公开(公告)号：US20180258243A1

公开(公告)日：2018-09-13

申请号：US15455208

申请日：2017-03-10

Applicant: Hong Kong Applied Science and Technology Research Institute Company Limited

Inventor： Wenwei Zheng ,  Hailong Wu ,  Yaofeng Sun

IPC: C08J5/12 ,  B05D1/18 ,  B05D3/00 ,  C09J4/06

CPC classification number: C08J5/124 ,  B05D1/18 ,  B05D3/007 ,  B05D3/10 ,  C08J5/12 ,  C08J2365/04 ,  C08J2443/04 ,  C09J4/00 ,  C09J4/06 ,  H05K1/00

Abstract: The invention provides a composition for adhering one or more polymers to a substrate. The composition comprises at least one first compound adapted to be coated on a surface of the substrate. The first compound comprises one or more first units each having at least one functional group adapted to chemically react with at least one monomer to form the one or more polymers. Said composition also comprises at least one second compound adapted to be coated on the surface of the substrate. The second compound comprising one or more second units interspersed among the one or more first units of the first compound. Each of the one or more second units is not chemically reactive to the at least one monomer. The invention also provides a method of preparing a polymer coated surface on a substrate using the composition described.

公开(公告)号：US20040255862A1

公开(公告)日：2004-12-23

申请号：US10854776

申请日：2004-05-25

Inventor： Chung J. Lee ,  Atul Kumar ,  Chieh Chen

IPC: C23C016/00

CPC classification number: H01L23/5329 ,  B01J19/123 ,  B01J19/1887 ,  B01J2219/00153 ,  B01J2219/00159 ,  B01J2219/0879 ,  B05D1/007 ,  B05D1/60 ,  B05D3/0254 ,  B05D3/061 ,  B05D3/062 ,  B29C71/02 ,  B29C2071/022 ,  B29C2071/025 ,  B29C2071/027 ,  C08G61/02 ,  C08G61/025 ,  C08G2261/3424 ,  C08J5/18 ,  C08J2365/04 ,  C08L65/00 ,  C08L65/04 ,  C23C16/452 ,  F28D17/005 ,  H01L21/0212 ,  H01L21/02263 ,  H01L21/312 ,  H01L21/3127 ,  H01L23/53238 ,  H01L2924/0002 ,  H01L2924/09701 ,  H01L2924/00

Abstract: A reactor for removing a leaving group from a precursor molecule for a transport polymerization process is disclosed, wherein the reactor includes an exterior unit having an inlet, an outlet, and an interior disposed between the inlet and the outlet, where precursors enter the reactor at the inlet, are converted to a reactive intermediates within the interior, and wherein the reactive intermediates exit at the outlet, and wherein the interior is under a vacuum for at least a duration; a heater body located in said interior, wherein the heater body is at least partially conductively insulated from said reactor; and an energy source coupled outside said reactor for providing energy to said heater body via radiative heat transfer.

Abstract translation: 公开了一种用于从用于运输聚合方法的前体分子除去离去基团的反应器，其中反应器包括具有入口，出口和设置在入口和出口之间的内部的外部单元，其中前体进入反应器 所述入口在内部被转化为反应性中间体，并且其中所述反应性中间体在所述出口处离开，并且其中所述内部处于真空下至少持续一段时间; 位于所述内部的加热器主体，其中所述加热器主体至少部分地与所述反应器导电绝缘; 以及耦合在所述反应器外部的能量源，用于经由辐射热传递向所述加热器主体提供能量。

公开(公告)号：US4176209A

公开(公告)日：1979-11-27

申请号：US868159

申请日：1978-01-09

Applicant: Thomas E. Baker ,  George L. Fix ,  John S. Judge

Inventor： Thomas E. Baker ,  George L. Fix ,  John S. Judge

IPC: B05D7/24 ,  C08G61/02 ,  C08J3/20 ,  C23C11/00 ,  C23C13/00

CPC classification number: B05D1/60 ,  C08G61/025 ,  C08J3/20 ,  C08G2261/3424 ,  C08J2365/04

Abstract: Polymeric paraxylylene coatings and films possessing significantly improved oxidation resistance, particularly at elevated temperatures, are disclosed as well as a process for their preparation wherein certain antioxidants are vaporized and codeposited with vaporous poly(paraxylylene) precursors onto a substrate.

