Porous low k(<2.0) thin film derived from homo-transport-polymerization
    3.
    发明授权
    Porous low k(<2.0) thin film derived from homo-transport-polymerization 失效
    来自均匀转移聚合的多孔低k(<2.0)薄膜

    公开(公告)号:US07026052B2

    公开(公告)日:2006-04-11

    申请号:US10265281

    申请日:2002-10-04

    IPC分类号: B32B3/00 B32B27/00

    摘要: The present invention pertains to a processing method to produce a porous polymer film that consists of sp2C—X and HC-sp3Cα—X bonds (wherein, X═H or F), and exhibits at least a crystal melting temperature, (“Tm”). The porous polymer films produced by this invention are useful for fabricating future integrated circuits (“IC's”). The method described herein is useful for preparing the porous polymer films by polymerizing reactive intermediates, formed from a first-precursor, with a low feed rate and at temperatures equal to or below a melting temperature of intermediate (T1m). Second-precursors that do not become reactive intermediates or have an incomplete conversion to reactive intermediates are also transported to a deposition chamber and become an inclusion of the deposited film. By utilizing a subsequent in-situ, post treatment process the inclusions in the deposited film can be removed to leave micro-pores in the resultant film. Annealing methods are used herein to stabilize the polymer films after reactive plasma etching. Furthermore, the present invention pertains to employment of reductive plasma conditions for patterning polymer films that consist of sp2C—X and HC-sp3Cα—X bonds (wherein, X═H, F).

    摘要翻译: 本发明涉及一种制备多孔聚合物膜的处理方法,该多孔聚合物膜由sp2C2和HC-sp3-α-X-X 键(其中,XH或F),并且表现出至少一种结晶熔融温度(“T”m“)。 本发明生产的多孔聚合物薄膜可用于制造未来的集成电路(“IC”)。 本文所述的方法可用于通过聚合由第一前体形成的反应性中间体以低进料速率和等于或低于中间体的熔融温度(T 1 SUP)的温度来制备多孔聚合物膜 > )。 不成为反应性中间体或具有不完全转化为反应性中间体的第二前体也被输送到沉积室并变成沉积膜的包含物。 通过利用随后的原位后处理工艺,可以除去沉积膜中的夹杂物以在所得膜中留下微孔。 本文使用退火方法来稳定反应性等离子体蚀刻后的聚合物膜。 此外,本发明涉及用于构图聚合物薄膜的还原等离子体条件的使用,所述薄膜由sp2S2C和HC-Ⅲ' -X键(其中,XH,F)。

    Device for the synthesis of dimeric species
    7.
    发明授权
    Device for the synthesis of dimeric species 失效
    用于合成二聚物种的装置

    公开(公告)号:US5862448A

    公开(公告)日:1999-01-19

    申请号:US639206

    申请日:1996-04-26

    摘要: A compact, continuous-flow synthesis device for the production of dimeric hydrocarbon species by reacting unsaturated hydrocarbons such as alkenes and alkynes with atomic hydrogen or free radicals generated by the dissociation of molecular hydrogen or organics such as alkanes. The dissociation is carried out in a module either by the electric discharge between a pair of parallel, annular, flat disc, high-voltage electrodes or by the radiation between a pair of parallel, toroidal ultraviolet lamps. The reactant to be dissociated flows radially inward from the module periphery between the pair of electrodes or the pair of ultraviolet lamps, and reaches the axis of the annulus or torus in the dissociated state. Unsaturated hydrocarbons in the dispersed phase injected vertically down this axis react with the dissociated species in a collision chamber surrounding the dissociation module to form residual free radicals. Cooling the residual free radicals then converts them to condensed dimeric products in a collection basin adjacent to the collision chamber. Many dimeric species, such as 2,2,3,3-tetramethylbutane, can be produced from different starting materials. The device also generates dimeric products from the reaction of free radicals alone in the absence of unsaturated hydrocarbons.

    摘要翻译: 一种用于通过使不饱和烃如烯烃和炔烃与原子氢或通过解离分子氢或有机物如烷烃产生的自由基反应来生产二聚烃物质的紧凑型连续流合成装置。 解离通过一对平行,环形,平坦的盘,高压电极之间的放电或通过一对平行的环形紫外线灯之间的辐射在模块中进行。 要离解的反应物从一对电极或一对紫外线灯之间的模块周边径向向内流动,并且在解离状态下到达环形或环面的轴线。 在垂直向下注入该轴的分散相中的不饱和烃与解离模块周围的碰撞室中的离解物质反应,形成残留的自由基。 然后冷却剩余的自由基,然后将它们转化成邻近碰撞室的收集池中的缩合二聚体产物。 许多二聚物质,如2,2,3,3-四甲基丁烷,可以由不同的起始原料生产。 该装置还在不存在不饱和烃的情况下,仅从自由基的反应产生二聚产物。