-
公开(公告)号：US11888063B2
公开(公告)日：2024-01-30
申请号：US17862961
申请日：2022-07-12
发明人： Weonhong Kim , Wandon Kim , Hyeonjun Baek , Sangjin Hyun
IPC分类号： H01L29/78 , H01L29/06 , H01L29/423 , H01L29/49 , H01L29/51 , H01L29/66 , H01L29/786 , H01L21/28
CPC分类号： H01L29/78391 , H01L21/28088 , H01L29/0673 , H01L29/40111 , H01L29/42392 , H01L29/4908 , H01L29/4966 , H01L29/516 , H01L29/6684 , H01L29/7851 , H01L29/78696
摘要： A semiconductor device includes a substrate including an active pattern, a gate electrode crossing the active pattern in a plan view, and a ferroelectric pattern interposed between the active pattern and the gate electrode. The gate electrode includes a work function metal pattern disposed on the ferroelectric pattern, and an electrode pattern filling a recess formed in an upper portion of the work function metal pattern. A top surface of a topmost portion of the ferroelectric pattern is lower than a bottom surface of the recess.
-
公开(公告)号：US20230164994A1
公开(公告)日：2023-05-25
申请号：US18150523
申请日：2023-01-05
发明人： Seungha OH , Weonhong Kim , Hoonjoo Na
摘要： A three-dimensional semiconductor device includes a first substrate; a plurality of first transistors on the first substrate; a second substrate on the plurality of first transistors; a plurality of second transistors on the second substrate; and an interconnection portion electrically connecting the plurality of first transistors and the plurality of second transistors. Each of the plurality of first transistors includes a first gate insulating film on the first substrate and having a first hydrogen content. Each of the plurality of second transistors includes a second gate insulating film on the second substrate and having a second hydrogen content. The second hydrogen content is greater than the first hydrogen content.
-
公开(公告)号：US11411106B2
公开(公告)日：2022-08-09
申请号：US17176248
申请日：2021-02-16
发明人： Weonhong Kim , Wandon Kim , Hyeonjun Baek , Sangjin Hyun
IPC分类号： H01L29/78 , H01L29/51 , H01L29/49 , H01L21/28 , H01L29/66 , H01L29/423 , H01L29/786 , H01L29/06
摘要： A semiconductor device includes a substrate including an active pattern, a gate electrode crossing the active pattern in a plan view, and a ferroelectric pattern interposed between the active pattern and the gate electrode. The gate electrode includes a work function metal pattern disposed on the ferroelectric pattern, and an electrode pattern filling a recess formed in an upper portion of the work function metal pattern. A top surface of a topmost portion of the ferroelectric pattern is lower than a bottom surface of the recess.
-
公开(公告)号：US11728347B2
公开(公告)日：2023-08-15
申请号：US17494275
申请日：2021-10-05
发明人： Weonhong Kim , Pilkyu Kang , Yuichiro Sasaki , Sungkeun Lim , Yongho Ha , Sangjin Hyun , Kughwan Kim , Seungha Oh
IPC分类号： H01L27/12 , H01L21/762 , H01L27/02 , H01L29/78
CPC分类号： H01L27/1203 , H01L21/76224 , H01L27/0203 , H01L27/02 , H01L29/78
摘要： An integrated circuit device includes an embedded insulation layer, a semiconductor layer on the embedded insulation layer, the semiconductor layer having a main surface, and a plurality of fin-type active areas protruding from the main surface to extend in a first horizontal direction and in parallel with one another, a separation insulation layer separating the semiconductor layer into at least two element regions adjacent to each other in a second horizontal direction intersecting the first horizontal direction, source/drain regions on the plurality of fin-type active areas, a first conductive plug on and electrically connected to the source/drain regions, a buried rail electrically connected to the first conductive plug while penetrating through the separation insulation layer and the semiconductor layer, and a power delivery structure arranged in the embedded insulation layer, the power delivery structure being in contact with and electrically connected to the buried rail.
-
公开(公告)号：US10985275B2
公开(公告)日：2021-04-20
申请号：US16503790
申请日：2019-07-05
发明人： Weonhong Kim , Wandon Kim , Hyeonjun Baek , Sangjin Hyun
IPC分类号： H01L29/78 , H01L21/28 , H01L29/06 , H01L29/423 , H01L29/49 , H01L29/51 , H01L29/66 , H01L29/786
摘要： A semiconductor device includes a substrate including an active pattern, a gate electrode crossing the active pattern in a plan view, and a ferroelectric pattern interposed between the active pattern and the gate electrode. The gate electrode includes a work function metal pattern disposed on the ferroelectric pattern, and an electrode pattern filling a recess formed in an upper portion of the work function metal pattern. A top surface of a topmost portion of the ferroelectric pattern is lower than a bottom surface of the recess.