Abstract translation: 公开了具有显着改善的耐氧化性的聚合物对二甲苯涂层和膜，特别是在升高的温度下，以及其制备方法，其中某些抗氧化剂被气相聚（对二甲苯）前体蒸发并共沉积到基底上。

公开(公告)号：US3503903A

公开(公告)日：1970-03-31

申请号：US3503903D

申请日：1969-01-13

Applicant: UNION CARBIDE CORP

Inventor： SHAW RICHARD G ,  YEH YING L ,  LEWIS JOSEPH W

IPC: C08G61/02 ,  C08F13/02

CPC classification number: C08J7/08 ,  C08G61/025 ,  C08G2261/3424 ,  C08J2365/04

公开(公告)号：US20070119369A1

公开(公告)日：2007-05-31

申请号：US11642383

申请日：2006-12-19

Applicant: Chung Lee ,  Atul Kumar ,  Chieh Chen

Inventor： Chung Lee ,  Atul Kumar ,  Chieh Chen

IPC: C23C16/00

CPC classification number: H01L23/5329 ,  B01J19/123 ,  B01J19/1887 ,  B01J2219/00153 ,  B01J2219/00159 ,  B01J2219/0879 ,  B05D1/007 ,  B05D1/60 ,  B05D3/0254 ,  B05D3/061 ,  B05D3/062 ,  B29C71/02 ,  B29C2071/022 ,  B29C2071/025 ,  B29C2071/027 ,  C08G61/02 ,  C08G61/025 ,  C08G2261/3424 ,  C08J5/18 ,  C08J2365/04 ,  C08L65/00 ,  C08L65/04 ,  C23C16/452 ,  F28D17/005 ,  H01L21/0212 ,  H01L21/02263 ,  H01L21/312 ,  H01L21/3127 ,  H01L23/53238 ,  H01L2924/0002 ,  H01L2924/09701 ,  H01L2924/00

Abstract: A method of producing a reactive intermediate having at least two free radicals from a precursor having a general formula of Xm—Ar—(CZ′Z″Y)n via a reactor made at least partially of a material M that is reactive with the precursor to produce at least one of MaYb and McXd is disclosed. The method comprises heating the reactor, introducing a flow of precursor into the reactor, contacting the precursor with the material M to form the reactive intermediate and at least one of MaYb and McXd, and reducing MaYb to M and a compound comprising Y and/or reducing McXd to M and a compound comprising X after forming the reactive intermediate and the at least one of MaYb and McXd.

Abstract translation: 一种制备具有至少两个自由基的反应性中间体的方法，所述反应性中间体具有通式X a -Ar-（CZ'Z“Y”）n前体的前体经由 至少部分由材料M制成的反应器，该反应器与前体反应以产生至少一个M a，B和M c， 公开了X 。 该方法包括加热反应器，将前体流引入反应器中，将前体与材料M接触以形成反应性中间体，以及至少一种M a 并且将M和M和包含Y和/或C的化合物还原成M和包含Y和/ 或者在形成反应性中间体之后还原M和包含X的化合物，以及至少一个M a > b＆lt;＆gt;和＆lt;＆lt; C＆gt;＆lt; d＆gt;

公开(公告)号：US20050274322A1

公开(公告)日：2005-12-15

申请号：US11155209

申请日：2005-06-16

Applicant: Chung Lee ,  Atul Kumar ,  Chieh Chen

Inventor： Chung Lee ,  Atul Kumar ,  Chieh Chen

IPC: B01J19/12 ,  B01J19/18 ,  B05D1/00 ,  B05D3/02 ,  B05D3/06 ,  B05D7/24 ,  B29C71/02 ,  C08G61/02 ,  C08J5/18 ,  C08L65/00 ,  C08L65/04 ,  C23C16/452 ,  F28D17/00 ,  H01L21/312 ,  H01L21/768 ,  H01L23/532 ,  C23C16/00

