公开(公告)号：US20070236854A1

公开(公告)日：2007-10-11

申请号：US11279296

申请日：2006-04-11

申请人： Martin Lee ,  Bausan Yuan ,  Susumu Makinouchi

发明人： Martin Lee ,  Bausan Yuan ,  Susumu Makinouchi

IPC分类号： H01H47/00

CPC分类号： G03F7/709 ,  G03F7/70716

摘要： Methods and apparatus for supporting the weight of a first stage of a stage apparatus using magnets are disclosed. According to one aspect of the present invention, and apparatus includes a first structure, a second structure, and an anti-gravity device. The anti-gravity device has a first magnet and a piston arrangement that includes a second magnet. The first magnet is coupled to the first structure, and the piston arrangement is movably interfaced with the second structure through an air bearing. The first magnet and the piston arrangement cooperate to support the first structure over the second structure relative to a vertical axis.

摘要翻译： 公开了一种用于支撑使用磁体的平台装置的第一级的重量的方法和装置。 根据本发明的一个方面，并且装置包括第一结构，第二结构和反重力装置。 反重力装置具有包括第二磁体的第一磁体和活塞装置。 第一磁体联接到第一结构，并且活塞装置通过空气轴承与第二结构可移动地接合。 第一磁体和活塞装置配合以相对于垂直轴线支撑第二结构的第一结构。

公开(公告)号：US20070097340A1

公开(公告)日：2007-05-03

申请号：US11262882

申请日：2005-10-31

申请人： Bausan Yuan ,  Ping-Wei Chang ,  Ryoichi Kawaguchi ,  Kazuo Masaki ,  Susumu Makinouchi ,  Ting-Chien Teng

发明人： Bausan Yuan ,  Ping-Wei Chang ,  Ryoichi Kawaguchi ,  Kazuo Masaki ,  Susumu Makinouchi ,  Ting-Chien Teng

IPC分类号： G03B27/42

CPC分类号： G03F7/709 ,  F16F7/1005 ,  G03F7/70766 ,  G03F7/70833

摘要： Methods and apparatus for actively damping vibrations associated with a optical assembly of a photolithographic system are disclosed. According to one aspect of the present invention, an assembly that provides damping to a structure of a photolithographic apparatus that is subject to structural oscillations includes a counter mass, an active mechanism, an a controller. The active mechanism is coupled to the structure, supports the counter mass, and applies a force to the structure to counteract structural oscillations in the structure. The controller controls the force applied by the active mechanism on the structure, and utilizes information associated with movement of the structure to control the force.

摘要翻译： 公开了用于主动衰减与光刻系统的光学组件相关的振动的方法和装置。 根据本发明的一个方面，一种对经受结构振荡的光刻设备的结构提供阻尼的组件包括反质量块，活动机构，控制器。 主动机构耦合到结构，支撑反质量，并向结构施加力以抵消结构中的结构振荡。 控制器控制主动机构施加在结构上的力，并利用与结构的运动相关联的信息来控制力。

公开(公告)号：US06260282B1

公开(公告)日：2001-07-17

申请号：US09049801

申请日：1998-03-27

申请人： Bausan Yuan ,  Susumu Makinouchi ,  Hideyaki Hashimoto

发明人： Bausan Yuan ,  Susumu Makinouchi ,  Hideyaki Hashimoto

IPC分类号： H01L2168

CPC分类号： G03F7/70358 ,  G03F7/70725

摘要： A positioning system used, by way of example, for lithography, uses the position of the wafer stage as the trajectory command for the reticle fine stage control circuit. The reticle fine stage position is combined with the position of the wafer stage to generate a synchronous error. The reticle fine stage control circuit uses a Jacobian differential transformation to convert the synchronous error into an positional error for the center of gravity of the reticle fine stage. Thus, any inaccuracies due to measurement errors caused by rotation of reticle fine stage are avoided. A controller filter circuit uses the positional error for the center of gravity to calculate the force on the center of gravity that will minimize the synchronous error. The controller filter circuit includes saturation limited integration behavior that minimizes the settling time. A feedforward loop also generates a feedforward force, which reduces settling time, and is combined with the force signal from the controller filter. A force coordinate transformation circuit receives the summed forces and calculates the forces to be generated by the actuators connected to reticle fine stage that will drive reticle fine stage to the desired position to reduce the synchronous error.

