radiation emitted from a laser apparatus, with the beam of radiation generating the melt pool in a melt region of the powder bed.

公开(公告)号：US11886052B2

公开(公告)日：2024-01-30

申请号：US16921531

申请日：2020-07-06

Applicant: nLIGHT, Inc.

Inventor： Dahv A. V. Kliner ,  Roger Farrow

IPC: G02F1/01 ,  G02B6/036 ,  G02B6/14 ,  B23K26/064 ,  B23K26/073 ,  G02B27/09 ,  B23K26/067 ,  B23K26/38 ,  B23K26/21 ,  B22F3/11 ,  B22F3/24 ,  B23K26/03 ,  G02B6/02 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/02 ,  B23K26/342 ,  B29C48/08 ,  G02B6/42 ,  B23K26/062 ,  B23K26/70 ,  B29C64/264 ,  B29C64/153 ,  H01S5/00 ,  B22F10/20 ,  B22F10/31 ,  B22F10/36 ,  G02B6/255 ,  G02B26/10 ,  G02B6/028 ,  G02F1/015 ,  B22F12/44 ,  B22F12/49 ,  G02B6/26 ,  G02B6/12

CPC classification number: G02F1/0115 ,  B22F3/1109 ,  B22F3/24 ,  B22F10/20 ,  B22F10/31 ,  B22F10/36 ,  B23K26/032 ,  B23K26/034 ,  B23K26/0342 ,  B23K26/062 ,  B23K26/064 ,  B23K26/067 ,  B23K26/073 ,  B23K26/21 ,  B23K26/342 ,  B23K26/38 ,  B23K26/704 ,  B29C48/08 ,  B29C64/153 ,  B29C64/264 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/02 ,  G02B6/02 ,  G02B6/021 ,  G02B6/023 ,  G02B6/02042 ,  G02B6/02347 ,  G02B6/02371 ,  G02B6/02395 ,  G02B6/036 ,  G02B6/03611 ,  G02B6/03694 ,  G02B6/14 ,  G02B6/255 ,  G02B6/4203 ,  G02B6/4206 ,  G02B27/0927 ,  G02B27/0933 ,  G02B27/0994 ,  H01S5/0085 ,  B22F12/44 ,  B22F12/49 ,  G02B6/02004 ,  G02B6/0281 ,  G02B6/0288 ,  G02B6/0365 ,  G02B6/03616 ,  G02B6/03627 ,  G02B6/03633 ,  G02B6/03638 ,  G02B6/03688 ,  G02B6/262 ,  G02B6/4296 ,  G02B26/101 ,  G02B2006/12121 ,  G02F1/0151

Abstract: Disclosed herein are methods, apparatus, and systems for providing an optical beam delivery system, comprising an optical fiber including a first length of fiber comprising a first RIP formed to enable, at least in part, modification of one or more beam characteristics of an optical beam by a perturbation assembly arranged to modify the one or more beam characteristics, the perturbation assembly coupled to the first length of fiber or integral with the first length of fiber, or a combination thereof and a second length of fiber coupled to the first length of fiber and having a second RIP formed to preserve at least a portion of the one or more beam characteristics of the optical beam modified by the perturbation assembly within one or more first confinement regions. The optical beam delivery system may include an optical system coupled to the second length of fiber including one or more free-space optics configured to receive and transmit an optical beam comprising the modified one or more beam characteristics.