CPC classification number: B01J19/123 ,  B01J19/1887 ,  B01J2219/00153 ,  B01J2219/00159 ,  B01J2219/0879 ,  B05D1/007 ,  B05D1/60 ,  B05D3/0254 ,  B05D3/061 ,  B05D3/062 ,  B29C71/02 ,  B29C2071/022 ,  B29C2071/025 ,  B29C2071/027 ,  C08G61/02 ,  C08G61/025 ,  C08G2261/3424 ,  C08J5/18 ,  C08J2365/04 ,  C08L65/00 ,  C08L65/04 ,  C23C16/452 ,  F28D17/005 ,  H01L21/0212 ,  H01L21/02271 ,  H01L21/312 ,  H01L21/3127 ,  H01L23/53238 ,  H01L23/5329 ,  H01L2924/0002 ,  H01L2924/09701 ,  H01L2924/12044 ,  H01L2924/00

Abstract: A reactor for forming a reactive intermediate for a transport polymerization process is disclosed, wherein the reactor includes an exterior unit having an inlet, an outlet, and an interior disposed between the inlet and the outlet; a heater body located in said interior, wherein the heater body is at least partially conductively insulated from said reactor; an energy source coupled outside said reactor for providing energy to said heater body via radiative heat transfer; and an interior surface located in the interior, wherein the interior surface is at least partially formed from a material M that reacts with at least one of X and Y to remove at least one of X and Y from the precursor thereby forming the reactive intermediate and at least one of a compound MaYb and a compound McXd.

Abstract translation: 公开了一种用于形成用于运输聚合方法的反应性中间体的反应器，其中所述反应器包括具有入口，出口和设置在所述入口和所述出口之间的内部的外部单元; 位于所述内部的加热器主体，其中所述加热器主体至少部分地与所述反应器导电绝缘; 耦合在所述反应器外部的能量源，用于经由辐射热传递向所述加热器主体提供能量; 以及位于所述内部的内表面，其中所述内表面至少部分地由与所述X和Y中的至少一个反应的材料M形成，以从所述前体中除去X和Y中的至少一个，从而形成所述反应性中间体， 化合物M a a B b和化合物M C x D 2中的至少一个。

公开(公告)号：US06855419B2

公开(公告)日：2005-02-15

申请号：US10145738

申请日：2002-05-16

Applicant: Eiichi Nakamura ,  Kenichi Shibayama ,  Hiroshi Maruyama ,  Takashi Inoue

Inventor： Eiichi Nakamura ,  Kenichi Shibayama ,  Hiroshi Maruyama ,  Takashi Inoue

IPC: B05D7/24 ,  C08G61/02 ,  C08J5/18 ,  B32B19/00 ,  B32B9/04

CPC classification number: B05D1/60 ,  C08G61/02 ,  C08G61/025 ,  C08G2261/3424 ,  C08J5/18 ,  C08J2365/04 ,  Y10T428/29 ,  Y10T428/31504

Abstract: This invention attempts to provide a method for producing a DNA chip which can be accomplished in simple steps at a low cost, and wherein use of the resulting DNA chip reduces loss of probes and sample substances in the washing step enabling efficient use of such probe and sample. This invention also attempts to provide a DNA chip produced by such method. Accordingly, a method for producing a DNA chip comprising a substrate and a DNA-binding layer formed on the substrate wherein said DNA-binding layer is a diamond like film having a DNA-binding group is provided, and this method comprises the steps of: reducing pressure of a vacuum chamber to a predetermined degree of vacuum; feeding the chamber with a gas which is the source of said diamond like film; feeding the chamber with a gas which is the source of nitrogen; and forming the diamond like film having a DNA-binding group on the substrate by CVD. Also provided is the DNA chip produced by such method.

Abstract translation: 本发明试图提供可以以简单的步骤以低成本实现的DNA芯片的制造方法，其中使用所得到的DNA芯片减少洗涤步骤中的探针和样品物质的损失，从而有效地利用这种探针， 样品。 本发明还试图提供通过这种方法制备的DNA芯片。 因此，提供了包含底物和DNA结合层的DNA芯片的制造方法，其中所述DNA结合层是具有DNA结合基团的类金刚石膜，该方法包括以下步骤： 将真空室的压力降低到预定的真空度; 用作为所述金刚石膜的来源的气体供给室; 用作为氮源的气体供给室; 并通过CVD在基板上形成具有DNA结合基团的金刚石膜。 还提供了通过这种方法制备的DNA芯片。

公开(公告)号：US20030072947A1

公开(公告)日：2003-04-17

申请号：US10207652

申请日：2002-07-29

Applicant: DIELECTRIC SYSTEMS, INC.