摘要翻译： 作为示例，用于光刻的定位系统使用晶片台的位置作为标线片精细级控制电路的轨迹指令。 标线片精细位置与晶片台的位置相结合以产生同步误差。 光栅精细级控制电路使用雅可比差分变换将同步误差转换为光罩精细级的重心的位置误差。 因此，避免了由于光罩精细台的旋转引起的测量误差导致的任何不准确。 控制器滤波器电路使用重心的位置误差来计算重心的力，这将使同步误差最小化。 控制器滤波器电路包括使稳定时间最小化的饱和有限积分行为。 前馈回路还产生一个前馈力，这减少了建立时间，并与来自控制器滤波器的力信号相结合。 力坐标变换电路接收累加力并计算由连接到标线片精细台的致动器产生的力，该致动器能将光栅精细级驱动到所需位置以减小同步误差。

公开(公告)号：US20050231706A1

公开(公告)日：2005-10-20

申请号：US10825022

申请日：2004-04-14

申请人： Pai-Hsueh Yang ,  Hideyuki Hashimoto ,  Bausan Yuan ,  Atsushi Yamaguchi ,  Susumu Makinouchi

发明人： Pai-Hsueh Yang ,  Hideyuki Hashimoto ,  Bausan Yuan ,  Atsushi Yamaguchi ,  Susumu Makinouchi

IPC分类号： G03B27/58 ,  G03F7/20

CPC分类号： G03F7/70725

摘要： Embodiments of the present invention are directed to a control system and method for controlling the trajectory and alignment of one or more stages by incorporating a grouping method in the control methodology. In one embodiment, a method of controlling movement of one or more stages of a precision assembly to process a substrate having a plurality of process regions comprises dividing the substrate into blocks according to one or more preset criteria, each block of the substrate including one or more process regions; generating learning data for one or more representative process regions for each block of the substrate; and using the generated learning data of the one or more representative process regions of each block to control movement of the one or more stages to process the block of one or more process regions of the substrate.

摘要翻译： 本发明的实施例涉及一种用于通过在控制方法中并入分组方法来控制一个或多个阶段的轨迹和对准的控制系统和方法。 在一个实施例中，一种控制精密组件的一个或多个阶段的运动以处理具有多个工艺区域的衬底的方法包括根据一个或多个预设标准将衬底划分成块，衬底的每个块包括一个或多个 更多的工艺区域; 为所述基板的每个块生成用于一个或多个代表性处理区域的学习数据; 以及使用所生成的每个块的一个或多个代表性处理区域的学习数据来控制所述一个或多个阶段的移动以处理所述衬底的一个或多个处理区域的块。

公开(公告)号：US08710425B2

公开(公告)日：2014-04-29

申请号：US13090659

申请日：2011-04-20

申请人： Susumu Makinouchi ,  Akihiro Watanabe

发明人： Susumu Makinouchi ,  Akihiro Watanabe

IPC分类号： G01D5/34

CPC分类号： G01D5/38 ,  G01D5/34746

摘要： An encoder emits modulated light from a light source section and lets a first light and a second light separated from the modulated light interfere with each other in a moving grating. In the encoder, the light emitted from the light source section is electrically modulated, and the first light and the second light have different light path lengths.

摘要翻译： 编码器发射来自光源部分的调制光，并使得与调制光分离的第一光和第二光在移动光栅中相互干扰。 在编码器中，从光源部发射的光被电调制，第一光和第二光具有不同的光路长度。

公开(公告)号：US08208128B2

公开(公告)日：2012-06-26

申请号：US12366934

申请日：2009-02-06

申请人： Susumu Makinouchi

发明人： Susumu Makinouchi

IPC分类号： G01B11/00 ,  G03B27/32 ,  G03B27/42 ,  G03B27/58 ,  G03B27/62

CPC分类号： G01D5/34746 ,  G01D5/38 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/7085

摘要： A mirror block on which moving gratings are arranged is fixed to the lower surface of a stage. Fixed gratings are placed on the upper surface of a stage platform that is opposed to the lower surface of the stage. A Y encoder that measures Y positional information of the stage is configured including the moving gratings and the fixed gratings. Similarly, an X encoder that measures X positional information of the stage is configured including the moving gratings and the fixed grating.

摘要翻译： 安置有移动光栅的镜块固定在舞台的下表面。 固定光栅放置在与平台的下表面相对的平台平台的上表面上。 测量台的Y位置信息的Y编码器被配置为包括移动光栅和固定光栅。 类似地，测量台阶X的位置信息的X编码器被配置成包括移动光栅和固定光栅。

公开(公告)号：US07601947B2

公开(公告)日：2009-10-13

申请号：US11798255

申请日：2007-05-11

申请人： Susumu Makinouchi ,  Toru Imai ,  Akihiro Watanabe

发明人： Susumu Makinouchi ,  Toru Imai ,  Akihiro Watanabe

IPC分类号： G01B9/02

CPC分类号： G01D5/38

摘要： When an incident light is obliquely incident on an index scale, the optical path length of light A becomes longer than the optical path length of light B and an optical path length difference occurs, which causes a phase difference in both of the diffracted lights incident on a photodetection element. According to the phase difference, intensity of a photoelectric detection signal output from the photodetection element changes. That is, due to a periodic change in the incident angle of the incident light, the phase difference between light A and light B is modulated, and the interference signal becomes greatly modulated.