-
公开(公告)号：US10950709B2
公开(公告)日：2021-03-16
申请号：US16458412
申请日：2019-07-01
发明人： Jeonghyuk Yim , Wandon Kim , Weonhong Kim , Jongho Park , Hyeonjun Baek , Byounghoon Lee , Sangjin Hyun
IPC分类号： H01L29/78 , H01L27/092 , H01L29/06 , H01L29/423 , H01L29/49 , H01L29/786 , H01L29/51 , H01L21/28 , H01L29/66 , H01L21/8238 , H01L29/08
摘要： A semiconductor device includes a substrate including first and second active regions, first and second active patterns disposed on the first and second active regions, respectively, first and second gate electrodes crossing the first and second active patterns, respectively, a first gate insulating pattern interposed between the first active pattern and the first gate electrode, and a second gate insulating pattern interposed between the second active pattern and the second gate electrode. The first gate insulating pattern includes a first dielectric pattern and a first ferroelectric pattern disposed on the first dielectric pattern. The second gate insulating pattern includes a second dielectric pattern. A threshold voltage of a transistor in the first active region is different from a threshold voltage of a transistor in the second active region.
-
公开(公告)号：US11901356B2
公开(公告)日：2024-02-13
申请号：US16817069
申请日：2020-03-12
发明人： Seungha Oh , Pil-Kyu Kang , Kughwan Kim , Weonhong Kim , Yuichiro Sasaki , Sang Woo Lee , Sungkeun Lim , Yongho Ha , Sangjin Hyun
CPC分类号： H01L27/0688 , H01L23/481 , H10B41/60 , H10B43/20 , H10B63/30 , H10B63/84
摘要： A three-dimensional semiconductor device includes a lower substrate, a plurality of lower transistors disposed on the lower substrate, an upper substrate disposed on the lower transistors, a plurality of lower conductive lines disposed between the lower transistors and the upper substrate, and a plurality of upper transistors disposed on the upper substrate. At least one of the lower transistors is connected to a corresponding one of the lower conductive lines. Each of the upper transistors includes an upper gate electrode disposed on the upper substrate, a first upper source/drain pattern disposed in the upper substrate at a first side of the upper gate electrode, and a second upper source/drain pattern disposed in the upper substrate at a second, opposing side of the upper gate electrode. The upper gate electrode includes silicon germanium (SiGe).
-
公开(公告)号：US11610838B2
公开(公告)日：2023-03-21
申请号：US17367773
申请日：2021-07-06
发明人： Yuichiro Sasaki , Sungkeun Lim , Pil-Kyu Kang , Weonhong Kim , Seungha Oh , Yongho Ha , Sangjin Hyun
IPC分类号： H01L23/522 , H01L23/50 , H01L23/528
摘要： A semiconductor device includes a semiconductor layer having a first surface and a second surface opposite to the first surface, an active pattern on the first surface, the active pattern including a source/drain region, a power rail electrically connected to the source/drain region, and a power delivery network on the second surface, the power delivery network electrically connected to the power rail. The semiconductor layer includes an etch stop dopant, and the etch stop dopant has a maximum concentration at the second surface.
-
公开(公告)号：US11552096B2
公开(公告)日：2023-01-10
申请号：US17160874
申请日：2021-01-28
发明人： Seungha Oh , Weonhong Kim , Hoonjoo Na
IPC分类号： H01L27/11578 , H01L27/11524 , H01L27/088 , H01L27/11519 , H01L27/108 , H01L27/11565 , H01L27/1157 , H01L27/11551
摘要： A three-dimensional semiconductor device includes a first substrate; a plurality of first transistors on the first substrate; a second substrate on the plurality of first transistors; a plurality of second transistors on the second substrate; and an interconnection portion electrically connecting the plurality of first transistors and the plurality of second transistors. Each of the plurality of first transistors includes a first gate insulating film on the first substrate and having a first hydrogen content. Each of the plurality of second transistors includes a second gate insulating film on the second substrate and having a second hydrogen content. The second hydrogen content is greater than the first hydrogen content.
-
公开(公告)号：US11177286B2
公开(公告)日：2021-11-16
申请号：US16807410
申请日：2020-03-03
发明人： Weonhong Kim , Pilkyu Kang , Yuichiro Sasaki , Sungkeun Lim , Yongho Ha , Sangjin Hyun , Kughwan Kim , Seungha Oh
IPC分类号： H01L27/12 , H01L29/78 , H01L21/762 , H01L27/02
摘要： An integrated circuit device includes an embedded insulation layer, a semiconductor layer on the embedded insulation layer, the semiconductor layer having a main surface, and a plurality of fin-type active areas protruding from the main surface to extend in a first horizontal direction and in parallel with one another, a separation insulation layer separating the semiconductor layer into at least two element regions adjacent to each other in a second horizontal direction intersecting the first horizontal direction, source/drain regions on the plurality of fin-type active areas, a first conductive plug on and electrically connected to the source/drain regions, a buried rail electrically connected to the first conductive plug while penetrating through the separation insulation layer and the semiconductor layer, and a power delivery structure arranged in the embedded insulation layer, the power delivery structure being in contact with and electrically connected to the buried rail.
-
-
-
-
-
-
-
-
-
搜索结果
11 条记录 (耗时 0.018 秒)