Inventor： Chung J. Lee ,  Atul Kumar

IPC: B05D003/02 ,  B05D003/00 ,  C08F012/20

CPC classification number: H01L23/5329 ,  B01J19/123 ,  B01J19/1887 ,  B01J2219/00153 ,  B01J2219/00159 ,  B01J2219/0879 ,  B05D1/007 ,  B05D1/60 ,  B05D3/0254 ,  B05D3/061 ,  B05D3/062 ,  B29C71/02 ,  B29C2071/022 ,  B29C2071/025 ,  B29C2071/027 ,  C08G61/02 ,  C08G61/025 ,  C08G2261/3424 ,  C08J5/18 ,  C08J2365/04 ,  C08L65/00 ,  C08L65/04 ,  C23C16/452 ,  F28D17/005 ,  H01L21/0212 ,  H01L21/02203 ,  H01L21/02263 ,  H01L21/312 ,  H01L21/3127 ,  H01L23/53238 ,  H01L2924/0002 ,  Y10T428/31504 ,  Y10T428/3154 ,  Y10T428/31855 ,  H01L2924/00

Abstract: Methods and products of Transport co-polymerization (nullTCPnull) that are useful for preparations of low Dielectric Constant (nullnullnull) thin films are disclosed. Transport co-polymerization (nullTCPnull) of reactive intermediates that are generated from a first precursor with a general structural formula (Z)mnullArnull(CXnullXnullY)n (VI) with a second reactive intermediate that is generated from a cage compound (e.g. Fullerenes, Methylsilsesquioxane, Hydrosilsesquioxane, and Adamantanyl) or a cyclic-compounds (e.g. Cyclo-Siloxanes and 2,2-Paracyclophanes) results in co-polymer films that are useful for making porous low null (null2.0) thin films. The porous thin films of this invention consist of nano-pores with uniform pore distribution thus retain high rigidity thus are suitable for manufacturing of future ICs using copper as conductor. Preparation methods and stabilization processes for low k co-polymers that consist of sp2CnullZ and HC-sp3CnullnullX bonds are also revealed. A preparation method is achieved by controlling the substrate temperature and feed rate of the major precursors. One stabilization process includes a post annealing of as-deposited co-polymer films under the presence of hydrogen under high temperatures. The reductive annealing of these films is conducted at temperatures from null20null C. to null50null C. to null20null C. to null50null C. of their Reversible Crystal Transformation (nullCRTnull) temperatures, then quenching the resulting films to null20null C. to null50null C. below their nullCRTnull temperatures. The reductive annealing is conducted before the as-deposited film was removed from a deposition system and still under the vacuum. nullRe-stabilizationnull processes of co-polymer surfaces that are exposed to reactive plasma etching are also disclosed; thus, further coating by barrier metal, cap layer or etch-stop layer can be safely applied.

Abstract translation: 公开了用于制备低介电常数（“epsi”）薄膜的运输共聚（“TCP”）的方法和产品。 由具有一般结构式（Z）m-Ar-（CX'X'Y）n（VI）的第一前体产生的反应性中间体的传输共聚（“TCP”）与第二反应性中间体 由笼状化合物（例如富勒烯，甲基倍半硅氧烷，氢四倍半硅氧烷和金刚烷基）或环状化合物（例如环硅氧烷和2,2-对环磷酰胺）产生的共聚物膜可用于制备多孔低ε（< 2.0）薄膜。 本发明的多孔薄膜由具有均匀孔分布的纳米孔组成，因此保持高刚性，因此适用于使用铜作为导体的未来IC的制造。 还显示了由sp2C-Z和HC-sp3Calpha-X键组成的低k共聚物的制备方法和稳定方法。 通过控制主要前体的基板温度和进料速率来实现制备方法。 一种稳定化方法包括在氢气存在下在高温下对沉积的共聚物膜进行后退火。 这些膜的还原退火在其可逆晶体转变（“CRT”）温度的-20℃至-50℃至+ 20℃至+ 50℃的温度下进行，然后淬灭所得 在-20℃至-50℃的温度下低于它们的“CRT”温度。 还原退火在沉积膜从沉积系统中移除之前仍然在真空下进行。 还公开了暴露于反应性等离子体蚀刻的共聚物表面的“再稳定化”工艺; 因此，可以安全地施加通过阻挡金属，盖层或蚀刻停止层的进一步涂覆。