摘要翻译： 当入射光倾斜地入射到指数刻度上时，光A的光程长度比光B的光路长度长，并且产生光程长度差，导致两个衍射光入射的相位差 光电检测元件。 根据相位差，从光检测元件输出的光电检测信号的强度变化。 也就是说，由于入射光的入射角度的周期性变化，光A和光B之间的相位差被调制，并且干扰信号变得很大地被调制。

公开(公告)号：US5907392A

公开(公告)日：1999-05-25

申请号：US682992

申请日：1996-07-18

申请人： Susumu Makinouchi

发明人： Susumu Makinouchi

IPC分类号： G03B27/42 ,  G03F7/20 ,  G01N21/86

CPC分类号： G03F7/70358 ,  G03B27/42 ,  G03F7/70725 ,  G03F7/70775

摘要： A scanning type exposure apparatus includes a mask stage position-measuring unite a substrate stage position-measuring unit, an arithmetic processing unit, and a control unit. The arithmetic processing unit multiplies results of measurement (WX, WY, W.theta.) by the substrate position-measuring unit by a conversion vector including components containing a magnification of a projection optical system and an angle of rotation between a mask and a substrate to determine a target vector quantity (RX*, RY*, R.theta.*) of a mask stage. An error vector is determined by subtracting, from the target vector quantity, results of measurement (RX, RY, R.theta.) by the mask stage position-measuring unit. The controller controls the mask stage so that the error vector becomes zero. The exposure apparatus includes correcting sections for correcting time lags in measurement by the respective position-measuring units. The arithmetic processing unit uses corrected positional information. The mask stage can accurately follow a substrate stage.

摘要翻译： 扫描型曝光装置包括掩模台位置测量，联合基板台位置测量单元，运算处理单元和控制单元。 算术处理单元通过包括投影光学系统的放大率和掩模与基板之间的旋转角度的分量的转换矢量将测量结果（WX，WY，Wθ）相乘，以确定 掩模台的目标矢量（RX *，RY *，Rθ*）。 通过从掩模台位置测量单元从目标矢量量中减去测量结果（RX，RY，Rθ）来确定误差向量。 控制器控制掩模级，使得误差向量变为零。 曝光装置包括用于通过各个位置测量单元来校正测量中的时间滞后的校正部分。 算术处理单元使用校正的位置信息。 掩模阶段可以准确地跟随衬底阶段。

公开(公告)号：US4801977A

公开(公告)日：1989-01-31

申请号：US198688

申请日：1988-05-24

申请人： Shoji Ishizaka ,  Hideo Mizutani ,  Susumu Makinouchi ,  Akikazu Tanimoto

发明人： Shoji Ishizaka ,  Hideo Mizutani ,  Susumu Makinouchi ,  Akikazu Tanimoto

IPC分类号： H01L21/30 ,  G03F7/20 ,  H01L21/027 ,  G03B27/52 ,  G03B27/74 ,  G03B27/80

CPC分类号： G03F7/706 ,  G03F7/70241 ,  G03F7/70858 ,  G03F7/70883

摘要： A projection optical apparatus comprises a projection optical system for projecting the image of an object onto a substrate, data collecting means for obtaining data regarding a factor which causes a variation in the optical characteristic of the projection optical system, adjusting means for adjusting the relation between the substrate and the image of the object relative to the variation in the optical characteristic of the projection optical system, means for determining the amount of adjustment by the adjusting means in accordance with a model formula using a predetermined parameter on the basis of the data obtained by the data collecting means, means for independently measuring the variation in the optical characteristic of the projection optical system, and means for correcting the parameter of the model formula on the basis of the result measured by the measuring means.

摘要翻译： 投影光学装置包括用于将物体的图像投影到基板上的投影光学系统，用于获得关于引起投影光学系统的光学特性变化的因素的数据的数据收集装置，用于调整投影光学系统的光学特性之间的关系的调整装置 基板和物体相对于投影光学系统的光学特性的变化的图像，用于根据获得的数据使用预定参数根据模型公式确定调节装置的调整量的装置 通过数据采集装置，用于独立地测量投影光学系统的光学特性的变化的装置，以及用于基于由测量装置测量的结果来校正模型公式的参数的装置。

公开(公告)号：US08395110B2

公开(公告)日：2013-03-12

申请号：US12726023

申请日：2010-03-17

申请人： Susumu Makinouchi

发明人： Susumu Makinouchi

IPC分类号： G01D5/34

CPC分类号： G01D5/34707 ,  G01B7/14 ,  G01D5/2451

摘要： An encoder apparatus comprises a first scale member with a scale region on which a scale is arranged; a detector that detects light from the scale region; and a retaining member with a retaining surface that is arranged so as to face a surface of the first scale member including the scale region via a predetermined gap, and that retains a liquid at least between the retaining surface and the first scale member.

摘要翻译： 编码器装置包括具有刻度区域的第一标尺部件，刻度尺布置在其上; 检测来自刻度区域的光的检测器; 以及具有保持面的保持构件，其被配置为经由预定间隙面对包括刻度区域的第一刻度尺的表面，并且至少在保持表面和第一刻度构件之间保持液体。