公开(公告)号：US20030012956A1

公开(公告)日：2003-01-16

申请号：US10145738

申请日：2002-05-16

Applicant: KISHIMOTO SANGYO CO., LTD.

Inventor： Eiichi Nakamura ,  Kenichi Shibayama ,  Hiroshi Maruyama ,  Takashi Inoue

IPC: C23C016/00 ,  B32B009/04

CPC classification number: B05D1/60 ,  C08G61/02 ,  C08G61/025 ,  C08G2261/3424 ,  C08J5/18 ,  C08J2365/04 ,  Y10T428/29 ,  Y10T428/31504

Abstract: This invention provides a polymer thin film which is useful as a substrate for immobilizing a histocompatibility-imparting agent, an immunosuppressive agent, a bioreaction suppressive agent, or the like, and which can be used in imparting biocompatibility; its production method; a binder for a bio chip wherein loss of probe and sample substances in the washing step has been reduced to realize efficient use of such probe and sample; and its production method. In the present invention, the starting material represented by the following structural formula (I) is evaporated and heated to bring the material into monomer form. The material is then introduced into a vacuum deposition chamber maintained at a predetermined degree of vacuum wherein the material is deposited and polymerized on a substrate to obtain the polymer thin film. This polymer thin film is also used in producing the bio chip. 1 wherein R11 and R12 independently represent nullCH2NH2 group or H, and at least one of the R11 and R12 is nullCH2NH2 group.

Abstract translation: 本发明提供了可用作固定组织相容性赋予剂，免疫抑制剂，生物反应抑制剂等的基质的聚合物薄膜，其可用于赋予生物相容性; 其生产方式; 用于生物芯片的粘合剂，其中已经减少了洗涤步骤中的探针和样品物质的损失，以实现这种探针和样品的有效利用; 及其生产方法。 在本发明中，将由以下结构式（I）表示的原料蒸发并加热以使材料成为单体形式。 然后将材料引入保持在预定真空度的真空沉积室中，其中将材料沉积并聚合在基材上以获得聚合物薄膜。 该聚合物薄膜也用于制造生物芯片。 其中R 11和R 12独立地表示-CH 2 NH 2基或H，并且R 11和R 12中的至少一个是-CH 2 NH 2基。

公开(公告)号：US3940530A

公开(公告)日：1976-02-24

申请号：US527159

申请日：1974-11-25

Applicant: William E. Loeb ,  Mark A. Spivack

Inventor： William E. Loeb ,  Mark A. Spivack

IPC: C08G61/02 ,  C08J7/06 ,  C09K3/24 ,  B32B3/16 ,  B32B5/16 ,  G01N3/56

CPC classification number: C08J7/06 ,  C08G61/025 ,  C09K3/24 ,  C08G2261/3424 ,  C08J2365/04 ,  Y10T428/24893 ,  Y10T428/25 ,  Y10T428/252 ,  Y10T428/254 ,  Y10T428/268 ,  Y10T428/269 ,  Y10T428/2982 ,  Y10T428/31855

Abstract: Pellicles of para-xylylene polymers are used as the sole support media for masses of objects supported thereon. The supported objects can be combined with the pellicle either during the formation of the pellicle or after the pellicle has been manufactured. The composite article is used wherever it is desirable to provide a support media which has as little detrimental influence as possible on the intended function of the supported object.

Abstract translation: 对二甲苯聚合物的薄膜用作支撑在其上的物体的唯一支撑介质。 支撑物体可以在防护薄膜组件形成过程中或防护薄膜组件制造后与防护薄膜组合。 复合制品被用于需要提供一种对所支撑的物体的预期功能尽可能少的不利影响的支撑介质。